GB971574A - Improvements in or relating to imagewise photopolymerization - Google Patents
Improvements in or relating to imagewise photopolymerizationInfo
- Publication number
- GB971574A GB971574A GB3584762A GB3584762A GB971574A GB 971574 A GB971574 A GB 971574A GB 3584762 A GB3584762 A GB 3584762A GB 3584762 A GB3584762 A GB 3584762A GB 971574 A GB971574 A GB 971574A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- sept
- coated
- carrier
- dispersed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/0285—Silver salts, e.g. a latent silver salt image
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14069961A | 1961-09-26 | 1961-09-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB971574A true GB971574A (en) | 1964-09-30 |
Family
ID=22492421
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3584762A Expired GB971574A (en) | 1961-09-26 | 1962-09-20 | Improvements in or relating to imagewise photopolymerization |
Country Status (2)
Country | Link |
---|---|
BE (1) | BE622882A (et) |
GB (1) | GB971574A (et) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0426192A2 (en) * | 1989-11-01 | 1991-05-08 | Fuji Photo Film Co., Ltd. | Light-sensitive material comprising polymerizable layer and light-sensitive layer provided on support |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0258719A3 (de) * | 1986-08-30 | 1989-07-05 | Ciba-Geigy Ag | Zweischichtensystem |
-
0
- BE BE622882D patent/BE622882A/xx unknown
-
1962
- 1962-09-20 GB GB3584762A patent/GB971574A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0426192A2 (en) * | 1989-11-01 | 1991-05-08 | Fuji Photo Film Co., Ltd. | Light-sensitive material comprising polymerizable layer and light-sensitive layer provided on support |
EP0426192A3 (en) * | 1989-11-01 | 1991-07-17 | Fuji Photo Film Co., Ltd. | Light-sensitive material comprising polymerizable layer and light-sensitive layer provided on support |
Also Published As
Publication number | Publication date |
---|---|
BE622882A (et) |
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