GB8333914D0 - Apparatus for drawing electron beam pattern - Google Patents
Apparatus for drawing electron beam patternInfo
- Publication number
- GB8333914D0 GB8333914D0 GB838333914A GB8333914A GB8333914D0 GB 8333914 D0 GB8333914 D0 GB 8333914D0 GB 838333914 A GB838333914 A GB 838333914A GB 8333914 A GB8333914 A GB 8333914A GB 8333914 D0 GB8333914 D0 GB 8333914D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- electron beam
- beam pattern
- drawing electron
- pattern
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22417282A JPS59114818A (en) | 1982-12-21 | 1982-12-21 | Electron beam pattern drawing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB8333914D0 true GB8333914D0 (en) | 1984-02-01 |
| GB2132390A GB2132390A (en) | 1984-07-04 |
| GB2132390B GB2132390B (en) | 1986-07-30 |
Family
ID=16809654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB08333914A Expired GB2132390B (en) | 1982-12-21 | 1983-12-20 | Method of and apparatus for drawing an electron beam pattern |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS59114818A (en) |
| DE (1) | DE3346001A1 (en) |
| GB (1) | GB2132390B (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6246518A (en) * | 1985-08-23 | 1987-02-28 | Toshiba Corp | Charged beam patterning method |
| DE4442596C1 (en) * | 1994-11-30 | 1996-04-04 | Heidelberg Instruments Mikrotechnik Gmbh | Position measuring error correction system for lithography device |
| DE19811081C1 (en) * | 1998-03-13 | 1999-10-28 | Siemens Ag | Holding device for photoblanks |
| DE19816220C1 (en) * | 1998-04-09 | 1999-07-22 | Siemens Ag | Photomask blank earthing monitoring method for DRAM or logic circuit mfr. |
| DE10232230A1 (en) | 2002-07-17 | 2004-02-05 | Pro-Beam Ag & Co. Kgaa | Method for measuring the intensity profile of an electron beam, in particular a beam of an electron beam processing device, and / or for measuring an optic for an electron beam and / or for adjusting an optic for an electron beam, measuring structure for such a method and electron beam processing device |
| US11532760B2 (en) | 2017-05-22 | 2022-12-20 | Howmedica Osteonics Corp. | Device for in-situ fabrication process monitoring and feedback control of an electron beam additive manufacturing process |
| EP3597333A1 (en) | 2018-07-19 | 2020-01-22 | Howmedica Osteonics Corporation | System and process for in-process electron beam profile and location analyses |
| DE102021202506A1 (en) | 2021-03-15 | 2022-03-24 | Carl Zeiss Smt Gmbh | Method for determining a beam shape of an electron beam |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
| JPS5498577A (en) * | 1978-01-20 | 1979-08-03 | Nippon Telegr & Teleph Corp <Ntt> | Correction method for electron beam scanning position |
| US4137459A (en) * | 1978-02-13 | 1979-01-30 | International Business Machines Corporation | Method and apparatus for applying focus correction in E-beam system |
| JPS5552223A (en) * | 1978-10-13 | 1980-04-16 | Nippon Telegr & Teleph Corp <Ntt> | Exposure method in electronic beam exposure device |
| JPS5621321A (en) * | 1979-07-27 | 1981-02-27 | Fujitsu Ltd | Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus |
| JPS56103420A (en) * | 1980-01-23 | 1981-08-18 | Hitachi Ltd | Compensating method for deflection distortion in charged particle beam apparatus |
| JPS56124234A (en) * | 1980-03-05 | 1981-09-29 | Hitachi Ltd | Correcting method for electron beam deflection |
-
1982
- 1982-12-21 JP JP22417282A patent/JPS59114818A/en active Granted
-
1983
- 1983-12-20 DE DE19833346001 patent/DE3346001A1/en active Granted
- 1983-12-20 GB GB08333914A patent/GB2132390B/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPH058566B2 (en) | 1993-02-02 |
| GB2132390A (en) | 1984-07-04 |
| JPS59114818A (en) | 1984-07-03 |
| DE3346001C2 (en) | 1991-09-05 |
| DE3346001A1 (en) | 1984-07-05 |
| GB2132390B (en) | 1986-07-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 746 | Register noted 'licences of right' (sect. 46/1977) |
Effective date: 19980929 |
|
| PE20 | Patent expired after termination of 20 years |
Effective date: 20031219 |