HK155596A - Diazo sensitizers of fluorinated esters - Google Patents
Diazo sensitizers of fluorinated estersInfo
- Publication number
- HK155596A HK155596A HK155596A HK155596A HK155596A HK 155596 A HK155596 A HK 155596A HK 155596 A HK155596 A HK 155596A HK 155596 A HK155596 A HK 155596A HK 155596 A HK155596 A HK 155596A
- Authority
- HK
- Hong Kong
- Prior art keywords
- fluorinated esters
- diazo sensitizers
- sensitizers
- diazo
- fluorinated
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/628,549 US5260162A (en) | 1990-12-17 | 1990-12-17 | Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers |
Publications (1)
Publication Number | Publication Date |
---|---|
HK155596A true HK155596A (en) | 1996-08-23 |
Family
ID=24519372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK155596A HK155596A (en) | 1990-12-17 | 1996-08-15 | Diazo sensitizers of fluorinated esters |
Country Status (6)
Country | Link |
---|---|
US (1) | US5260162A (de) |
EP (1) | EP0493923B1 (de) |
JP (1) | JP2960810B2 (de) |
KR (1) | KR100214323B1 (de) |
DE (1) | DE69119571T2 (de) |
HK (1) | HK155596A (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3202253B2 (ja) * | 1991-03-29 | 2001-08-27 | 株式会社東芝 | 露光用マスクの製造方法及び露光用マスク |
TW421731B (en) * | 1994-10-24 | 2001-02-11 | Clariant Finance Bvi Ltd | Positive photoresist composition, photo-sensitive element comprising it, methods of using it, and photosensitizer therein |
JP3190967B2 (ja) * | 1996-12-16 | 2001-07-23 | 住友ベークライト株式会社 | アルカリ性水溶液及び感光性樹脂組成物のパターン形成方法 |
US6207356B1 (en) | 1996-12-31 | 2001-03-27 | Sumitomo Bakelite Company Limited | Method for the pattern-processing of photosensitive resin composition |
DE69706396T2 (de) * | 1997-01-03 | 2002-04-18 | Sumitomo Bakelite Co. Ltd., Tokio/Tokyo | Verfahren zur Bebilderung einer photoempfindlichen Harzzusammensetzung |
US6515101B1 (en) * | 1998-09-25 | 2003-02-04 | Iowa State University Research Foundation, Inc. | High performance fluorinated polymers and methods |
TW527363B (en) * | 1999-09-08 | 2003-04-11 | Shinetsu Chemical Co | Polymers, chemical amplification resist compositions and patterning process |
US6670090B1 (en) * | 2002-09-03 | 2003-12-30 | Industrial Technology Research Institute | Positive working photosensitive composition, article and process for forming a relief pattern |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL130248C (de) * | 1959-01-21 | |||
DE1543721A1 (de) * | 1966-07-27 | 1969-09-11 | Kalle Ag | Naphthochinondiazidsulfosaeureester und Verfahren zu seiner Herstellung und Verfahren zur Herstellung eines den Ester enthaltenden lagerfaehigen lichtempfindlichen Materials |
US3669658A (en) * | 1969-06-11 | 1972-06-13 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
DE3100077A1 (de) * | 1981-01-03 | 1982-08-05 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters |
DE3421471A1 (de) * | 1984-06-08 | 1985-12-12 | Hoechst Ag, 6230 Frankfurt | Perfluoralkylgruppen aufweisende 1,2-naphthochinondiazidverbindungen und reproduktionsmaterialien, die diese verbindungen enthalten |
DE3421526A1 (de) * | 1984-06-08 | 1985-12-12 | Hoechst Ag, 6230 Frankfurt | Perfluoralkylgruppen aufweisende copolymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck |
US4626492A (en) * | 1985-06-04 | 1986-12-02 | Olin Hunt Specialty Products, Inc. | Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound |
US5037720A (en) * | 1987-07-21 | 1991-08-06 | Hoechst Celanese Corporation | Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use |
DE3724791A1 (de) * | 1987-07-27 | 1989-02-09 | Merck Patent Gmbh | Positiv-fotoresist-zusammensetzungen |
US5037949A (en) * | 1987-11-24 | 1991-08-06 | Hoechst Celanese Corp. | Polymers prepared from 4,4'-bis[2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl]diphenyl ether |
EP0384892A1 (de) * | 1989-02-23 | 1990-08-29 | Ciba-Geigy Ag | Photoresist-Zusammensetzungen |
US5114826A (en) * | 1989-12-28 | 1992-05-19 | Ibm Corporation | Photosensitive polyimide compositions |
-
1990
- 1990-12-17 US US07/628,549 patent/US5260162A/en not_active Expired - Lifetime
-
1991
- 1991-12-16 EP EP91311673A patent/EP0493923B1/de not_active Expired - Lifetime
- 1991-12-16 DE DE69119571T patent/DE69119571T2/de not_active Expired - Fee Related
- 1991-12-17 JP JP3353453A patent/JP2960810B2/ja not_active Expired - Fee Related
- 1991-12-17 KR KR1019910023226A patent/KR100214323B1/ko not_active IP Right Cessation
-
1996
- 1996-08-15 HK HK155596A patent/HK155596A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0493923B1 (de) | 1996-05-15 |
DE69119571T2 (de) | 1996-11-28 |
JP2960810B2 (ja) | 1999-10-12 |
US5260162A (en) | 1993-11-09 |
JPH0627663A (ja) | 1994-02-04 |
DE69119571D1 (de) | 1996-06-20 |
EP0493923A1 (de) | 1992-07-08 |
KR920013028A (ko) | 1992-07-28 |
KR100214323B1 (ko) | 1999-08-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |