GB744264A - Improvements in or relating to resins - Google Patents
Improvements in or relating to resinsInfo
- Publication number
- GB744264A GB744264A GB16851/53A GB1685153A GB744264A GB 744264 A GB744264 A GB 744264A GB 16851/53 A GB16851/53 A GB 16851/53A GB 1685153 A GB1685153 A GB 1685153A GB 744264 A GB744264 A GB 744264A
- Authority
- GB
- United Kingdom
- Prior art keywords
- sulphur dioxide
- acrylate
- alkyl
- cyclohexene
- acetylene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/20—Polysulfones
- C08G75/205—Copolymers of sulfur dioxide with unsaturated organic compounds
- C08G75/22—Copolymers of sulfur dioxide with unsaturated aliphatic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Copolymers are prepared by the liquid phase copolymerization in the presence of an ammonium or alkali metal nitrate catalyst of an alkyl acrylate, preferably one in which the alkyl radical contains from 1 to 10 carbon atoms, sulphur dioxide, and another unsaturated compound copolymerizable with sulphur dioxide, such as normal butene, pentene, and octene, cyclohexene, methyl cyclohexene, 4-cyclohexyl-1-butene, styrene, acetylene, methyl acetylene, butadiene, pentadienes, hexadienes, allyl alcohol, and allyl chloride, the amount of acrylate being in the range of 1 to 20 mol. per cent based on acrylate plus unsaturated organic compound. Copolymerization may be carried out in solvents such as acetone, hydrocarbons, and sulphur dioxide present in excess, or in aqueous emulsion as described in Specification 686,446, employing sodium lauryl sulphate as an emulsifier. The products may be heat stabilized by the addition thereto of metal alkyl dithiophosphates, as described in Specification 734,960.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US744264XA | 1952-09-29 | 1952-09-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB744264A true GB744264A (en) | 1956-02-01 |
Family
ID=22119502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB16851/53A Expired GB744264A (en) | 1952-09-29 | 1953-06-18 | Improvements in or relating to resins |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB744264A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000077077A1 (en) * | 1999-06-11 | 2000-12-21 | Basf Aktiengesellschaft | Method for the production of polysulphon with an aliphatic main chain |
| US7550249B2 (en) | 2006-03-10 | 2009-06-23 | Az Electronic Materials Usa Corp. | Base soluble polymers for photoresist compositions |
| US7704670B2 (en) | 2006-06-22 | 2010-04-27 | Az Electronic Materials Usa Corp. | High silicon-content thin film thermosets |
| US7759046B2 (en) | 2006-12-20 | 2010-07-20 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| US8026040B2 (en) | 2007-02-20 | 2011-09-27 | Az Electronic Materials Usa Corp. | Silicone coating composition |
| US8524441B2 (en) | 2007-02-27 | 2013-09-03 | Az Electronic Materials Usa Corp. | Silicon-based antireflective coating compositions |
-
1953
- 1953-06-18 GB GB16851/53A patent/GB744264A/en not_active Expired
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000077077A1 (en) * | 1999-06-11 | 2000-12-21 | Basf Aktiengesellschaft | Method for the production of polysulphon with an aliphatic main chain |
| US7550249B2 (en) | 2006-03-10 | 2009-06-23 | Az Electronic Materials Usa Corp. | Base soluble polymers for photoresist compositions |
| US7704670B2 (en) | 2006-06-22 | 2010-04-27 | Az Electronic Materials Usa Corp. | High silicon-content thin film thermosets |
| US7759046B2 (en) | 2006-12-20 | 2010-07-20 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| US8026040B2 (en) | 2007-02-20 | 2011-09-27 | Az Electronic Materials Usa Corp. | Silicone coating composition |
| US8524441B2 (en) | 2007-02-27 | 2013-09-03 | Az Electronic Materials Usa Corp. | Silicon-based antireflective coating compositions |
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