HK1252420A1 - 用於施加塗層的設備和方法 - Google Patents

用於施加塗層的設備和方法

Info

Publication number
HK1252420A1
HK1252420A1 HK18111717.9A HK18111717A HK1252420A1 HK 1252420 A1 HK1252420 A1 HK 1252420A1 HK 18111717 A HK18111717 A HK 18111717A HK 1252420 A1 HK1252420 A1 HK 1252420A1
Authority
HK
Hong Kong
Prior art keywords
coating
applying
Prior art date
Application number
HK18111717.9A
Other languages
English (en)
Inventor
F‧佩森多費爾
Original Assignee
茵諾康技術有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 茵諾康技術有限公司 filed Critical 茵諾康技術有限公司
Publication of HK1252420A1 publication Critical patent/HK1252420A1/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B05B7/22—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc
    • B05B7/222—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc
    • B05B7/226—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc the material being originally a particulate material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder, liquid
HK18111717.9A 2015-11-12 2018-09-12 用於施加塗層的設備和方法 HK1252420A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ATA50968/2015A AT517694B1 (de) 2015-11-12 2015-11-12 Vorrichtung und Verfahren zum Aufbringen einer Beschichtung

Publications (1)

Publication Number Publication Date
HK1252420A1 true HK1252420A1 (zh) 2019-05-24

Family

ID=57206273

Family Applications (1)

Application Number Title Priority Date Filing Date
HK18111717.9A HK1252420A1 (zh) 2015-11-12 2018-09-12 用於施加塗層的設備和方法

Country Status (5)

Country Link
EP (1) EP3374542B1 (zh)
CN (1) CN108368609A (zh)
AT (1) AT517694B1 (zh)
HK (1) HK1252420A1 (zh)
WO (1) WO2017080815A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017216139B3 (de) 2017-09-13 2019-02-28 Innovent E.V. Verfahren zur Herstellung einer Schicht
EP3680361A1 (de) * 2019-01-09 2020-07-15 Innovent e.V. Aufsatz zum dosieren eines precursors und verfahren zur herstellung einer schicht

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5120703A (en) * 1990-04-17 1992-06-09 Alfred University Process for preparing oxide superconducting films by radio-frequency generated aerosol-plasma deposition in atmosphere
US5565249A (en) * 1992-05-07 1996-10-15 Fujitsu Limited Method for producing diamond by a DC plasma jet
JPH10152766A (ja) * 1996-11-26 1998-06-09 Mitsubishi Heavy Ind Ltd プラズマ溶射トーチ
DE19807086A1 (de) * 1998-02-20 1999-08-26 Fraunhofer Ges Forschung Verfahren zum Beschichten von Oberflächen eines Substrates, Vorrichtung zur Durchführung des Verfahrens, Schichtsystem sowie beschichtetes Substrat
JP2000178744A (ja) * 1998-12-09 2000-06-27 Komatsu Ltd 成膜装置
US6365016B1 (en) * 1999-03-17 2002-04-02 General Electric Company Method and apparatus for arc plasma deposition with evaporation of reagents
DE29919142U1 (de) * 1999-10-30 2001-03-08 Agrodyn Hochspannungstechnik G Plasmadüse
DE10239875B4 (de) * 2002-08-29 2008-11-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zur großflächigen Beschichtung von Substraten bei Atmosphärendruckbedingungen
US7282244B2 (en) * 2003-09-05 2007-10-16 General Electric Company Replaceable plate expanded thermal plasma apparatus and method
DE102008058783A1 (de) * 2008-11-24 2010-05-27 Plasmatreat Gmbh Verfahren zur atmosphärischen Beschichtung von Nanooberflächen
DE102009030303A1 (de) * 2009-06-24 2010-12-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung von Antireflexschicht-bildenden Beschichtungen sowie Antireflexbeschichtungen
DE102011052306A1 (de) * 2011-07-29 2013-01-31 Jokey Plastik Sohland Gmbh Verfahren zur Erzeugung einer permeationshemmenden Beschichtung von Kunststoffbehältern und Beschichtungsanlage
WO2013152805A1 (en) * 2012-04-13 2013-10-17 European Space Agency Method and system for production and additive manufacturing of metals and alloys

Also Published As

Publication number Publication date
AT517694B1 (de) 2017-04-15
WO2017080815A1 (de) 2017-05-18
CN108368609A (zh) 2018-08-03
EP3374542B1 (de) 2020-07-15
EP3374542A1 (de) 2018-09-19
AT517694A4 (de) 2017-04-15

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