GB790131A - Light-sensitive layers for the production of tanned images - Google Patents
Light-sensitive layers for the production of tanned imagesInfo
- Publication number
- GB790131A GB790131A GB15444/55A GB1544455A GB790131A GB 790131 A GB790131 A GB 790131A GB 15444/55 A GB15444/55 A GB 15444/55A GB 1544455 A GB1544455 A GB 1544455A GB 790131 A GB790131 A GB 790131A
- Authority
- GB
- United Kingdom
- Prior art keywords
- azido
- sodium salt
- condensation
- acid sodium
- hexamethylene diamine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXIPVTKHYLBLMZ-UHFFFAOYSA-N Sodium azide Chemical compound [Na+].[N-]=[N+]=[N-] PXIPVTKHYLBLMZ-UHFFFAOYSA-N 0.000 abstract 10
- 238000009833 condensation Methods 0.000 abstract 8
- 230000005494 condensation Effects 0.000 abstract 8
- 239000002253 acid Substances 0.000 abstract 7
- 238000006243 chemical reaction Methods 0.000 abstract 6
- UFFRSDWQMJYQNE-UHFFFAOYSA-N 6-azaniumylhexylazanium;hexanedioate Chemical compound [NH3+]CCCCCC[NH3+].[O-]C(=O)CCCCC([O-])=O UFFRSDWQMJYQNE-UHFFFAOYSA-N 0.000 abstract 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 4
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 abstract 4
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 abstract 4
- 159000000000 sodium salts Chemical class 0.000 abstract 4
- -1 sulphonamido Chemical group 0.000 abstract 4
- 238000006722 reduction reaction Methods 0.000 abstract 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 abstract 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 abstract 2
- 238000009835 boiling Methods 0.000 abstract 2
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 abstract 2
- 150000004985 diamines Chemical class 0.000 abstract 2
- 238000006193 diazotization reaction Methods 0.000 abstract 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 2
- WEDGCOBNBWKNGY-UHFFFAOYSA-N 1-azido-4-(2-phenylethenyl)benzene Chemical compound C1=CC(N=[N+]=[N-])=CC=C1C=CC1=CC=CC=C1 WEDGCOBNBWKNGY-UHFFFAOYSA-N 0.000 abstract 1
- YWWCMKQWVCDFRN-UHFFFAOYSA-N 2-[(4-azidophenyl)methylidene]butanoic acid Chemical compound N(=[N+]=[N-])C1=CC=C(C=C(C(O)=O)CC)C=C1 YWWCMKQWVCDFRN-UHFFFAOYSA-N 0.000 abstract 1
- CLXWMMGXFSZUNP-UHFFFAOYSA-N 2-methyl-5-nitrobenzenesulfonamide Chemical compound CC1=CC=C([N+]([O-])=O)C=C1S(N)(=O)=O CLXWMMGXFSZUNP-UHFFFAOYSA-N 0.000 abstract 1
- WPGVQDHXOUAJBW-UHFFFAOYSA-N 2-methyl-5-nitrobenzenesulfonyl chloride Chemical compound CC1=CC=C([N+]([O-])=O)C=C1S(Cl)(=O)=O WPGVQDHXOUAJBW-UHFFFAOYSA-N 0.000 abstract 1
- FWQNYUYRXNWOOM-UHFFFAOYSA-N 2-nonylpropanedioic acid Chemical class CCCCCCCCCC(C(O)=O)C(O)=O FWQNYUYRXNWOOM-UHFFFAOYSA-N 0.000 abstract 1
- RDECOBLZUGRKEO-UHFFFAOYSA-N 3-[(4-azidophenyl)methylidene]pentane-2,4-dione Chemical compound N(=[N+]=[N-])C1=CC=C(C=C(C(C)=O)C(C)=O)C=C1 RDECOBLZUGRKEO-UHFFFAOYSA-N 0.000 abstract 1
- QPJCYJIZFCJYIR-UHFFFAOYSA-N 4-propylazetidin-2-one Chemical compound CCCC1CC(=O)N1 QPJCYJIZFCJYIR-UHFFFAOYSA-N 0.000 abstract 1
- VWPQCOZMXULHDM-UHFFFAOYSA-N 9-aminononanoic acid Chemical compound NCCCCCCCCC(O)=O VWPQCOZMXULHDM-UHFFFAOYSA-N 0.000 abstract 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 abstract 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical compound NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 abstract 1
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 abstract 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 abstract 1
- SICWQKUTWFIEAY-UHFFFAOYSA-N N(=[N+]=[N-])C1=CC=C(C=C=CC(=O)C=C=CC2=CC=C(C=C2)N=[N+]=[N-])C=C1 Chemical compound N(=[N+]=[N-])C1=CC=C(C=C=CC(=O)C=C=CC2=CC=C(C=C2)N=[N+]=[N-])C=C1 SICWQKUTWFIEAY-UHFFFAOYSA-N 0.000 abstract 1
- 239000004952 Polyamide Substances 0.000 abstract 1
- 206010070834 Sensitisation Diseases 0.000 abstract 1
- 239000005708 Sodium hypochlorite Substances 0.000 abstract 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract 1
- 150000007513 acids Chemical class 0.000 abstract 1
- 239000001361 adipic acid Substances 0.000 abstract 1
- 235000011037 adipic acid Nutrition 0.000 abstract 1
- 230000001476 alcoholic effect Effects 0.000 abstract 1
- 150000001298 alcohols Chemical class 0.000 abstract 1
- 150000001408 amides Chemical class 0.000 abstract 1
- 125000003277 amino group Chemical group 0.000 abstract 1
- 229910021529 ammonia Inorganic materials 0.000 abstract 1
- 238000010531 catalytic reduction reaction Methods 0.000 abstract 1
- 150000008049 diazo compounds Chemical class 0.000 abstract 1
- 150000001991 dicarboxylic acids Chemical class 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 150000003951 lactams Chemical class 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 229920002647 polyamide Polymers 0.000 abstract 1
- 230000035484 reaction time Effects 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 230000008313 sensitization Effects 0.000 abstract 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 abstract 1
- 239000001117 sulphuric acid Substances 0.000 abstract 1
- 235000011149 sulphuric acid Nutrition 0.000 abstract 1
- 238000005979 thermal decomposition reaction Methods 0.000 abstract 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Polyamides (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK22598A DE954308C (de) | 1954-06-19 | 1954-06-19 | Lichtempfindliche Schicht fuer die Herstellung von Gerbbildern |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB790131A true GB790131A (en) | 1958-02-05 |
Family
ID=7216493
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB15444/55A Expired GB790131A (en) | 1954-06-19 | 1955-05-27 | Light-sensitive layers for the production of tanned images |
Country Status (6)
| Country | Link |
|---|---|
| BE (1) | BE539017A (enrdf_load_stackoverflow) |
| CH (2) | CH339813A (enrdf_load_stackoverflow) |
| DE (1) | DE954308C (enrdf_load_stackoverflow) |
| FR (1) | FR1133957A (enrdf_load_stackoverflow) |
| GB (1) | GB790131A (enrdf_load_stackoverflow) |
| NL (2) | NL198070A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3143417A (en) * | 1959-10-02 | 1964-08-04 | Azoplate Corp | Light sensitive coatings for screen printing containing nu-alkoxymethylated poly-sigma-caprolactam |
| US3143416A (en) * | 1959-10-02 | 1964-08-04 | Azoplate Corp | Light sensitive coatings for screen printing comprising a light sensitive material with a condensate of a omega, omega'-diamine and a omega, omega'-dicarboxylic acid |
| US3245792A (en) * | 1959-10-03 | 1966-04-12 | Azoplate Corp | Light sensitive polycarbonamide coatings for screen printing |
| US3321309A (en) * | 1963-10-26 | 1967-05-23 | Azoplate Corp | Process for the production of printing plates |
| US4680244A (en) * | 1984-03-17 | 1987-07-14 | Hoechst Aktiengesellschaft | Light-sensitive recording material for the production of a printing form or printed circuit with photoconductive layer and light-sensitive overlayer |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1039835B (de) * | 1956-07-21 | 1958-09-25 | Bayer Ag | Photographisches Verfahren zur Herstellung von Farbstoffbildern |
| BE566941A (enrdf_load_stackoverflow) * | 1957-04-22 |
-
0
- NL NL92921D patent/NL92921C/xx active
- BE BE539017D patent/BE539017A/xx unknown
- NL NL198070D patent/NL198070A/xx unknown
-
1954
- 1954-06-19 DE DEK22598A patent/DE954308C/de not_active Expired
-
1955
- 1955-05-27 GB GB15444/55A patent/GB790131A/en not_active Expired
- 1955-06-16 CH CH339813D patent/CH339813A/de unknown
- 1955-06-16 CH CH340415D patent/CH340415A/de unknown
- 1955-06-17 FR FR1133957D patent/FR1133957A/fr not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3143417A (en) * | 1959-10-02 | 1964-08-04 | Azoplate Corp | Light sensitive coatings for screen printing containing nu-alkoxymethylated poly-sigma-caprolactam |
| US3143416A (en) * | 1959-10-02 | 1964-08-04 | Azoplate Corp | Light sensitive coatings for screen printing comprising a light sensitive material with a condensate of a omega, omega'-diamine and a omega, omega'-dicarboxylic acid |
| US3245792A (en) * | 1959-10-03 | 1966-04-12 | Azoplate Corp | Light sensitive polycarbonamide coatings for screen printing |
| US3321309A (en) * | 1963-10-26 | 1967-05-23 | Azoplate Corp | Process for the production of printing plates |
| US4680244A (en) * | 1984-03-17 | 1987-07-14 | Hoechst Aktiengesellschaft | Light-sensitive recording material for the production of a printing form or printed circuit with photoconductive layer and light-sensitive overlayer |
Also Published As
| Publication number | Publication date |
|---|---|
| CH339813A (de) | 1959-07-15 |
| CH340415A (de) | 1959-08-15 |
| FR1133957A (fr) | 1957-04-04 |
| NL198070A (enrdf_load_stackoverflow) | |
| DE954308C (de) | 1956-12-13 |
| BE539017A (enrdf_load_stackoverflow) | |
| NL92921C (enrdf_load_stackoverflow) |
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