GB2132390B - Method of and apparatus for drawing an electron beam pattern - Google Patents

Method of and apparatus for drawing an electron beam pattern

Info

Publication number
GB2132390B
GB2132390B GB08333914A GB8333914A GB2132390B GB 2132390 B GB2132390 B GB 2132390B GB 08333914 A GB08333914 A GB 08333914A GB 8333914 A GB8333914 A GB 8333914A GB 2132390 B GB2132390 B GB 2132390B
Authority
GB
United Kingdom
Prior art keywords
electron beam
beam pattern
pattern
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08333914A
Other versions
GB2132390A (en
GB8333914D0 (en
Inventor
Yasuo Matsuoka
Fumio Komatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Publication of GB8333914D0 publication Critical patent/GB8333914D0/en
Publication of GB2132390A publication Critical patent/GB2132390A/en
Application granted granted Critical
Publication of GB2132390B publication Critical patent/GB2132390B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
GB08333914A 1982-12-21 1983-12-20 Method of and apparatus for drawing an electron beam pattern Expired GB2132390B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22417282A JPS59114818A (en) 1982-12-21 1982-12-21 Electron beam pattern drawing method

Publications (3)

Publication Number Publication Date
GB8333914D0 GB8333914D0 (en) 1984-02-01
GB2132390A GB2132390A (en) 1984-07-04
GB2132390B true GB2132390B (en) 1986-07-30

Family

ID=16809654

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08333914A Expired GB2132390B (en) 1982-12-21 1983-12-20 Method of and apparatus for drawing an electron beam pattern

Country Status (3)

Country Link
JP (1) JPS59114818A (en)
DE (1) DE3346001A1 (en)
GB (1) GB2132390B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6246518A (en) * 1985-08-23 1987-02-28 Toshiba Corp Charged beam patterning method
DE4442596C1 (en) * 1994-11-30 1996-04-04 Heidelberg Instruments Mikrotechnik Gmbh Position measuring error correction system for lithography device
DE19811081C1 (en) * 1998-03-13 1999-10-28 Siemens Ag Holding device for photoblanks
DE19816220C1 (en) * 1998-04-09 1999-07-22 Siemens Ag Photomask blank earthing monitoring method for DRAM or logic circuit mfr.
DE10232230A1 (en) 2002-07-17 2004-02-05 Pro-Beam Ag & Co. Kgaa Method for measuring the intensity profile of an electron beam, in particular a beam of an electron beam processing device, and / or for measuring an optic for an electron beam and / or for adjusting an optic for an electron beam, measuring structure for such a method and electron beam processing device
US11532760B2 (en) 2017-05-22 2022-12-20 Howmedica Osteonics Corp. Device for in-situ fabrication process monitoring and feedback control of an electron beam additive manufacturing process
AU2019206103A1 (en) 2018-07-19 2020-02-06 Howmedica Osteonics Corp. System and process for in-process electron beam profile and location analyses
DE102021202506A1 (en) 2021-03-15 2022-03-24 Carl Zeiss Smt Gmbh Method for determining a beam shape of an electron beam

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
JPS5498577A (en) * 1978-01-20 1979-08-03 Nippon Telegr & Teleph Corp <Ntt> Correction method for electron beam scanning position
US4137459A (en) * 1978-02-13 1979-01-30 International Business Machines Corporation Method and apparatus for applying focus correction in E-beam system
JPS5552223A (en) * 1978-10-13 1980-04-16 Nippon Telegr & Teleph Corp <Ntt> Exposure method in electronic beam exposure device
JPS5621321A (en) * 1979-07-27 1981-02-27 Fujitsu Ltd Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus
JPS56103420A (en) * 1980-01-23 1981-08-18 Hitachi Ltd Compensating method for deflection distortion in charged particle beam apparatus
JPS56124234A (en) * 1980-03-05 1981-09-29 Hitachi Ltd Correcting method for electron beam deflection

Also Published As

Publication number Publication date
JPH058566B2 (en) 1993-02-02
GB2132390A (en) 1984-07-04
JPS59114818A (en) 1984-07-03
GB8333914D0 (en) 1984-02-01
DE3346001A1 (en) 1984-07-05
DE3346001C2 (en) 1991-09-05

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Legal Events

Date Code Title Description
746 Register noted 'licences of right' (sect. 46/1977)

Effective date: 19980929

PE20 Patent expired after termination of 20 years

Effective date: 20031219