HK155596A - Diazo sensitizers of fluorinated esters - Google Patents

Diazo sensitizers of fluorinated esters

Info

Publication number
HK155596A
HK155596A HK155596A HK155596A HK155596A HK 155596 A HK155596 A HK 155596A HK 155596 A HK155596 A HK 155596A HK 155596 A HK155596 A HK 155596A HK 155596 A HK155596 A HK 155596A
Authority
HK
Hong Kong
Prior art keywords
fluorinated esters
diazo sensitizers
sensitizers
diazo
fluorinated
Prior art date
Application number
HK155596A
Other languages
English (en)
Inventor
Dinesh N Khanna
Robert E Potvin
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of HK155596A publication Critical patent/HK155596A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
HK155596A 1990-12-17 1996-08-15 Diazo sensitizers of fluorinated esters HK155596A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/628,549 US5260162A (en) 1990-12-17 1990-12-17 Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers

Publications (1)

Publication Number Publication Date
HK155596A true HK155596A (en) 1996-08-23

Family

ID=24519372

Family Applications (1)

Application Number Title Priority Date Filing Date
HK155596A HK155596A (en) 1990-12-17 1996-08-15 Diazo sensitizers of fluorinated esters

Country Status (6)

Country Link
US (1) US5260162A (de)
EP (1) EP0493923B1 (de)
JP (1) JP2960810B2 (de)
KR (1) KR100214323B1 (de)
DE (1) DE69119571T2 (de)
HK (1) HK155596A (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3202253B2 (ja) * 1991-03-29 2001-08-27 株式会社東芝 露光用マスクの製造方法及び露光用マスク
TW421731B (en) * 1994-10-24 2001-02-11 Clariant Finance Bvi Ltd Positive photoresist composition, photo-sensitive element comprising it, methods of using it, and photosensitizer therein
JP3190967B2 (ja) * 1996-12-16 2001-07-23 住友ベークライト株式会社 アルカリ性水溶液及び感光性樹脂組成物のパターン形成方法
US6207356B1 (en) 1996-12-31 2001-03-27 Sumitomo Bakelite Company Limited Method for the pattern-processing of photosensitive resin composition
DE69706396T2 (de) * 1997-01-03 2002-04-18 Sumitomo Bakelite Co. Ltd., Tokio/Tokyo Verfahren zur Bebilderung einer photoempfindlichen Harzzusammensetzung
US6515101B1 (en) * 1998-09-25 2003-02-04 Iowa State University Research Foundation, Inc. High performance fluorinated polymers and methods
TW527363B (en) * 1999-09-08 2003-04-11 Shinetsu Chemical Co Polymers, chemical amplification resist compositions and patterning process
US6670090B1 (en) * 2002-09-03 2003-12-30 Industrial Technology Research Institute Positive working photosensitive composition, article and process for forming a relief pattern

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL130248C (de) * 1959-01-21
DE1543721A1 (de) * 1966-07-27 1969-09-11 Kalle Ag Naphthochinondiazidsulfosaeureester und Verfahren zu seiner Herstellung und Verfahren zur Herstellung eines den Ester enthaltenden lagerfaehigen lichtempfindlichen Materials
US3669658A (en) * 1969-06-11 1972-06-13 Fuji Photo Film Co Ltd Photosensitive printing plate
DE3100077A1 (de) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
DE3421471A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende 1,2-naphthochinondiazidverbindungen und reproduktionsmaterialien, die diese verbindungen enthalten
DE3421526A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende copolymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
US4626492A (en) * 1985-06-04 1986-12-02 Olin Hunt Specialty Products, Inc. Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
US5037720A (en) * 1987-07-21 1991-08-06 Hoechst Celanese Corporation Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use
DE3724791A1 (de) * 1987-07-27 1989-02-09 Merck Patent Gmbh Positiv-fotoresist-zusammensetzungen
US5037949A (en) * 1987-11-24 1991-08-06 Hoechst Celanese Corp. Polymers prepared from 4,4'-bis[2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl]diphenyl ether
EP0384892A1 (de) * 1989-02-23 1990-08-29 Ciba-Geigy Ag Photoresist-Zusammensetzungen
US5114826A (en) * 1989-12-28 1992-05-19 Ibm Corporation Photosensitive polyimide compositions

Also Published As

Publication number Publication date
EP0493923B1 (de) 1996-05-15
DE69119571T2 (de) 1996-11-28
JP2960810B2 (ja) 1999-10-12
US5260162A (en) 1993-11-09
JPH0627663A (ja) 1994-02-04
DE69119571D1 (de) 1996-06-20
EP0493923A1 (de) 1992-07-08
KR920013028A (ko) 1992-07-28
KR100214323B1 (ko) 1999-08-02

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)