GB856884A - Improvements in the grafting of monomers to hydrogen-containing high-polymeric materials - Google Patents
Improvements in the grafting of monomers to hydrogen-containing high-polymeric materialsInfo
- Publication number
- GB856884A GB856884A GB28387/57A GB2838757A GB856884A GB 856884 A GB856884 A GB 856884A GB 28387/57 A GB28387/57 A GB 28387/57A GB 2838757 A GB2838757 A GB 2838757A GB 856884 A GB856884 A GB 856884A
- Authority
- GB
- United Kingdom
- Prior art keywords
- vinyl
- ultra
- violet light
- polymeric
- acrylamide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M14/00—Graft polymerisation of monomers containing carbon-to-carbon unsaturated bonds on to fibres, threads, yarns, fabrics, or fibrous goods made from such materials
- D06M14/18—Graft polymerisation of monomers containing carbon-to-carbon unsaturated bonds on to fibres, threads, yarns, fabrics, or fibrous goods made from such materials using wave energy or particle radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/123—Ultra-violet light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Toxicology (AREA)
- Organic Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Graft polymers are made by irradiating a hydrogen containing high-molecular weight organic material with ultra violet light having a wavelength of between 170 and 300 millimicrons in the presence of an organic activator, which is capable of absorbing ultra-violet light with a quantum efficiency between 10-2 and unity, for a period of time sufficient to form freeradicals in the polymeric material and simultaneously or subsequently contacting the polymeric material with at least one ethylenically unsaturated organic monomer capable of polymerizing in the presence of free radicals, e.g. acrylonitrile, acrylamide, N-octyl acrylamide, methyl methacrylate, acrylic and methacrylic acids, styrene, vinyl chloride, vinyl acetate, vinyl pyridine, vinyl pyrrolidone, vinyl pyrrolidine and allyl alcohol. Specified polymeric materials are polypeptides (listed), paper, wood, regenerated cellulose, cellulose nitrate and acetate, natural rubber, polyethylene, polypropylene, polyisobutylene, polystyrene, polyacrylonitrile, polyvinyl chloride, polyvinyl acetate, polyvinyl pyrrolidine, polyacrylic and polymethacrylic acids, polyethylene terephthalate, nylons, polyethers, phenol-formaldehyde condensates, melamine condensates and urea-formaldehyde condensates. Activators specified are diphenylamine, benzyl disulphide, acetophenone, benzophenone, acetone, thiamine chloride, alkaline cystine and ninhydrin. The process may be applied to polymeric materials in the form of fibres, films, blocks, &c. whereby desirable surface characteristics may be imparted, e.g. dyeability, moisture affinity and resistance and adhesiveness. Alternatively the polymeric material may be in divided form or in solution or dispersion.ALSO:The tendency of a nylon fabric to accumulate electrostatic charges is reduced by irradiating the fabric, to which benzophenone has been added, with ultra-violet light, and then contacting the fabric with a mixture of vinyl pyridine and vinyl pyrrolidone to provide a graft polymeric coating.ALSO:Tubes, bottles, containers and other shaped objects made from high-polymeric organic materials e.g. polypeptide materials, cellulose and its derivatives, and synthetic resins, are coated by irradiating the object with ultra-violet light in the presence of an activator (see Group IV(a)) and simultaneously or subsequently contacting the irradiated object with an ethylenically unsaturated monomer e.g. acrylamide, acrylonitrile, styrene, methyl methacrylate, vinyl pyrroline, methacrylic acid, vinyl chloride and alkyl alcohol, which graft polymerizes on to the object. In Examples: (6) a slab of natural rubber is coated with an aqueous solution of acrylamide and then irradiated with ultra-violet light thereby producing a hydrophilic surface on the rubber; and (10) a block of wood is coated with N-octylacrylamide and then irradiated with ultra-violet light thereby rendering the surface of the block hydrophobic.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US856884XA | 1956-09-21 | 1956-09-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB856884A true GB856884A (en) | 1960-12-21 |
Family
ID=22193291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB28387/57A Expired GB856884A (en) | 1956-09-21 | 1957-09-09 | Improvements in the grafting of monomers to hydrogen-containing high-polymeric materials |
Country Status (2)
Country | Link |
---|---|
BE (1) | BE560986A (en) |
GB (1) | GB856884A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2392411A1 (en) * | 1977-05-23 | 1978-12-22 | Asahi Chemical Ind | METHOD FOR REMOVING THE SURFACE VISCOSITY OF A COMPOSITION OF FREE RADICAL POLYMERIZED RESIN AND HARDENED |
EP0017032A2 (en) * | 1979-03-12 | 1980-10-15 | Western Electric Company, Incorporated | Method of producing a solid state device by differential plasma etching of resists |
EP0091651A2 (en) * | 1982-04-12 | 1983-10-19 | Nippon Telegraph And Telephone Corporation | Method for forming micropattern |
EP0328655A1 (en) * | 1987-07-27 | 1989-08-23 | Hitachi, Ltd. | Pattern-forming process utilizing radiation-induced graft polymerization reaction |
US6225368B1 (en) | 1998-09-15 | 2001-05-01 | National Power Plc | Water based grafting |
-
0
- BE BE560986D patent/BE560986A/xx unknown
-
1957
- 1957-09-09 GB GB28387/57A patent/GB856884A/en not_active Expired
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2392411A1 (en) * | 1977-05-23 | 1978-12-22 | Asahi Chemical Ind | METHOD FOR REMOVING THE SURFACE VISCOSITY OF A COMPOSITION OF FREE RADICAL POLYMERIZED RESIN AND HARDENED |
EP0017032A2 (en) * | 1979-03-12 | 1980-10-15 | Western Electric Company, Incorporated | Method of producing a solid state device by differential plasma etching of resists |
EP0017032B1 (en) * | 1979-03-12 | 1984-02-15 | Western Electric Company, Incorporated | Method of producing a solid state device by differential plasma etching of resists |
EP0091651A2 (en) * | 1982-04-12 | 1983-10-19 | Nippon Telegraph And Telephone Corporation | Method for forming micropattern |
EP0091651A3 (en) * | 1982-04-12 | 1984-10-17 | Nippon Telegraph And Telephone Public Corporation | Method for forming micropattern |
EP0328655A1 (en) * | 1987-07-27 | 1989-08-23 | Hitachi, Ltd. | Pattern-forming process utilizing radiation-induced graft polymerization reaction |
EP0328655A4 (en) * | 1987-07-27 | 1989-11-27 | Hitachi Ltd | Pattern-forming process utilizing radiation-induced graft polymerization reaction. |
US6225368B1 (en) | 1998-09-15 | 2001-05-01 | National Power Plc | Water based grafting |
US6387964B1 (en) | 1998-09-15 | 2002-05-14 | International Power Plc | Water based grafting |
Also Published As
Publication number | Publication date |
---|---|
BE560986A (en) |
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