FR1335333A - Procédé de formation d'une pellicule de verre sur un objet et produit obtenu grâce à ce procédé - Google Patents
Procédé de formation d'une pellicule de verre sur un objet et produit obtenu grâce à ce procédéInfo
- Publication number
- FR1335333A FR1335333A FR910580A FR910580A FR1335333A FR 1335333 A FR1335333 A FR 1335333A FR 910580 A FR910580 A FR 910580A FR 910580 A FR910580 A FR 910580A FR 1335333 A FR1335333 A FR 1335333A
- Authority
- FR
- France
- Prior art keywords
- forming
- product obtained
- glass film
- glass
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
- H01L21/02129—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being boron or phosphorus doped silicon oxides, e.g. BPSG, BSG or PSG
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23D—ENAMELLING OF, OR APPLYING A VITREOUS LAYER TO, METALS
- C23D11/00—Continuous processes; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23D—ENAMELLING OF, OR APPLYING A VITREOUS LAYER TO, METALS
- C23D5/00—Coating with enamels or vitreous layers
- C23D5/02—Coating with enamels or vitreous layers by wet methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/08—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances quartz; glass; glass wool; slag wool; vitreous enamels
- H01B3/088—Shaping of glass or deposition of glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/02—Apparatus or processes specially adapted for manufacturing resistors adapted for manufacturing resistors with envelope or housing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G13/00—Apparatus specially adapted for manufacturing capacitors; Processes specially adapted for manufacturing capacitors not provided for in groups H01G4/00 - H01G11/00
- H01G13/003—Apparatus or processes for encapsulating capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Ceramic Engineering (AREA)
- Glass Compositions (AREA)
- Formation Of Insulating Films (AREA)
- Surface Treatment Of Glass (AREA)
- Inorganic Insulating Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US141668A US3212921A (en) | 1961-09-29 | 1961-09-29 | Method of forming a glass film on an object and the product produced thereby |
US181743A US3212929A (en) | 1962-03-22 | 1962-03-22 | Method of forming a glass film on an object |
US50797765A | 1965-09-22 | 1965-09-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1335333A true FR1335333A (fr) | 1963-08-16 |
Family
ID=27385687
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR910580A Expired FR1335333A (fr) | 1961-09-29 | 1962-09-27 | Procédé de formation d'une pellicule de verre sur un objet et produit obtenu grâce à ce procédé |
Country Status (7)
Country | Link |
---|---|
US (1) | US3505106A (fr) |
BE (2) | BE622794A (fr) |
CH (1) | CH430817A (fr) |
DE (2) | DE1267056B (fr) |
FR (1) | FR1335333A (fr) |
GB (2) | GB992044A (fr) |
NL (2) | NL133910C (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2162082A1 (fr) * | 1971-11-30 | 1973-07-13 | Union Carbide Corp |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3632434A (en) * | 1969-01-21 | 1972-01-04 | Jerald L Hutson | Process for glass passivating silicon semiconductor junctions |
US3663277A (en) * | 1969-08-04 | 1972-05-16 | Ncr Co | Method of insulating multilevel conductors |
US3676756A (en) * | 1969-09-18 | 1972-07-11 | Innotech Corp | Insulated gate field effect device having glass gate insulator |
US3731159A (en) * | 1971-05-19 | 1973-05-01 | Anheuser Busch | Microwave diode with low capacitance package |
US4374391A (en) * | 1980-09-24 | 1983-02-15 | Bell Telephone Laboratories, Incorporated | Device fabrication procedure |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE666930C (de) * | 1936-09-26 | 1938-11-01 | Philips Patentverwaltung | Verfahren zum Herstellen einer Deckschicht |
DE941017C (de) * | 1939-11-18 | 1956-03-29 | Leitz Ernst Gmbh | Verfahren zum Aufbringen von Schichten aus Kieselsaeure und aehnlichen Verbindungen auf optisch wirksame Flaechen, insbesondere Glasflaechen |
CH292125A (de) * | 1949-04-28 | 1953-07-31 | Alois Dr Vogt | Blendschutzbelag an lichtdurchlässigem Träger und Verfahren zur Herstellung desselben. |
US2804405A (en) * | 1954-12-24 | 1957-08-27 | Bell Telephone Labor Inc | Manufacture of silicon devices |
NL278370A (fr) * | 1961-05-11 |
-
0
- BE BE629895D patent/BE629895A/xx unknown
- BE BE622794D patent/BE622794A/xx unknown
- NL NL283620D patent/NL283620A/xx unknown
- NL NL133910D patent/NL133910C/xx active
-
1962
- 1962-08-29 GB GB33208/62A patent/GB992044A/en not_active Expired
- 1962-09-22 DE DEJ22418A patent/DE1267056B/de active Pending
- 1962-09-22 DE DEJ22417A patent/DE1258702B/de active Pending
- 1962-09-26 CH CH1132862A patent/CH430817A/de unknown
- 1962-09-27 FR FR910580A patent/FR1335333A/fr not_active Expired
-
1963
- 1963-03-20 GB GB10995/62A patent/GB992045A/en not_active Expired
-
1965
- 1965-09-22 US US507977A patent/US3505106A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2162082A1 (fr) * | 1971-11-30 | 1973-07-13 | Union Carbide Corp |
Also Published As
Publication number | Publication date |
---|---|
GB992044A (en) | 1965-05-12 |
NL283620A (fr) | 1900-01-01 |
CH430817A (de) | 1967-02-28 |
NL133910C (fr) | 1900-01-01 |
DE1267056B (de) | 1968-04-25 |
US3505106A (en) | 1970-04-07 |
DE1258702B (de) | 1968-01-11 |
BE622794A (fr) | 1900-01-01 |
BE629895A (fr) | 1900-01-01 |
GB992045A (en) | 1965-05-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR1346517A (fr) | Procédé d'obtention de pellicules thermoplastiques orientées | |
CH328462A (fr) | Procédé pour la production d'un matériel photographique | |
FR1335333A (fr) | Procédé de formation d'une pellicule de verre sur un objet et produit obtenu grâce à ce procédé | |
FR83863E (fr) | Procédé de formation d'une pellicule de verre sur un objet et produit obtenu grâce à ce procédé | |
CH533507A (fr) | Procédé et installation pour la fabrication d'un article pelliculaire, et article obtenu | |
FR1109057A (fr) | Procédé d'obtention de matières plastiques ininflammables | |
FR1343506A (fr) | Procédé de fabrication d'un récipient en matière plastique notamment pour l'horitculture et récipient conforme à celui obtenu par ce procédé | |
FR1293201A (fr) | Procédé et appareil de formation d'une pellicule sur une surface de verre | |
FR1471485A (fr) | Procédé et dispositif pour la fabrication de panneaux en matériau résineux synthétique contenant des produits synthétiques expansés et panneaux obtenus | |
CH522541A (fr) | Procédé de formage d'un obturateur moleté de récipient, et obturateur de récipient formé selon ce procédé | |
FR1429107A (fr) | Procédé de fabrication de pellicules de copolymères d'acrylonitrile et produits obtenus | |
FR1331139A (fr) | Procédé et appareil pour former une feuille de verre continue | |
CH472215A (fr) | Procédé de fabrication d'un biberon et biberon obtenu par ce procédé | |
CH438911A (fr) | Procédé pour la fabrication d'un échantillon d'un plastique stratifié et échantillon obtenu selon ce procédé | |
FR1334117A (fr) | Procédé et dispositif pour la production d'objets moulés à partir de matières plastiques cellulaires | |
FR1287068A (fr) | Procédé de fabrication d'un produit lacté et produit obtenu par ce procédé | |
FR1095924A (fr) | Procédé de fabrication industrielle d'écrans pour projections cinematographiques ou analogues, et produits en résultant | |
BE604134A (fr) | Procédé et appareil pour former une pellicule sur une surface de verre. | |
OA02980A (fr) | Procédé pour l'obtention de nouvelles matières plastiques et produits obtenus. | |
FR1483093A (fr) | Procédé de production d'un catalyseur et catalyseur obtenu | |
FR1314921A (fr) | Procédé de formage d'un article en verre | |
FR1283301A (fr) | Procédé d'obtention d'une pellicule formant pansement | |
FR1114194A (fr) | Procédé et dispositif pour la fabrication en continu d'articles en matières plastiques | |
FR1458015A (fr) | Procédé de production d'époxyesters et produits obtenus | |
FR1330319A (fr) | Procédé pour l'amélioration de l'état de surface d'articles en matière plastique renforcée et articles obtenus par ce procédé |