HK1186913A2 - High voltage hybrid mosfet/bipolar power switching device - Google Patents

High voltage hybrid mosfet/bipolar power switching device

Info

Publication number
HK1186913A2
HK1186913A2 HK13113176A HK13113176A HK1186913A2 HK 1186913 A2 HK1186913 A2 HK 1186913A2 HK 13113176 A HK13113176 A HK 13113176A HK 13113176 A HK13113176 A HK 13113176A HK 1186913 A2 HK1186913 A2 HK 1186913A2
Authority
HK
Hong Kong
Prior art keywords
high voltage
switching device
power switching
bipolar power
voltage hybrid
Prior art date
Application number
HK13113176A
Other languages
English (en)
Inventor
Tse Chiu Sing Celement
Chan On Bon Peter
Original Assignee
Mosway Semiconductor Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mosway Semiconductor Ltd filed Critical Mosway Semiconductor Ltd
Publication of HK1186913A2 publication Critical patent/HK1186913A2/xx

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    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49171Fan-out arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Composite Materials (AREA)
  • Bipolar Integrated Circuits (AREA)
HK13113176A 2013-10-28 2013-11-26 High voltage hybrid mosfet/bipolar power switching device HK1186913A2 (en)

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US14/064,843 US9245880B2 (en) 2013-10-28 2013-10-28 High voltage semiconductor power switching device

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9245880B2 (en) * 2013-10-28 2016-01-26 Mosway Semiconductor Limited High voltage semiconductor power switching device
CN106549007B (zh) * 2015-09-16 2019-06-07 无锡华润华晶微电子有限公司 功率ic、引线框、功率ic的封装体以及灯具
US11164813B2 (en) * 2019-04-11 2021-11-02 Cree, Inc. Transistor semiconductor die with increased active area
US12074079B2 (en) 2019-04-11 2024-08-27 Wolfspeed, Inc. Wide bandgap semiconductor device with sensor element
CN110752256B (zh) * 2019-10-22 2021-04-06 深圳第三代半导体研究院 一种碳化硅肖特基钳位晶体管及其制备方法
CN111063723B (zh) * 2019-11-25 2021-12-28 深圳深爱半导体股份有限公司 开关集成控制器
KR20240113939A (ko) * 2021-12-06 2024-07-23 고쿠리츠다이가쿠호징 야마나시다이가쿠 반도체 스위치 및 반도체 회로

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2610122C3 (de) * 1976-03-11 1978-11-09 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Dreipolige Halbleiteranordnung
JPS5658261A (en) * 1979-10-18 1981-05-21 Toshiba Corp Semiconductor device
US4564771A (en) * 1982-07-17 1986-01-14 Robert Bosch Gmbh Integrated Darlington transistor combination including auxiliary transistor and Zener diode
JPS60154552A (ja) * 1984-01-23 1985-08-14 Mitsubishi Electric Corp 電力用半導体装置
EP0650193A3 (en) * 1993-10-25 1996-07-31 Toshiba Kk Semiconductor device and method for its production.
US6020636A (en) * 1997-10-24 2000-02-01 Eni Technologies, Inc. Kilowatt power transistor
US6359274B1 (en) * 1999-01-25 2002-03-19 Gentex Corporation Photodiode light sensor
JP2004006531A (ja) * 2002-05-31 2004-01-08 Renesas Technology Corp 半導体装置およびその製造方法
US6906399B2 (en) * 2002-11-04 2005-06-14 Delphi Technologies, Inc. Integrated circuit including semiconductor power device and electrically isolated thermal sensor
JP4091038B2 (ja) * 2003-11-19 2008-05-28 松下電器産業株式会社 プラズマディスプレイのサステインドライバ、及びその制御回路
TWI233688B (en) * 2004-08-30 2005-06-01 Ind Tech Res Inst Diode structure with low substrate leakage current and applications thereof
US7859803B2 (en) * 2005-09-19 2010-12-28 The Regents Of The University Of California Voltage overload protection circuits
JP2007287782A (ja) * 2006-04-13 2007-11-01 Hitachi Ltd メサ型バイポーラトランジスタ
JP5140347B2 (ja) * 2007-08-29 2013-02-06 株式会社日立製作所 バイポーラトランジスタ及びその製造方法
US8558276B2 (en) * 2009-06-17 2013-10-15 Alpha And Omega Semiconductor, Inc. Bottom source NMOS triggered zener clamp for configuring an ultra-low voltage transient voltage suppressor (TVS)
US10205017B2 (en) * 2009-06-17 2019-02-12 Alpha And Omega Semiconductor Incorporated Bottom source NMOS triggered Zener clamp for configuring an ultra-low voltage transient voltage suppressor (TVS)
US8541787B2 (en) * 2009-07-15 2013-09-24 Cree, Inc. High breakdown voltage wide band-gap MOS-gated bipolar junction transistors with avalanche capability
JP5457974B2 (ja) * 2010-08-03 2014-04-02 株式会社日立製作所 半導体装置およびその製造方法ならびに不揮発性半導体記憶装置
US8804385B2 (en) * 2010-08-30 2014-08-12 Mosway Semiconductor Limited SMPS control IC with 4 terminals
WO2012085677A1 (en) * 2010-12-20 2012-06-28 Diodes Zetex Semiconductors Limited Complementary darlington emitter follower with improved switching speed and improved cross-over control and increased output voltage
US8416008B2 (en) * 2011-01-20 2013-04-09 Advanced Energy Industries, Inc. Impedance-matching network using BJT switches in variable-reactance circuits
US8390070B2 (en) * 2011-04-06 2013-03-05 Nanya Technology Corp. Electrostatic discharge protection device and electrostatic discharge protection circuit thereof
US8836433B2 (en) * 2011-05-10 2014-09-16 Skyworks Solutions, Inc. Apparatus and methods for electronic amplification
US8581339B2 (en) * 2011-08-08 2013-11-12 Macronix International Co., Ltd. Structure of NPN-BJT for improving punch through between collector and emitter
US8304838B1 (en) * 2011-08-23 2012-11-06 Amazing Microelectronics Corp. Electrostatic discharge protection device structure
JP5561352B2 (ja) * 2012-02-22 2014-07-30 株式会社デンソー 駆動回路
CN103199715A (zh) * 2012-11-27 2013-07-10 科域半导体有限公司 开关变换器
US9245880B2 (en) * 2013-10-28 2016-01-26 Mosway Semiconductor Limited High voltage semiconductor power switching device

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CN104660250B (zh) 2019-05-10
US9553085B2 (en) 2017-01-24
US9245880B2 (en) 2016-01-26
US20150115315A1 (en) 2015-04-30
US20160079237A1 (en) 2016-03-17

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