HK1246869A1 - Object holding device, exposure device, method for manufacturing flat panel display, and method for manufacturing device - Google Patents

Object holding device, exposure device, method for manufacturing flat panel display, and method for manufacturing device

Info

Publication number
HK1246869A1
HK1246869A1 HK18106068.4A HK18106068A HK1246869A1 HK 1246869 A1 HK1246869 A1 HK 1246869A1 HK 18106068 A HK18106068 A HK 18106068A HK 1246869 A1 HK1246869 A1 HK 1246869A1
Authority
HK
Hong Kong
Prior art keywords
manufacturing
flat panel
panel display
object holding
exposure
Prior art date
Application number
HK18106068.4A
Other languages
Chinese (zh)
Inventor
青木保夫
吉田亮平
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1246869A1 publication Critical patent/HK1246869A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
HK18106068.4A 2015-05-28 2018-05-10 Object holding device, exposure device, method for manufacturing flat panel display, and method for manufacturing device HK1246869A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015108843 2015-05-28
PCT/JP2016/065774 WO2016190423A1 (en) 2015-05-28 2016-05-27 Object holding device, exposure device, method for manufacturing flat panel display, and method for manufacturing device

Publications (1)

Publication Number Publication Date
HK1246869A1 true HK1246869A1 (en) 2018-09-14

Family

ID=57393889

Family Applications (1)

Application Number Title Priority Date Filing Date
HK18106068.4A HK1246869A1 (en) 2015-05-28 2018-05-10 Object holding device, exposure device, method for manufacturing flat panel display, and method for manufacturing device

Country Status (6)

Country Link
JP (2) JP6791132B2 (en)
KR (1) KR102625921B1 (en)
CN (1) CN107615169B (en)
HK (1) HK1246869A1 (en)
TW (1) TWI731860B (en)
WO (1) WO2016190423A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI762610B (en) * 2017-03-31 2022-05-01 日商尼康股份有限公司 Object holding device, processing device, manufacturing method of flat panel display, component manufacturing method, and object holding method
JP7023620B2 (en) * 2017-05-30 2022-02-22 株式会社オーク製作所 Exposure equipment and substrate mounting method
JP7105482B2 (en) * 2018-04-03 2022-07-25 株式会社ブイ・テクノロジー Stone surface plate temperature adjustment device and inspection device equipped with the same
CN109384062B (en) 2018-09-19 2020-02-18 武汉华星光电技术有限公司 Exposure machine and method for conveying substrate by exposure machine
KR20200085533A (en) * 2019-01-07 2020-07-15 삼성전자주식회사 Display apparatus and method of manufacturing display apparatus
CN112936021B (en) * 2021-01-20 2022-11-18 大连理工大学 Thin-wall large-caliber aspheric carbon fiber composite high-performance part grinding equipment

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09278181A (en) * 1996-04-11 1997-10-28 Canon Inc Work carrying device and carrying method
JP2004273702A (en) 2003-03-07 2004-09-30 Nikon Corp Apparatus and method for transfer, and exposure device
JP4033841B2 (en) * 2004-02-12 2008-01-16 東京エレクトロン株式会社 Floating substrate transfer processing method and apparatus
KR101236120B1 (en) * 2004-10-26 2013-02-28 가부시키가이샤 니콘 Substrate processing method, exposure apparatus and method for manufacturing device
JP2009135169A (en) * 2007-11-29 2009-06-18 Tokyo Electron Ltd Substrate processing system, and substrate processing method
JP5160996B2 (en) * 2008-08-05 2013-03-13 オリンパス株式会社 Substrate floating device
US8699001B2 (en) * 2009-08-20 2014-04-15 Nikon Corporation Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method
JP2011225355A (en) * 2010-04-22 2011-11-10 Sumitomo Heavy Ind Ltd Air floating unit, stage device, inspection system, exposure system, and application system
KR101187006B1 (en) * 2012-04-24 2012-09-28 이재성 Noncontact conveying plate for large area panel
JP6086476B2 (en) * 2012-12-13 2017-03-01 東レエンジニアリング株式会社 Substrate floating device
KR101773494B1 (en) * 2013-02-26 2017-08-31 가부시키가이샤 아이에이치아이 Transfer apparatus
JP2014218342A (en) * 2013-05-09 2014-11-20 オイレス工業株式会社 Supporting air plate and gas flow resistor thereof

Also Published As

Publication number Publication date
TWI731860B (en) 2021-07-01
JP6791132B2 (en) 2020-11-25
JPWO2016190423A1 (en) 2018-03-15
KR20180013996A (en) 2018-02-07
KR102625921B1 (en) 2024-01-16
CN107615169B (en) 2021-02-23
TW201703189A (en) 2017-01-16
JP2021039362A (en) 2021-03-11
WO2016190423A1 (en) 2016-12-01
CN107615169A (en) 2018-01-19

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