GB776343A - Improvements in the production of two-dimensional electric circuits or circuit elements on a supporting base - Google Patents

Improvements in the production of two-dimensional electric circuits or circuit elements on a supporting base

Info

Publication number
GB776343A
GB776343A GB21555/53A GB2155553A GB776343A GB 776343 A GB776343 A GB 776343A GB 21555/53 A GB21555/53 A GB 21555/53A GB 2155553 A GB2155553 A GB 2155553A GB 776343 A GB776343 A GB 776343A
Authority
GB
United Kingdom
Prior art keywords
colloid
layer
conductors
solution
silver
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB21555/53A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Blaupunkt Werke GmbH
Original Assignee
Blaupunkt Werke GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Blaupunkt Werke GmbH filed Critical Blaupunkt Werke GmbH
Publication of GB776343A publication Critical patent/GB776343A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
    • H05K3/106Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam by photographic methods
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/825Photosensitive materials characterised by the base or auxiliary layers characterised by antireflection means or visible-light filtering means, e.g. antihalation
    • G03C1/8255Silver or silver compounds therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/22Direct chromate processes, i.e. without preceding silver picture, or agents therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/16Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0502Patterning and lithography
    • H05K2203/0514Photodevelopable thick film, e.g. conductive or insulating paste

Abstract

776,343. Photographically produced electrical circuits; relief photographs; bichromated colloid processes. BLAUPUNKTWERKE GES. Aug. 4, 1953 [Aug. 2, 1952], No. 21555/53. Class 98(2) A flat or laminated electrical circuit or circuit element is formed on an insulating support as a wash-off developed exposed radiation-sensitive colloid relief which either (a) contains initially as a finely dispersed material, e.g. a powder or a colloidal dispersion, the functional material, i.e. that forming the circuit or circuit element, or (b) is swollen by immersion in a solution of a substance which reacts with a second solution or a substance incorporated in the colloid layer to deposit the functional material in the relief which may include initially an absorbing material such as colloidal silica or a largely insoluble reduction or oxidation agent. The colloid layer may be gelatin, albumen, animal glue, fish glue, dextrin, gum arabic- or polyvinyl - alcohol, - chloride, - acetate,. polystyrene, methacrylic acid derivatives, phenol-formaldehyde or silicone resins, cellulose, cellulose nitrate or acetate, and is exposed to harden it right through to the support which may be of plastic, e.g. polystyrene, glass, mica, or ceramic. Typically the sensitizers used may be alkali metal or ammonium bichromates or diazo and/or amino group containing compoents, e.g. N-methyl N-(6 [1:2:3:4-tetrahydronaphthyl]) p - phenylene diamine. In certain cases the sensitizers may be applied in the form of a vapour or by spraying or sputtering. If the layer is largely opaque to visible light due to the materials included in it, it may be exposed from front and rear through mirror image negatives. To decrease the overall heating which long exposure involves and which itself causes uniform hardening of the colloid, the face of the negative directed to the light may be white or reflecting in its opaque portions. Alternatively the exposure may be made with ultra-violet, or X-rays or a radioactive source using a radiation-opaque negative, e.g. of lead, or a phosphor such as zinc and/or cadmium sulphides or silicates may be used, being excited with ultra-violet or X-rays. A suitable phosphor for infra-red exposure is of the kind which after excitation and the usual afterglow stores energy which is released as light when the material is stimulated with infra-red. Since the swellability of the layer depends on the degree of exposure, different parts' of the colloid layer may be given different exposures to vary the deposit of functional material in case (b) above. Development, which may be assisted by the addition of acid or alkali, by mechanical vibration of audio or ultrasonic frequency, or by heating, is effected with hot water for gelatin and other natural soft colloids, cold water for polyvinyl alcohol, alcohol for shellac, and a mixture of acetone and methyl acetate for polystyrene. For case (a) above, the functional material may be ground up with the colloid and homogenized with ultrasonics. The functional materials may be powdered silver, copper, iron, nickel, or cobalt for conductors, carbon black, graphite, or carbides for resistors: oxides such as ferrosoferric oxide or manganese oxide or mixtures thereof for semi-conductors; ground glass, mica, kaolin, bentonite, felspar talcum, aluminium or magnesium oxides for insulators; titanium or zirconium compounds, such as barium titanate or barium or strontium zirconate for capacitors; " complex oxides such as ferrites and manganites for magnetic shields. For case (b) above, for conductors, the layer may be immersed in a " functional metal " salt solution e.g. silver nitrate followed either by an alkali metal carbonate and the silver carbonate reduced to silver by heating, or by a hydrazine e.g. phenylhydrazine to precipitate metallic silver. Alternatively the exposed layer may be impregnated with the metal salt and reduced to metal with nitrogen, hydrogen, hydrazine vapour or ammonia gas or solution, or oxidized with oxygen, ozone or with hydrogen peroxide or solutions of per salts such as perborates and permanganates. To assist the continuity of the functional material, especially for conductors, the layer is seeded with a solution of an alkali metal salt, e.g. a sulphate, so that on immersion in the "functional metal" salt, e.g. silver nitrate, nuclei of an insoluble salt are immediately precipitated and serve as deposition centres when the second treating solution is applied. Conductors so formed may be electroplated, the colloid being hardened by heating to prevent swelling and penetration by the electrolyte. If seeding is used for the production of electrode leaves in the manufacture of capacitors, the seeding ions should finally be removed by dialyses or electrodialysis. The finished circuit or circuit element may be given a protective lacquer coating which may serve as a transfer sheet which may be peeled off the support providing the circuit elements adhere to it more strongly than to the support. If a polystyrene support is used, capacitiative and magnetic coupling may be effected through the support between circuit elements on opposite sides of it.
GB21555/53A 1952-08-02 1953-08-04 Improvements in the production of two-dimensional electric circuits or circuit elements on a supporting base Expired GB776343A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE326320X 1952-08-02

Publications (1)

Publication Number Publication Date
GB776343A true GB776343A (en) 1957-06-05

Family

ID=6183796

Family Applications (1)

Application Number Title Priority Date Filing Date
GB21555/53A Expired GB776343A (en) 1952-08-02 1953-08-04 Improvements in the production of two-dimensional electric circuits or circuit elements on a supporting base

Country Status (6)

Country Link
BE (1) BE521865A (en)
CH (1) CH326320A (en)
DK (1) DK87635C (en)
FR (1) FR1084451A (en)
GB (1) GB776343A (en)
NL (2) NL179902B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3424581A (en) * 1966-01-25 1969-01-28 Polaroid Corp Photographic emulsion of silver halide and derivatized gelatin capable of conducting electrical current
US3574933A (en) * 1968-11-29 1971-04-13 Sylvania Electric Prod Method of making printed circuit boards with plated-through holes

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3424581A (en) * 1966-01-25 1969-01-28 Polaroid Corp Photographic emulsion of silver halide and derivatized gelatin capable of conducting electrical current
US3574933A (en) * 1968-11-29 1971-04-13 Sylvania Electric Prod Method of making printed circuit boards with plated-through holes

Also Published As

Publication number Publication date
BE521865A (en)
NL179902B (en)
DK87635C (en) 1959-08-03
FR1084451A (en) 1955-01-19
CH326320A (en) 1957-12-15
NL94111C (en)

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