HK1046553B - 包含含有雙-(羥基苯基)-芴-鄰-取代的雙酚的聚芳基化物的光學膜 - Google Patents

包含含有雙-(羥基苯基)-芴-鄰-取代的雙酚的聚芳基化物的光學膜

Info

Publication number
HK1046553B
HK1046553B HK02108192.7A HK02108192A HK1046553B HK 1046553 B HK1046553 B HK 1046553B HK 02108192 A HK02108192 A HK 02108192A HK 1046553 B HK1046553 B HK 1046553B
Authority
HK
Hong Kong
Prior art keywords
bisphenols
fluorene
disubstituted
hydroxyphenyl
ortho
Prior art date
Application number
HK02108192.7A
Other languages
English (en)
Other versions
HK1046553A1 (en
Inventor
Angiolini Simone
Avidano Mauro
Salvarani Paolo
Bracco Roberto
Original Assignee
Ferrania Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ferrania Spa filed Critical Ferrania Spa
Publication of HK1046553A1 publication Critical patent/HK1046553A1/xx
Publication of HK1046553B publication Critical patent/HK1046553B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
    • C08G63/682—Polyesters containing atoms other than carbon, hydrogen and oxygen containing halogens
    • C08G63/6824—Polyesters containing atoms other than carbon, hydrogen and oxygen containing halogens derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/6826—Dicarboxylic acids and dihydroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/16—Dicarboxylic acids and dihydroxy compounds
    • C08G63/18—Dicarboxylic acids and dihydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
    • C08G63/19—Hydroxy compounds containing aromatic rings
    • C08G63/193—Hydroxy compounds containing aromatic rings containing two or more aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
    • C08G63/685—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen
    • C08G63/6854—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/6856—Dicarboxylic acids and dihydroxy compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31565—Next to polyester [polyethylene terephthalate, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Optical Integrated Circuits (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyethers (AREA)
HK02108192.7A 2000-11-14 2002-11-12 包含含有雙-(羥基苯基)-芴-鄰-取代的雙酚的聚芳基化物的光學膜 HK1046553B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT000053A ITSV20000053A1 (it) 2000-11-14 2000-11-14 Film ottico comprendente poliarilati contenenti bisfenoli bis(idrossifenil) fluoren-orto-bisostituiti.

Publications (2)

Publication Number Publication Date
HK1046553A1 HK1046553A1 (en) 2003-01-17
HK1046553B true HK1046553B (zh) 2005-09-02

Family

ID=11457067

Family Applications (1)

Application Number Title Priority Date Filing Date
HK02108192.7A HK1046553B (zh) 2000-11-14 2002-11-12 包含含有雙-(羥基苯基)-芴-鄰-取代的雙酚的聚芳基化物的光學膜

Country Status (6)

Country Link
US (1) US6632886B2 (zh)
EP (1) EP1205772B1 (zh)
JP (1) JP2002145998A (zh)
DE (1) DE60109251T2 (zh)
HK (1) HK1046553B (zh)
IT (1) ITSV20000053A1 (zh)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7022772B2 (en) * 2000-11-14 2006-04-04 Ferraria Technologies S.P.A. Optical film comprising polyarylates containing bis-(hydroxyphenyl)-fluorene-ortho-disubstituted bisphenols
ITSV20030018A1 (it) * 2003-04-11 2004-10-12 Allaix Roberto C O Ferrania S P A Uff Brevetti Mezzo ottico comprendente un film di materiale polimerico.
ITSV20030019A1 (it) * 2003-04-11 2004-10-12 Allaix Roberto C O Ferrania S P A Uff Brevetti Film ottici comprendenti uno o piu' poliarilati ottenuti
US7652126B2 (en) * 2003-10-07 2010-01-26 General Electric Company Monomers and polymers comprising conjugated groups and methods for making thereof
ITMI20032110A1 (it) * 2003-10-31 2005-05-01 Milano Politecnico Miscela polimerica comprendente un derivato di polifluorene
US20050209404A1 (en) * 2004-02-13 2005-09-22 Fuji Photo Film Co., Ltd. Film and image display device utilizing same
JP2006117910A (ja) * 2004-09-27 2006-05-11 Fuji Photo Film Co Ltd 耐熱樹脂、光学フィルムおよび画像表示装置
JP4425167B2 (ja) * 2005-03-22 2010-03-03 富士フイルム株式会社 ガスバリア性フィルム、基材フィルムおよび有機エレクトロルミネッセンス素子
JP4624152B2 (ja) * 2005-03-24 2011-02-02 富士フイルム株式会社 プラスチックフィルム、ガスバリアフィルム、およびそれを用いた画像表示素子
JP4663381B2 (ja) * 2005-04-12 2011-04-06 富士フイルム株式会社 ガスバリア性フィルム、基材フィルムおよび有機エレクトロルミネッセンス素子
JP4698310B2 (ja) * 2005-07-11 2011-06-08 富士フイルム株式会社 ガスバリア性フィルム、基材フィルムおよび有機エレクトロルミネッセンス素子
JP2007069420A (ja) * 2005-09-06 2007-03-22 Fujifilm Corp フィルムの製造方法およびフィルム
JP4717674B2 (ja) 2006-03-27 2011-07-06 富士フイルム株式会社 ガスバリア性フィルム、基材フィルムおよび有機エレクトロルミネッセンス素子
KR101251684B1 (ko) 2007-08-07 2013-04-05 주식회사 엘지화학 알칼리 가용성 수지 제조용 조성물, 이로부터 제조되는알칼리 가용성 수지, 이의 제조방법 및 이를 포함하는감광성 수지 조성물
ATE502073T1 (de) * 2007-10-02 2011-04-15 Ferrania Technologies Spa Polymerfilm und optische vorrichtung damit
JP4927690B2 (ja) * 2007-11-27 2012-05-09 日東電工株式会社 光学フィルム、及びその製造方法
KR101588050B1 (ko) * 2007-12-28 2016-01-22 스미또모 가가꾸 가부시끼가이샤 광학 필름
TWI482769B (zh) * 2009-03-16 2015-05-01 Sumitomo Chemical Co 化合物、光學膜片及光學膜片之製造方法
JP7118681B2 (ja) * 2017-03-31 2022-08-16 大阪ガスケミカル株式会社 高耐熱性ポリエステル樹脂及び成形体

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS641723A (en) 1987-06-24 1989-01-06 Nippon Steel Corp Heat-resistant polyester
US5007945A (en) 1990-04-12 1991-04-16 Air Products And Chemicals, Inc. Membranes formed from aromatic polyarylates
US5232471A (en) 1992-05-13 1993-08-03 Air Products And Chemicals, Inc. Membranes formed from nitrated polyarylates
WO1999018141A1 (fr) 1997-10-03 1999-04-15 Unitika Ltd. Polyarylate de grande purete et hautement thermoresistant, et film obtenu a partir de ce produit
US6168649B1 (en) 1998-12-09 2001-01-02 Mg Generon, Inc. Membrane for separation of xenon from oxygen and nitrogen and method of using same

Also Published As

Publication number Publication date
US6632886B2 (en) 2003-10-14
EP1205772B1 (en) 2005-03-09
US20020091200A1 (en) 2002-07-11
JP2002145998A (ja) 2002-05-22
DE60109251D1 (de) 2005-04-14
ITSV20000053A1 (it) 2002-05-14
HK1046553A1 (en) 2003-01-17
EP1205772A2 (en) 2002-05-15
EP1205772A3 (en) 2002-12-18
DE60109251T2 (de) 2006-01-26

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20130412