GB893878A - Improvements in or relating to power transistors - Google Patents

Improvements in or relating to power transistors

Info

Publication number
GB893878A
GB893878A GB23396/58A GB2339658A GB893878A GB 893878 A GB893878 A GB 893878A GB 23396/58 A GB23396/58 A GB 23396/58A GB 2339658 A GB2339658 A GB 2339658A GB 893878 A GB893878 A GB 893878A
Authority
GB
United Kingdom
Prior art keywords
ohms
base region
transistors
collector
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB23396/58A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Schuckertwerke AG
Siemens AG
Original Assignee
Siemens Schuckertwerke AG
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Schuckertwerke AG, Siemens AG filed Critical Siemens Schuckertwerke AG
Publication of GB893878A publication Critical patent/GB893878A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/24Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Bipolar Transistors (AREA)

Abstract

893,878. Transistors. SIEMENS-SCHUCKERTWERKE A.G. July 21, 1958 [July 23, 1957], No. 23396/58. Class 37. In a power transistor capable of operation at the voltage of public supply systems comprising a monocrystalline semi-conductor element consisting of two highly-doped regions of one conductivity type separated by step junctions from an intermediate less highly-doped base region of the opposite conductivity type of thickness W cm. and resistivity p ohm cm., the factor #/W has a value between one-half and twice W 1 #ohms, where #o=8.86.10<-14> A.Secs./ #0#Á . Ek V cm., # is the dielectric constant of the base region material, Á the mobility in cm.<2>/V.Sec. of majority carriers in the base region and Ek the critical electric field strength in Volts/em. of the base region material. Suitable values for #/W for silicon NPN transistors are 5000 to 20,000 ohms, for silicon PNP transistors 1500 to 6000 ohms. for germanium PNP transistors 500 to 2000 ohms, and for germanium NPN transistors 1250 to 5000 ohms. A typical transistor (Fig. 1) is made by alloying antimony doped gold to one face of a P-type silicon disc B to form a collector C and antimony doped gold and an annular aluminium or aluminium alloy member to the opposite face of the disc to form emitter E and base contact A respectively. The criteria for #/W set forth above correspond to the requirement W that avalanche breakdown of the collector junction and punch through between emitter and collector occur at about the same voltage.
GB23396/58A 1957-07-23 1958-07-21 Improvements in or relating to power transistors Expired GB893878A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE893878X 1957-07-23

Publications (1)

Publication Number Publication Date
GB893878A true GB893878A (en) 1962-04-18

Family

ID=6846837

Family Applications (1)

Application Number Title Priority Date Filing Date
GB23396/58A Expired GB893878A (en) 1957-07-23 1958-07-21 Improvements in or relating to power transistors

Country Status (1)

Country Link
GB (1) GB893878A (en)

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