GB992044A - Methods of forming glass layers on substrates - Google Patents

Methods of forming glass layers on substrates

Info

Publication number
GB992044A
GB992044A GB33208/62A GB3320862A GB992044A GB 992044 A GB992044 A GB 992044A GB 33208/62 A GB33208/62 A GB 33208/62A GB 3320862 A GB3320862 A GB 3320862A GB 992044 A GB992044 A GB 992044A
Authority
GB
United Kingdom
Prior art keywords
substrate
glass
particles
fluid
glass particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB33208/62A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US141668A external-priority patent/US3212921A/en
Priority claimed from US181743A external-priority patent/US3212929A/en
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB992044A publication Critical patent/GB992044A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P14/6923—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23D—ENAMELLING OF, OR APPLYING A VITREOUS LAYER TO, METALS
    • C23D11/00—Continuous processes; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23D—ENAMELLING OF, OR APPLYING A VITREOUS LAYER TO, METALS
    • C23D5/00—Coating with enamels or vitreous layers
    • C23D5/02—Coating with enamels or vitreous layers by wet methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
    • H01B3/08—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances quartz; glass; glass wool; slag wool; vitreous enamels
    • H01B3/088—Shaping of glass or deposition of glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/02—Apparatus or processes specially adapted for manufacturing resistors adapted for manufacturing resistors with envelope or housing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G13/00—Apparatus specially adapted for manufacturing capacitors; Processes specially adapted for manufacturing capacitors not provided for in groups H01G4/00 - H01G11/00
    • H01G13/003—Apparatus or processes for encapsulating capacitors
    • H10W74/40—
    • H10W74/43—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Formation Of Insulating Films (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Glass (AREA)
  • Inorganic Insulating Materials (AREA)
GB33208/62A 1961-09-29 1962-08-29 Methods of forming glass layers on substrates Expired GB992044A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US141668A US3212921A (en) 1961-09-29 1961-09-29 Method of forming a glass film on an object and the product produced thereby
US181743A US3212929A (en) 1962-03-22 1962-03-22 Method of forming a glass film on an object
US50797765A 1965-09-22 1965-09-22

Publications (1)

Publication Number Publication Date
GB992044A true GB992044A (en) 1965-05-12

Family

ID=27385687

Family Applications (2)

Application Number Title Priority Date Filing Date
GB33208/62A Expired GB992044A (en) 1961-09-29 1962-08-29 Methods of forming glass layers on substrates
GB10995/62A Expired GB992045A (en) 1961-09-29 1963-03-20 Improvements in or relating to methods of forming a glass layer on a substrate

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB10995/62A Expired GB992045A (en) 1961-09-29 1963-03-20 Improvements in or relating to methods of forming a glass layer on a substrate

Country Status (7)

Country Link
US (1) US3505106A (cg-RX-API-DMAC10.html)
BE (2) BE622794A (cg-RX-API-DMAC10.html)
CH (1) CH430817A (cg-RX-API-DMAC10.html)
DE (2) DE1267056B (cg-RX-API-DMAC10.html)
FR (1) FR1335333A (cg-RX-API-DMAC10.html)
GB (2) GB992044A (cg-RX-API-DMAC10.html)
NL (2) NL283620A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3663277A (en) * 1969-08-04 1972-05-16 Ncr Co Method of insulating multilevel conductors

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3632434A (en) * 1969-01-21 1972-01-04 Jerald L Hutson Process for glass passivating silicon semiconductor junctions
US3676756A (en) * 1969-09-18 1972-07-11 Innotech Corp Insulated gate field effect device having glass gate insulator
US3731159A (en) * 1971-05-19 1973-05-01 Anheuser Busch Microwave diode with low capacitance package
BE792075A (fr) * 1971-11-30 1973-05-29 Union Carbide Corp Elements metalliques poreux a revetement ceramique et leur procede de realisation
US4374391A (en) * 1980-09-24 1983-02-15 Bell Telephone Laboratories, Incorporated Device fabrication procedure

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE666930C (de) * 1936-09-26 1938-11-01 Philips Patentverwaltung Verfahren zum Herstellen einer Deckschicht
DE941017C (de) * 1939-11-18 1956-03-29 Leitz Ernst Gmbh Verfahren zum Aufbringen von Schichten aus Kieselsaeure und aehnlichen Verbindungen auf optisch wirksame Flaechen, insbesondere Glasflaechen
CH292125A (de) * 1949-04-28 1953-07-31 Alois Dr Vogt Blendschutzbelag an lichtdurchlässigem Träger und Verfahren zur Herstellung desselben.
US2804405A (en) * 1954-12-24 1957-08-27 Bell Telephone Labor Inc Manufacture of silicon devices
DE1250006B (cg-RX-API-DMAC10.html) * 1961-05-11 1967-09-14

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3663277A (en) * 1969-08-04 1972-05-16 Ncr Co Method of insulating multilevel conductors

Also Published As

Publication number Publication date
US3505106A (en) 1970-04-07
DE1267056B (de) 1968-04-25
DE1258702B (de) 1968-01-11
BE629895A (cg-RX-API-DMAC10.html) 1900-01-01
FR1335333A (fr) 1963-08-16
CH430817A (de) 1967-02-28
NL133910C (cg-RX-API-DMAC10.html) 1900-01-01
NL283620A (cg-RX-API-DMAC10.html) 1900-01-01
GB992045A (en) 1965-05-12
BE622794A (cg-RX-API-DMAC10.html) 1900-01-01

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