GB986360A - Process for the fabrication of high definition apertured masks - Google Patents

Process for the fabrication of high definition apertured masks

Info

Publication number
GB986360A
GB986360A GB37260/63A GB3726063A GB986360A GB 986360 A GB986360 A GB 986360A GB 37260/63 A GB37260/63 A GB 37260/63A GB 3726063 A GB3726063 A GB 3726063A GB 986360 A GB986360 A GB 986360A
Authority
GB
United Kingdom
Prior art keywords
lamina
etchant
etching
acid
high definition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB37260/63A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NCR Voyix Corp
National Cash Register Co
Original Assignee
NCR Corp
National Cash Register Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NCR Corp, National Cash Register Co filed Critical NCR Corp
Publication of GB986360A publication Critical patent/GB986360A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • ing And Chemical Polishing (AREA)
GB37260/63A 1962-11-02 1963-09-23 Process for the fabrication of high definition apertured masks Expired GB986360A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23511262A 1962-11-02 1962-11-02

Publications (1)

Publication Number Publication Date
GB986360A true GB986360A (en) 1965-03-17

Family

ID=22884146

Family Applications (1)

Application Number Title Priority Date Filing Date
GB37260/63A Expired GB986360A (en) 1962-11-02 1963-09-23 Process for the fabrication of high definition apertured masks

Country Status (4)

Country Link
BE (1) BE638835A (https=)
CH (1) CH418092A (https=)
GB (1) GB986360A (https=)
NL (1) NL299392A (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2705044C1 (ru) * 2018-11-22 2019-11-01 Сергей Геннадьевич Каплунов Способ получения рельефного изображения на металлическом основании
RU2716919C1 (ru) * 2019-09-20 2020-03-17 Сергей Геннадьевич Каплунов Способ воспроизведения авторских рисунков на металлографской доске методом углубленной гравюры
RU2722799C1 (ru) * 2019-10-10 2020-06-03 Сергей Геннадьевич Каплунов Способ воспроизведения авторских рисунков на металлографской доске методом углубленной гравюры
RU2722966C1 (ru) * 2019-11-05 2020-06-05 Сергей Геннадьевич Каплунов Способ изготовления печатной формы для офорта
CN113140654A (zh) * 2021-03-31 2021-07-20 扬州工业职业技术学院 一种太阳能电池金属基的制备方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2705044C1 (ru) * 2018-11-22 2019-11-01 Сергей Геннадьевич Каплунов Способ получения рельефного изображения на металлическом основании
WO2020106176A1 (ru) * 2018-11-22 2020-05-28 Сергей Геннадьевич КАПЛУНОВ Способ получения рельефного изображения на металлическом основании
RU2716919C1 (ru) * 2019-09-20 2020-03-17 Сергей Геннадьевич Каплунов Способ воспроизведения авторских рисунков на металлографской доске методом углубленной гравюры
RU2722799C1 (ru) * 2019-10-10 2020-06-03 Сергей Геннадьевич Каплунов Способ воспроизведения авторских рисунков на металлографской доске методом углубленной гравюры
RU2722966C1 (ru) * 2019-11-05 2020-06-05 Сергей Геннадьевич Каплунов Способ изготовления печатной формы для офорта
CN113140654A (zh) * 2021-03-31 2021-07-20 扬州工业职业技术学院 一种太阳能电池金属基的制备方法

Also Published As

Publication number Publication date
BE638835A (https=)
NL299392A (https=)
CH418092A (fr) 1966-07-31

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