GB872973A - A method of manufacturing selenium rectifiers - Google Patents
A method of manufacturing selenium rectifiersInfo
- Publication number
- GB872973A GB872973A GB12561/60A GB1256160A GB872973A GB 872973 A GB872973 A GB 872973A GB 12561/60 A GB12561/60 A GB 12561/60A GB 1256160 A GB1256160 A GB 1256160A GB 872973 A GB872973 A GB 872973A
- Authority
- GB
- United Kingdom
- Prior art keywords
- selenium
- nickel
- gms
- deposition
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
- H01L21/08—Preparation of the foundation plate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02425—Conductive materials, e.g. metallic silicides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02485—Other chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02491—Conductive materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02614—Transformation of metal, e.g. oxidation, nitridation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02658—Pretreatments
Abstract
872,973. Semi-conductor devices; electrodeposition. LICENTIA PATENT-VERWALTUNGS-G.m.b.H. April 8, 1960 [April 13, 1959], No. 12561/60. Classes 37 and 41. A method of applying a layer of nickel selenide intermediate the carrier electrode and the selenium layer in a selenium rectifier comprises simultaneous galvanic deposition of nickel and selenium on the carrier electrode preferably followed by a heat treatment. In a preferred embodiment an aluminium carrier electrode is surface roughened, e.g. by sand blasting, and then suspended and connected as the cathode in an electrolytic bath composed of about 100 litre water, 2500 to 3000 gms. selenium dioxide, about 1500 gms. nickel ammonium sulphate and 300 gms. nickel sulphate with a nickel plate as the anode. The bath is set to pH value between 2.5 and 3.5 by means of ammonia and the temperature controlled to between 55‹ and 70‹ C. and the deposition carried out with a current density greater than 1.5 amps/(dm.)<2>. A flocculent white coat which forms on the cathode is removed by periodically striking the aluminium plate in the direction of the plane of the sheet. After the deposition the sheet is rinsed in water and dried in hot air and then preferably heated for from 4 to 7 minutes at a temperature of between 260‹ and 280‹ C. before applying the selenium layer and the counter electrode. The strength of the electrolytic bath may be maintained for continuous treatment of carrier electrodes by the addition of selenium dioxide as the selenium is deposited, the consumption of nickel being equalized by dissolution of the anode.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEL32957A DE1118887B (en) | 1959-04-13 | 1959-04-13 | Process for the production of selenium dry rectifiers |
Publications (1)
Publication Number | Publication Date |
---|---|
GB872973A true GB872973A (en) | 1961-07-19 |
Family
ID=7266107
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB12561/60A Expired GB872973A (en) | 1959-04-13 | 1960-04-08 | A method of manufacturing selenium rectifiers |
Country Status (3)
Country | Link |
---|---|
CH (1) | CH387802A (en) |
DE (1) | DE1118887B (en) |
GB (1) | GB872973A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4400244A (en) * | 1976-06-08 | 1983-08-23 | Monosolar, Inc. | Photo-voltaic power generating means and methods |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1276214B (en) * | 1965-03-15 | 1968-08-29 | Licentia Gmbh | Method of manufacturing a selenium rectifier plate |
US6778749B2 (en) | 2001-03-20 | 2004-08-17 | Corning Incorporated | Optimized defects in band-gap waveguides |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE474674A (en) * | 1945-05-12 | |||
US2568780A (en) * | 1947-03-01 | 1951-09-25 | Standard Telephones Cables Ltd | Rectifier manufacturing process and products obtained thereby |
DE887847C (en) * | 1948-10-02 | 1953-08-27 | Siemens Ag | Method for improving the blocking resistance of selenium rectifiers |
NL153851B (en) * | 1949-05-30 | Lonza Ag | PROCESS FOR THE PREPARATION OF METHACRYLIC ACID FROM ALPHA-HYDROXYISOBUTIC ACID. |
-
1959
- 1959-04-13 DE DEL32957A patent/DE1118887B/en active Pending
-
1960
- 1960-04-02 CH CH374060A patent/CH387802A/en unknown
- 1960-04-08 GB GB12561/60A patent/GB872973A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4400244A (en) * | 1976-06-08 | 1983-08-23 | Monosolar, Inc. | Photo-voltaic power generating means and methods |
Also Published As
Publication number | Publication date |
---|---|
DE1118887B (en) | 1961-12-07 |
CH387802A (en) | 1965-02-15 |
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