GB829605A - Method of regenerating a glass etching bath - Google Patents
Method of regenerating a glass etching bathInfo
- Publication number
- GB829605A GB829605A GB4276/58A GB427658A GB829605A GB 829605 A GB829605 A GB 829605A GB 4276/58 A GB4276/58 A GB 4276/58A GB 427658 A GB427658 A GB 427658A GB 829605 A GB829605 A GB 829605A
- Authority
- GB
- United Kingdom
- Prior art keywords
- etching
- glass
- acid
- hydrofluoric acid
- hydrofluosilicic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 title abstract 8
- 239000011521 glass Substances 0.000 title abstract 5
- 238000000034 method Methods 0.000 title abstract 2
- 230000001172 regenerating effect Effects 0.000 title abstract 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 8
- 239000002253 acid Substances 0.000 abstract 5
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 abstract 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 abstract 2
- 150000003839 salts Chemical class 0.000 abstract 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 abstract 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 abstract 1
- 229910004298 SiO 2 Inorganic materials 0.000 abstract 1
- 150000007513 acids Chemical class 0.000 abstract 1
- 238000001914 filtration Methods 0.000 abstract 1
- 150000002500 ions Chemical group 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 229910052744 lithium Inorganic materials 0.000 abstract 1
- 229910021645 metal ion Inorganic materials 0.000 abstract 1
- 230000003472 neutralizing effect Effects 0.000 abstract 1
- 150000002823 nitrates Chemical class 0.000 abstract 1
- 229910000027 potassium carbonate Inorganic materials 0.000 abstract 1
- 239000011698 potassium fluoride Substances 0.000 abstract 1
- 235000003270 potassium fluoride Nutrition 0.000 abstract 1
- 159000000001 potassium salts Chemical class 0.000 abstract 1
- 230000001376 precipitating effect Effects 0.000 abstract 1
- 238000001556 precipitation Methods 0.000 abstract 1
- 239000005368 silicate glass Substances 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
829,605. Etching. CORNING GLASS WORKS. Feb. 10, 1958 [Feb. 18, 1957], No. 4276/58. Class 100(2) A method of controlling the etching of a solid-containing glass in a hydrafluoric acid solution comprises regenerating the etching solution by neutralizing at least a part of the hydrofluosilicic acid formed and adding sufficient hydrofluoric acid to restore the initial concentration of free hydrofluoric acid in the solution. The hydrofluosilicic acid is removed by filtration after precipitation by a soluble salt whose metal ion forms a soluble fluoride and insoluble siliconuoride. Potassium salts are preferred, and sulphates and nitrates are not suitable. Potassium fluoride may be used, but preferably anhydrous of hydrated potassium carbonate. The hydrofluosilicic acid should not all be removed, and for etching crystallite glass having an etching ratio of 35 to 1 in 10% hydrofluoric acid, should be maintained in a range of 2-5% SiO 2 . The etching apparatus may comprise means for adding metered amounts of the precipitating salt and hydrofluoric acid and, the amounts being controlled by a device sensitive to the concentrations of the respective acids, a pump, a filter, and two baths, one for use while the other is regenerated. The etching liquid is splashed upwardly by a rotary paddle against the glass, at a temperature of at least 25‹C. The glass may be a lithium; silicate glass. Specification 699,897 is referred to.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US829605XA | 1957-02-18 | 1957-02-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB829605A true GB829605A (en) | 1960-03-02 |
Family
ID=22174545
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4276/58A Expired GB829605A (en) | 1957-02-18 | 1958-02-10 | Method of regenerating a glass etching bath |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB829605A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5281318A (en) * | 1991-07-26 | 1994-01-25 | Tomen Construction Co., Ltd. | Process for processing a waste etching solution containing a fluorine component and an ammonia component to recover valuables therefrom |
GB2323334A (en) * | 1997-03-21 | 1998-09-23 | Lg Electronics Inc | Wet etching glass with recycle of etchant and end-point sensing by temperature |
US6228211B1 (en) | 1998-09-08 | 2001-05-08 | Lg. Philips Lcd Co., Ltd. | Apparatus for etching a glass substrate |
US6281136B1 (en) | 1996-06-26 | 2001-08-28 | Lg.Philips Lcd Co., Ltd. | Apparatus for etching glass substrate |
US6327011B2 (en) | 1997-10-20 | 2001-12-04 | Lg Electronics, Inc. | Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same |
US6558776B1 (en) | 1998-10-22 | 2003-05-06 | Lg.Philips Lcd Co., Ltd. | Glass substrate for liquid crystal display device |
US6630052B1 (en) | 1996-06-26 | 2003-10-07 | Lg. Philips Lcd Co., Ltd. | Apparatus for etching glass substrate |
US9505651B2 (en) | 2012-05-31 | 2016-11-29 | Corning Incorporated | Systems and methods for acid-treating glass articles |
CN106904838A (en) * | 2017-03-14 | 2017-06-30 | 凯盛科技股份有限公司 | One kind etching acid solution recoverying and utilizing method |
US9926225B2 (en) | 2011-12-30 | 2018-03-27 | Corning Incorporated | Media and methods for etching glass |
-
1958
- 1958-02-10 GB GB4276/58A patent/GB829605A/en not_active Expired
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5281318A (en) * | 1991-07-26 | 1994-01-25 | Tomen Construction Co., Ltd. | Process for processing a waste etching solution containing a fluorine component and an ammonia component to recover valuables therefrom |
US6630052B1 (en) | 1996-06-26 | 2003-10-07 | Lg. Philips Lcd Co., Ltd. | Apparatus for etching glass substrate |
US6281136B1 (en) | 1996-06-26 | 2001-08-28 | Lg.Philips Lcd Co., Ltd. | Apparatus for etching glass substrate |
US6461470B2 (en) | 1996-06-26 | 2002-10-08 | L.G. Philips Lcd Co., Ltd. | Apparatus for etching glass substrate |
GB2323334A (en) * | 1997-03-21 | 1998-09-23 | Lg Electronics Inc | Wet etching glass with recycle of etchant and end-point sensing by temperature |
GB2323334B (en) * | 1997-03-21 | 1999-08-04 | Lg Electronics Inc | Etching apparatus |
US8043466B1 (en) | 1997-03-21 | 2011-10-25 | Lg Display Co., Ltd | Etching apparatus |
US6955840B2 (en) | 1997-10-20 | 2005-10-18 | Lg. Philips Lcd Co., Ltd. | Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same |
US6327011B2 (en) | 1997-10-20 | 2001-12-04 | Lg Electronics, Inc. | Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same |
US6228211B1 (en) | 1998-09-08 | 2001-05-08 | Lg. Philips Lcd Co., Ltd. | Apparatus for etching a glass substrate |
US6558776B1 (en) | 1998-10-22 | 2003-05-06 | Lg.Philips Lcd Co., Ltd. | Glass substrate for liquid crystal display device |
US9926225B2 (en) | 2011-12-30 | 2018-03-27 | Corning Incorporated | Media and methods for etching glass |
US9505651B2 (en) | 2012-05-31 | 2016-11-29 | Corning Incorporated | Systems and methods for acid-treating glass articles |
CN106904838A (en) * | 2017-03-14 | 2017-06-30 | 凯盛科技股份有限公司 | One kind etching acid solution recoverying and utilizing method |
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