GB9313876D0 - Semiconductor device and method of making same - Google Patents

Semiconductor device and method of making same

Info

Publication number
GB9313876D0
GB9313876D0 GB939313876A GB9313876A GB9313876D0 GB 9313876 D0 GB9313876 D0 GB 9313876D0 GB 939313876 A GB939313876 A GB 939313876A GB 9313876 A GB9313876 A GB 9313876A GB 9313876 D0 GB9313876 D0 GB 9313876D0
Authority
GB
United Kingdom
Prior art keywords
semiconductor device
making same
making
same
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB939313876A
Other versions
GB2279806B (en
GB2279806A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Europe Ltd
Original Assignee
Toshiba Cambridge Research Centre Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Cambridge Research Centre Ltd filed Critical Toshiba Cambridge Research Centre Ltd
Priority to GB9313876A priority Critical patent/GB2279806B/en
Publication of GB9313876D0 publication Critical patent/GB9313876D0/en
Priority to JP15378494A priority patent/JPH07142706A/en
Publication of GB2279806A publication Critical patent/GB2279806A/en
Application granted granted Critical
Publication of GB2279806B publication Critical patent/GB2279806B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409Unipolar field-effect transistors
    • H01L29/66446Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET]
    • H01L29/66462Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET] with a heterojunction interface channel or gate, e.g. HFET, HIGFET, SISFET, HJFET, HEMT
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28575Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/45Ohmic electrodes
    • H01L29/452Ohmic electrodes on AIII-BV compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
GB9313876A 1993-07-05 1993-07-05 Semiconductor device and method of making same Expired - Fee Related GB2279806B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB9313876A GB2279806B (en) 1993-07-05 1993-07-05 Semiconductor device and method of making same
JP15378494A JPH07142706A (en) 1993-07-05 1994-07-05 Heterojunction semiconductor device and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9313876A GB2279806B (en) 1993-07-05 1993-07-05 Semiconductor device and method of making same

Publications (3)

Publication Number Publication Date
GB9313876D0 true GB9313876D0 (en) 1993-08-18
GB2279806A GB2279806A (en) 1995-01-11
GB2279806B GB2279806B (en) 1997-05-21

Family

ID=10738322

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9313876A Expired - Fee Related GB2279806B (en) 1993-07-05 1993-07-05 Semiconductor device and method of making same

Country Status (2)

Country Link
JP (1) JPH07142706A (en)
GB (1) GB2279806B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005129696A (en) * 2003-10-23 2005-05-19 Matsushita Electric Ind Co Ltd Semiconductor device and its manufacturing method
JP4389935B2 (en) * 2004-09-30 2009-12-24 サンケン電気株式会社 Semiconductor device
JP2007329350A (en) * 2006-06-08 2007-12-20 Matsushita Electric Ind Co Ltd Semiconductor device
JP5313457B2 (en) * 2007-03-09 2013-10-09 パナソニック株式会社 Nitride semiconductor device and manufacturing method thereof
US8035927B2 (en) 2008-01-28 2011-10-11 Hitachi Global Storage Technologies Netherlands B.V. EMR magnetic sensor having its active quantum well layer extending beyond an over-lying semiconductor layer end with tab and lead structure for improved electrical contact
JP2011228720A (en) * 2011-05-30 2011-11-10 Panasonic Corp Semiconductor device
JP5364760B2 (en) * 2011-07-25 2013-12-11 パナソニック株式会社 Semiconductor device
WO2023189048A1 (en) * 2022-03-29 2023-10-05 ローム株式会社 Nitride semiconductor device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57176772A (en) * 1981-04-23 1982-10-30 Fujitsu Ltd Semiconductor device and manufacture thereof
US4558337A (en) * 1984-05-30 1985-12-10 Texas Instruments Inc. Multiple high electron mobility transistor structures without inverted heterojunctions
NL8500218A (en) * 1985-01-28 1986-08-18 Philips Nv SEMICONDUCTOR DEVICE WITH TWO-DIMENSIONAL CARRIER GAS.

Also Published As

Publication number Publication date
GB2279806B (en) 1997-05-21
JPH07142706A (en) 1995-06-02
GB2279806A (en) 1995-01-11

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20100705