HK31196A - System for automated real-time control of film deposition - Google Patents

System for automated real-time control of film deposition

Info

Publication number
HK31196A
HK31196A HK31196A HK31196A HK31196A HK 31196 A HK31196 A HK 31196A HK 31196 A HK31196 A HK 31196A HK 31196 A HK31196 A HK 31196A HK 31196 A HK31196 A HK 31196A
Authority
HK
Hong Kong
Prior art keywords
time control
film deposition
automated real
automated
real
Prior art date
Application number
HK31196A
Other languages
English (en)
Inventor
Ronald T Smith
Edward M Yee
Jacques F Linder
Mao-Jin Chern
Gary Fisher
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of HK31196A publication Critical patent/HK31196A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
    • H01L21/08—Preparation of the foundation plate
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Chemical Vapour Deposition (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
HK31196A 1988-04-29 1996-02-22 System for automated real-time control of film deposition HK31196A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US18852488A 1988-04-29 1988-04-29

Publications (1)

Publication Number Publication Date
HK31196A true HK31196A (en) 1996-03-01

Family

ID=22693520

Family Applications (1)

Application Number Title Priority Date Filing Date
HK31196A HK31196A (en) 1988-04-29 1996-02-22 System for automated real-time control of film deposition

Country Status (5)

Country Link
EP (1) EP0339845B1 (ko)
JP (1) JP2550179B2 (ko)
KR (1) KR920008119B1 (ko)
DE (1) DE68904230T2 (ko)
HK (1) HK31196A (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0527230B1 (en) * 1991-01-30 1996-06-05 Nkk Corporation Ellipsometer
KR20030047630A (ko) * 2001-12-10 2003-06-18 (주)울텍 대면적 증착 균일도 향상을 위한 진공증착 장치 및 방법
JP4714021B2 (ja) 2003-08-20 2011-06-29 ビーコ・インストゥルメンツ・インコーポレイテッド 基板の表面に均一なエピタキシャル層を成長させる方法および回転ディスク式反応器
US7321424B2 (en) 2004-08-05 2008-01-22 Acton Research Corp. Self-referencing instrument and method thereof for measuring electromagnetic properties
US9303319B2 (en) * 2010-12-17 2016-04-05 Veeco Instruments Inc. Gas injection system for chemical vapor deposition using sequenced valves
DE102013111790A1 (de) * 2013-10-25 2015-04-30 Aixtron Se Energie- und materialverbrauchsoptimierter CVD-Reaktor
CN110205600B (zh) * 2019-07-04 2024-08-02 浙江大学昆山创新中心 一种耐高温双用途晶控仪

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3612692A (en) * 1968-11-21 1971-10-12 Ibm Dielectric film thickness monitoring and control system and method
JPS5930004A (ja) * 1982-08-09 1984-02-17 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン 膜厚測定装置
JPS61194835A (ja) * 1985-02-25 1986-08-29 Fujitsu Ltd 酸化膜の膜厚制御方法
JPH01107519A (ja) * 1987-10-20 1989-04-25 Nec Corp 気相成長装置

Also Published As

Publication number Publication date
KR920008119B1 (ko) 1992-09-22
EP0339845B1 (en) 1993-01-07
DE68904230D1 (de) 1993-02-18
JP2550179B2 (ja) 1996-11-06
JPH0250971A (ja) 1990-02-20
EP0339845A2 (en) 1989-11-02
DE68904230T2 (de) 1993-05-06
KR900017099A (ko) 1990-11-15
EP0339845A3 (en) 1990-08-22

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)