GB9405242D0 - Developers for ps plates and replinishers therefor - Google Patents

Developers for ps plates and replinishers therefor

Info

Publication number
GB9405242D0
GB9405242D0 GB9405242A GB9405242A GB9405242D0 GB 9405242 D0 GB9405242 D0 GB 9405242D0 GB 9405242 A GB9405242 A GB 9405242A GB 9405242 A GB9405242 A GB 9405242A GB 9405242 D0 GB9405242 D0 GB 9405242D0
Authority
GB
United Kingdom
Prior art keywords
replinishers
developers
therefor
plates
replinishers therefor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB9405242A
Other versions
GB2276729A (en
GB2276729B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of GB9405242D0 publication Critical patent/GB9405242D0/en
Publication of GB2276729A publication Critical patent/GB2276729A/en
Application granted granted Critical
Publication of GB2276729B publication Critical patent/GB2276729B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
GB9405242A 1993-03-30 1994-03-17 Developers and replenishers for presensitised plates Expired - Fee Related GB2276729B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7158993A JP3086354B2 (en) 1993-03-30 1993-03-30 Developer and replenisher for photosensitive lithographic printing plates

Publications (3)

Publication Number Publication Date
GB9405242D0 true GB9405242D0 (en) 1994-04-27
GB2276729A GB2276729A (en) 1994-10-05
GB2276729B GB2276729B (en) 1996-08-14

Family

ID=13465018

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9405242A Expired - Fee Related GB2276729B (en) 1993-03-30 1994-03-17 Developers and replenishers for presensitised plates

Country Status (3)

Country Link
JP (1) JP3086354B2 (en)
DE (1) DE4411176B4 (en)
GB (1) GB2276729B (en)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0555148U (en) * 1991-12-27 1993-07-23 コニカ株式会社 Simple camera
NL9400920A (en) * 1994-06-07 1996-01-02 Davatech Europ V O F Developer composition for positive-acting lithographic printing plates and method for developing positive-acting lithographic printing plates.
EP0732628A1 (en) * 1995-03-07 1996-09-18 Minnesota Mining And Manufacturing Company Aqueous alkaline solution for developing offset printing plate
US5897985A (en) * 1996-10-11 1999-04-27 Kodak Polychrome Graphics, Llc Potassium silicate developing composition and method of use to process lithographic printing plates
US5766826A (en) * 1996-10-11 1998-06-16 Eastman Kodak Company Alkaline developing composition and method of use to process lithographic printing plates
US5811221A (en) * 1997-05-30 1998-09-22 Kodak Polychrome Graphics, Llc Alkaline developing composition and method of use to process lithographic printing plates
US6083662A (en) * 1997-05-30 2000-07-04 Kodak Polychrome Graphics Llc Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate
TW459162B (en) * 1997-08-01 2001-10-11 Shipley Co Llc Photoresist composition
US5998102A (en) * 1997-10-06 1999-12-07 Agfa Corporation Etch inhibitors in developer for lithographic printing plates
DE69905959T2 (en) 1998-04-06 2003-12-04 Fuji Photo Film Co Ltd Photosensitive resin composition
US6143479A (en) * 1999-08-31 2000-11-07 Kodak Polychrome Graphics Llc Developing system for alkaline-developable lithographic printing plates
US6255042B1 (en) 1999-11-24 2001-07-03 Kodak Polychrome Graphics, Llc Developing system for alkaline-developable lithographic printing plates with different interlayers
JP2002062663A (en) * 2000-08-14 2002-02-28 Fuji Photo Film Co Ltd Method for quality control of lithographic printing plate
EP1204003B1 (en) * 2000-11-03 2008-07-23 Kodak Graphic Communications GmbH Process for developing exposed radiation-sensitive printing plate precursors
US6391530B1 (en) 2000-11-03 2002-05-21 Kodak Polychrome Graphics, Llc Process for developing exposed radiation-sensitive printing plate precursors
US6541188B2 (en) * 2001-05-11 2003-04-01 Kodak Polychrome Graphics Llc Developer for alkaline-developable lithographic printing plates
US6649319B2 (en) 2001-06-11 2003-11-18 Kodak Polychrome Graphics Llc Method of processing lithographic printing plate precursors
US6562555B2 (en) 2001-08-01 2003-05-13 Kodak Polychrome Graphics Llc Method for developing lithographic printing plate precursors using a coating attack-suppressing agent
JP4514370B2 (en) * 2001-08-03 2010-07-28 富士フイルム株式会社 Planographic printing plate making method
JP2003315987A (en) 2002-02-21 2003-11-06 Fuji Photo Film Co Ltd Method for making lithographic printing plate
JP2004252395A (en) * 2002-05-07 2004-09-09 Shipley Co Llc Stable concentrate with reduced residue
US6849372B2 (en) 2002-07-30 2005-02-01 Kodak Polychrome Graphics Method of manufacturing imaging compositions
JPWO2005022267A1 (en) * 2003-09-01 2007-11-01 株式会社シンク・ラボラトリー Developer for positive photosensitive composition
EP2002987B1 (en) 2007-06-13 2014-04-23 Agfa Graphics N.V. A method for treating a lithographic printing plate
JP5444831B2 (en) 2009-05-15 2014-03-19 富士フイルム株式会社 Planographic printing plate precursor
JP2011090282A (en) 2009-09-25 2011-05-06 Fujifilm Corp Method for processing waste solution in plate-making process of photosensitive lithographic printing plate
EP2677365B1 (en) * 2011-02-16 2019-01-23 Toyobo Co., Ltd. Developer composition for printing plate, developer and method for manufacturing printing plate
JP5714544B2 (en) 2011-09-15 2015-05-07 富士フイルム株式会社 Recycling process waste liquid

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2543742B2 (en) * 1988-04-07 1996-10-16 富士写真フイルム株式会社 Developer for positive photoresist
JP2533793B2 (en) * 1988-06-17 1996-09-11 富士写真フイルム株式会社 Lithographic printing plate manufacturing method
JP2538793B2 (en) * 1988-07-29 1996-10-02 富士写真フイルム株式会社 Photosensitive lithographic printing plate developer

Also Published As

Publication number Publication date
JPH06282079A (en) 1994-10-07
GB2276729A (en) 1994-10-05
DE4411176B4 (en) 2007-08-30
GB2276729B (en) 1996-08-14
DE4411176A1 (en) 1994-10-06
JP3086354B2 (en) 2000-09-11

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20090317