GB775002A - Improvements in or relating to the manufacture of thin light-transmitting layers - Google Patents
Improvements in or relating to the manufacture of thin light-transmitting layersInfo
- Publication number
- GB775002A GB775002A GB17670/53A GB1767053A GB775002A GB 775002 A GB775002 A GB 775002A GB 17670/53 A GB17670/53 A GB 17670/53A GB 1767053 A GB1767053 A GB 1767053A GB 775002 A GB775002 A GB 775002A
- Authority
- GB
- United Kingdom
- Prior art keywords
- gas
- evaporation
- metal
- silicon
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Optical Filters (AREA)
Abstract
A process for the manufacture of thin light-transmitting layers of metal-gas or silicon-gas compounds comprises the evaporation and condensation under reduced pressure of a metal, a metal or silicon compound, or a mixture of a metal or silicon with a metal or silicon compound on a carrier, the evaporation and condensation being carried out in the presence of excess of the gas forming ore element of the metal-gas or silicon-gas compound, said excess gas being present in such quantity that the pressure thereof, for a selected rate of evaporation; lies between a higher limit, above which the layer produced is lacking in strength, and a lower limit, below which the layer tends to high light-absorption. The evaporation may be carried out in an atmosphere of which at least half is oxygen, the layers produced comprising oxides of the highest degree of oxidation, and suitable pressure limits are 2 X 10-4 and 3 X 10-5 mm. Hg. Other gases which may be used include nitrogen. The evaporation may be performed in a stream of gas and the gas may be ionized before coming into contact with the material to be condensed. The evaporation of TiO2, Ti + TiO2, SiO2 SiO + SiO2 and compounds of Fe, Zr, Al, Zn is referred to, and such layers on highly refractive substances are stated to be useful in the production of reflection-reducing coatings, multi-layer interference filters and artificial jewelry.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AT775002X | 1952-06-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB775002A true GB775002A (en) | 1957-05-15 |
Family
ID=3680747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB17670/53A Expired GB775002A (en) | 1952-06-25 | 1953-06-25 | Improvements in or relating to the manufacture of thin light-transmitting layers |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB775002A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4096026A (en) * | 1976-07-27 | 1978-06-20 | Toppan Printing Co., Ltd. | Method of manufacturing a chromium oxide film |
| DE3045025A1 (en) * | 1980-04-12 | 1981-10-22 | Egyesült Izzólámpa és Villamossági Részvénytársaság, 1340 Budapest | Infrared diminishing coating prodn. on electric lamp - by chemical vapour deposition of silicon nitride to reduce heat output and increase efficiency |
-
1953
- 1953-06-25 GB GB17670/53A patent/GB775002A/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4096026A (en) * | 1976-07-27 | 1978-06-20 | Toppan Printing Co., Ltd. | Method of manufacturing a chromium oxide film |
| DE3045025A1 (en) * | 1980-04-12 | 1981-10-22 | Egyesült Izzólámpa és Villamossági Részvénytársaság, 1340 Budapest | Infrared diminishing coating prodn. on electric lamp - by chemical vapour deposition of silicon nitride to reduce heat output and increase efficiency |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ES450687A1 (en) | Silicon oxide coated metal having improved corrosion resistance | |
| US3034924A (en) | Use of a rare earth metal in vaporizing metals and metal oxides | |
| NO870217D0 (en) | PROCEDURE FOR THE MANUFACTURING OF METAL OXYGEN POWDER FOR CERAMIC MATERIALS AND THEREFORE PRODUCED METAL OXYGEN POWDER. | |
| Taniguchi et al. | Improvement in the oxidation resistance of TiAl by preoxidation in a SiO 2-powder pack | |
| US5800925A (en) | Nonlinear optical materials and process for producing the same | |
| GB775002A (en) | Improvements in or relating to the manufacture of thin light-transmitting layers | |
| Wallwork et al. | Mapping of the oxidation products in the ternary Co-Cr-Al system | |
| ES438991A1 (en) | Application of metal oxide layers to glass surfaces | |
| GB853852A (en) | Improvements in or relating to methods of manufacturing electrically conductive films | |
| KR0120925B1 (en) | Uranium dioxide production | |
| GB1335782A (en) | Method for the production of blue-coloured layers permeable to light | |
| FR2430986A1 (en) | Infrared reflector discs mfr. - by cathode sputtering a target with successive layers of oxide and precious metal | |
| GB1373051A (en) | Chromium oxide photomask material and the production thereof | |
| JPS5755537A (en) | Production of magnetic recording medium | |
| JPS5579046A (en) | Exhaustion gas cleaning catalyst having undergone phosphorus poisoning preventive treatment | |
| GB732891A (en) | Improvements in and relating to the production of thin layers of chemical compounds on surfaces | |
| JPS5655910A (en) | Production of optical multilayer film | |
| GB1011591A (en) | Improvements in silica articles resistant to devitrification | |
| JPS56156760A (en) | Method and apparatus for forming coat | |
| JPH07501160A (en) | Thin film made of gallium oxide and method for producing the same | |
| GB988292A (en) | Improvements in the production of a zinc oxide pigment | |
| GB1442109A (en) | Thin layers of high melting point materials | |
| GB870767A (en) | Process for the manufacture of solderable shaped electric contact elements of silver-cadmium oxide | |
| JPS6033325A (en) | Contact material | |
| PL216964A1 (en) |