HK1005001A1 - System and method for inspecting semiconducter wafers - Google Patents
System and method for inspecting semiconducter wafersInfo
- Publication number
- HK1005001A1 HK1005001A1 HK98104149A HK98104149A HK1005001A1 HK 1005001 A1 HK1005001 A1 HK 1005001A1 HK 98104149 A HK98104149 A HK 98104149A HK 98104149 A HK98104149 A HK 98104149A HK 1005001 A1 HK1005001 A1 HK 1005001A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- disc
- semiconducter
- inspecting
- wafers
- light reflection
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/265—Contactless testing
- G01R31/2656—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Pathology (AREA)
- Immunology (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Toxicology (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Measuring Or Testing Involving Enzymes Or Micro-Organisms (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4413831A DE4413831C2 (de) | 1994-04-20 | 1994-04-20 | Verfahren zur Kontrolle von Halbleiterscheiben |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1005001A1 true HK1005001A1 (en) | 1998-12-18 |
Family
ID=6516016
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK98104149A HK1005001A1 (en) | 1994-04-20 | 1998-05-13 | System and method for inspecting semiconducter wafers |
Country Status (7)
Country | Link |
---|---|
US (1) | US5742395A (xx) |
EP (1) | EP0678911B1 (xx) |
JP (1) | JP3577133B2 (xx) |
KR (1) | KR100333238B1 (xx) |
AT (1) | ATE212751T1 (xx) |
DE (2) | DE4413831C2 (xx) |
HK (1) | HK1005001A1 (xx) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6411377B1 (en) | 1991-04-02 | 2002-06-25 | Hitachi, Ltd. | Optical apparatus for defect and particle size inspection |
DE59608537D1 (de) * | 1995-10-25 | 2002-02-07 | Infineon Technologies Ag | Verfahren zur Kontrolle von Scheiben |
GB9613685D0 (en) * | 1996-06-28 | 1996-08-28 | Crosfield Electronics Ltd | An illumination unit |
US5965446A (en) * | 1996-10-24 | 1999-10-12 | Hamamatsu Photonics K.K. | Method for placing fluorescent single molecules on surface of substrate and method for visualizing structural defect of surface of substrate |
JP3981696B2 (ja) * | 1998-07-28 | 2007-09-26 | 株式会社日立製作所 | 欠陥検査装置およびその方法 |
JP3904565B2 (ja) * | 1998-07-28 | 2007-04-11 | 株式会社日立製作所 | 欠陥検査装置およびその方法 |
JP3566589B2 (ja) * | 1998-07-28 | 2004-09-15 | 株式会社日立製作所 | 欠陥検査装置およびその方法 |
JP3904581B2 (ja) * | 1998-07-28 | 2007-04-11 | 株式会社日立製作所 | 欠陥検査装置およびその方法 |
US7173648B1 (en) * | 2000-04-21 | 2007-02-06 | Advanced Micro Devices, Inc. | System and method for visually monitoring a semiconductor processing system |
KR100839915B1 (ko) * | 2006-04-11 | 2008-06-19 | 아주하이텍(주) | 광학 검사 시스템 |
US8726837B2 (en) * | 2008-06-23 | 2014-05-20 | Applied Materials, Inc. | Semiconductor process chamber vision and monitoring system |
US9110131B2 (en) * | 2010-04-13 | 2015-08-18 | Cascade Microtech, Inc. | Method and device for contacting a row of contact areas with probe tips |
CN110854035A (zh) * | 2019-11-27 | 2020-02-28 | 上海华力微电子有限公司 | 晶圆边缘缺陷的检测方法及装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3337251A1 (de) * | 1983-10-13 | 1985-04-25 | Gerd Dipl.-Phys. Dr. 8520 Erlangen Häusler | Optisches abtastverfahren zur dreidimensionalen vermessung von objekten |
DE3484982D1 (de) * | 1983-11-26 | 1991-10-02 | Toshiba Kawasaki Kk | Apparat zum nachweis von oberflaechenfehlern. |
US4740708A (en) * | 1987-01-06 | 1988-04-26 | International Business Machines Corporation | Semiconductor wafer surface inspection apparatus and method |
JPH0682102B2 (ja) * | 1987-02-27 | 1994-10-19 | 三菱電機株式会社 | パターン欠陥検査装置及びパターン欠陥検査方法 |
JPH0671038B2 (ja) * | 1987-03-31 | 1994-09-07 | 株式会社東芝 | 結晶欠陥認識処理方法 |
JP2604607B2 (ja) * | 1987-12-09 | 1997-04-30 | 三井金属鉱業株式会社 | 欠陥分布測定法および装置 |
US5091963A (en) * | 1988-05-02 | 1992-02-25 | The Standard Oil Company | Method and apparatus for inspecting surfaces for contrast variations |
DE4003983C1 (en) * | 1990-02-09 | 1991-08-29 | Abos Automation, Bildverarbeitung, Optische Systeme Gmbh, 8057 Eching, De | Automated monitoring of space=shape data for mfg. semiconductors - compares image signals for defined illumination angle range with master signals, to determine defects |
DE4032327A1 (de) * | 1990-10-11 | 1992-04-16 | Abos Automation Bildverarbeitu | Verfahren und vorrichtung zur automatisierten ueberwachung der herstellung von halbleiterbauteilen |
JP2981941B2 (ja) * | 1991-12-02 | 1999-11-22 | 株式会社新川 | ボンデイングワイヤ検査装置 |
JPH06137839A (ja) * | 1992-02-18 | 1994-05-20 | Nec Corp | リード曲り測定装置 |
-
1994
- 1994-04-20 DE DE4413831A patent/DE4413831C2/de not_active Expired - Fee Related
-
1995
- 1995-04-19 JP JP11781495A patent/JP3577133B2/ja not_active Expired - Fee Related
- 1995-04-20 US US08/425,827 patent/US5742395A/en not_active Expired - Lifetime
- 1995-04-20 DE DE59510019T patent/DE59510019D1/de not_active Expired - Fee Related
- 1995-04-20 EP EP95105933A patent/EP0678911B1/de not_active Expired - Lifetime
- 1995-04-20 KR KR1019950009311A patent/KR100333238B1/ko not_active IP Right Cessation
- 1995-04-20 AT AT95105933T patent/ATE212751T1/de not_active IP Right Cessation
-
1998
- 1998-05-13 HK HK98104149A patent/HK1005001A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0678911A3 (de) | 1996-04-17 |
ATE212751T1 (de) | 2002-02-15 |
US5742395A (en) | 1998-04-21 |
DE59510019D1 (de) | 2002-03-14 |
KR950034646A (ko) | 1995-12-28 |
DE4413831C2 (de) | 2000-05-31 |
EP0678911A2 (de) | 1995-10-25 |
EP0678911B1 (de) | 2002-01-30 |
JP3577133B2 (ja) | 2004-10-13 |
JPH07294449A (ja) | 1995-11-10 |
KR100333238B1 (ko) | 2002-09-27 |
DE4413831A1 (de) | 1995-10-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PF | Patent in force | ||
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20060420 |