GB706879A - Improvements in materials and processes for photomechanical reproduction - Google Patents
Improvements in materials and processes for photomechanical reproductionInfo
- Publication number
- GB706879A GB706879A GB953/52A GB95352A GB706879A GB 706879 A GB706879 A GB 706879A GB 953/52 A GB953/52 A GB 953/52A GB 95352 A GB95352 A GB 95352A GB 706879 A GB706879 A GB 706879A
- Authority
- GB
- United Kingdom
- Prior art keywords
- naphthol
- sulphochloride
- diazotized
- benzoxazolone
- dioxane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 11
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 abstract 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 abstract 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 4
- -1 Benzoxazolone - 5 - sulphonyl Chemical group 0.000 abstract 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 abstract 4
- 239000000987 azo dye Substances 0.000 abstract 4
- 230000008878 coupling Effects 0.000 abstract 4
- 238000010168 coupling process Methods 0.000 abstract 4
- 238000005859 coupling reaction Methods 0.000 abstract 4
- 239000000975 dye Substances 0.000 abstract 4
- 238000010438 heat treatment Methods 0.000 abstract 4
- 239000000047 product Substances 0.000 abstract 4
- JVNKYYGQNQJOEN-UHFFFAOYSA-N 2-diazo-1h-naphthalen-1-ol Chemical compound C1=CC=C2C(O)C(=[N+]=[N-])C=CC2=C1 JVNKYYGQNQJOEN-UHFFFAOYSA-N 0.000 abstract 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract 3
- XTHPWXDJESJLNJ-UHFFFAOYSA-N sulfurochloridic acid Chemical compound OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 abstract 3
- SJHPCNCNNSSLPL-CSKARUKUSA-N (4e)-4-(ethoxymethylidene)-2-phenyl-1,3-oxazol-5-one Chemical group O1C(=O)C(=C/OCC)\N=C1C1=CC=CC=C1 SJHPCNCNNSSLPL-CSKARUKUSA-N 0.000 abstract 2
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract 2
- XPKFTIYOZUJAGA-UHFFFAOYSA-N 2,5-diethoxyaniline Chemical compound CCOC1=CC=C(OCC)C(N)=C1 XPKFTIYOZUJAGA-UHFFFAOYSA-N 0.000 abstract 2
- ASSKVPFEZFQQNQ-UHFFFAOYSA-N 2-benzoxazolinone Chemical compound C1=CC=C2OC(O)=NC2=C1 ASSKVPFEZFQQNQ-UHFFFAOYSA-N 0.000 abstract 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 abstract 2
- ZIPJXJGTIGXUSE-UHFFFAOYSA-N 6-diazocyclohexa-2,4-dien-1-ol Chemical compound OC1C=CC=CC1=[N+]=[N-] ZIPJXJGTIGXUSE-UHFFFAOYSA-N 0.000 abstract 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 abstract 2
- 239000003513 alkali Substances 0.000 abstract 2
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000000543 intermediate Substances 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 2
- 229910000029 sodium carbonate Inorganic materials 0.000 abstract 2
- 235000011121 sodium hydroxide Nutrition 0.000 abstract 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 abstract 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 abstract 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 abstract 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 abstract 1
- UTWKNKWTFCSSMF-UHFFFAOYSA-N 3H-1,3-benzoxazol-2-one sulfurochloridic acid Chemical class S(=O)(=O)(O)Cl.O1C(NC2=C1C=CC=C2)=O UTWKNKWTFCSSMF-UHFFFAOYSA-N 0.000 abstract 1
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 abstract 1
- TYMLOMAKGOJONV-UHFFFAOYSA-N 4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1 TYMLOMAKGOJONV-UHFFFAOYSA-N 0.000 abstract 1
- 239000005977 Ethylene Substances 0.000 abstract 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 abstract 1
- 239000007868 Raney catalyst Substances 0.000 abstract 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 abstract 1
- 229910000564 Raney nickel Inorganic materials 0.000 abstract 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 abstract 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 1
- 150000001735 carboxylic acids Chemical class 0.000 abstract 1
- VFCMIQSRZVLDRW-UHFFFAOYSA-N chembl1588557 Chemical compound C1=CC(O)=CC=C1N=NC1=C(O)C=CC2=CC=CC=C12 VFCMIQSRZVLDRW-UHFFFAOYSA-N 0.000 abstract 1
- 150000001805 chlorine compounds Chemical class 0.000 abstract 1
- 238000009833 condensation Methods 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 239000007859 condensation product Substances 0.000 abstract 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 abstract 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 1
- 238000006193 diazotization reaction Methods 0.000 abstract 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 238000001914 filtration Methods 0.000 abstract 1
- 230000003301 hydrolyzing effect Effects 0.000 abstract 1
- 150000002460 imidazoles Chemical class 0.000 abstract 1
- 230000000802 nitrating effect Effects 0.000 abstract 1
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 abstract 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 abstract 1
- 230000001376 precipitating effect Effects 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 235000010288 sodium nitrite Nutrition 0.000 abstract 1
- 238000006467 substitution reaction Methods 0.000 abstract 1
- 229940124530 sulfonamide Drugs 0.000 abstract 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B43/00—Preparation of azo dyes from other azo compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B39/00—Other azo dyes prepared by diazotising and coupling
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE302940X | 1951-02-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB706879A true GB706879A (en) | 1954-04-07 |
Family
ID=6108771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB953/52A Expired GB706879A (en) | 1951-02-02 | 1952-01-11 | Improvements in materials and processes for photomechanical reproduction |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3046115A (en, 2012) |
| BE (1) | BE508664A (en, 2012) |
| CH (1) | CH302940A (en, 2012) |
| FR (1) | FR1056917A (en, 2012) |
| GB (1) | GB706879A (en, 2012) |
| NL (2) | NL78025C (en, 2012) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3126281A (en) * | 1959-02-04 | 1964-03-24 | Formula | |
| US3130049A (en) * | 1959-04-16 | 1964-04-21 | Azoplate Corp | Process for preparing printing plates comprising naphthoquinone diazides reproduction coatings |
| CN104447393A (zh) * | 2014-11-28 | 2015-03-25 | 济宁阳光化学有限公司 | 一种生产色酚as及废弃物回收利用的方法 |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL166823B (nl) * | 1951-02-02 | Petroles Cie Francaise | Electrisch koppelingsorgaan voor koppeling onder water. | |
| NL198071A (en, 2012) * | 1954-08-26 | |||
| JPS492284B1 (en, 2012) * | 1969-05-30 | 1974-01-19 | ||
| GB1347759A (en) * | 1971-06-17 | 1974-02-27 | Howson Algraphy Ltd | Light sensitive materials |
| DE2331377C2 (de) * | 1973-06-20 | 1982-10-14 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Kopiermaterial |
| DE2547905C2 (de) * | 1975-10-25 | 1985-11-21 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Aufzeichnungsmaterial |
| JPS52109926A (en) * | 1976-02-25 | 1977-09-14 | Fuji Photo Film Co Ltd | Metallic image forming material |
| DE2641099A1 (de) * | 1976-09-13 | 1978-03-16 | Hoechst Ag | Lichtempfindliche kopierschicht |
| DE2641100C2 (de) * | 1976-09-13 | 1987-02-26 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Gemisch |
| GB1604652A (en) * | 1977-04-12 | 1981-12-16 | Vickers Ltd | Radiation sensitive materials |
| US5217840A (en) * | 1985-08-12 | 1993-06-08 | Hoechst Celanese Corporation | Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom |
| US4902785A (en) * | 1986-05-02 | 1990-02-20 | Hoechst Celanese Corporation | Phenolic photosensitizers containing quinone diazide and acidic halide substituents |
| US4732836A (en) * | 1986-05-02 | 1988-03-22 | Hoechst Celanese Corporation | Novel mixed ester O-quinone photosensitizers |
| US5035976A (en) * | 1986-05-02 | 1991-07-30 | Hoechst Celanese Corporation | Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents |
| US4732837A (en) * | 1986-05-02 | 1988-03-22 | Hoechst Celanese Corporation | Novel mixed ester O-quinone photosensitizers |
| US5162510A (en) * | 1986-05-02 | 1992-11-10 | Hoechst Celanese Corporation | Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer |
| US4818658A (en) * | 1987-04-17 | 1989-04-04 | Shipley Company Inc. | Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product |
| US4837121A (en) * | 1987-11-23 | 1989-06-06 | Olin Hunt Specialty Products Inc. | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin |
| US5024921A (en) * | 1987-11-23 | 1991-06-18 | Ocg Microelectronic Materials, Inc. | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image |
| US4970287A (en) * | 1987-11-23 | 1990-11-13 | Olin Hunt Specialty Products Inc. | Thermally stable phenolic resin compositions with ortho, ortho methylene linkage |
| DE69029104T2 (de) | 1989-07-12 | 1997-03-20 | Fuji Photo Film Co Ltd | Polysiloxane und positiv arbeitende Resistmasse |
| JP2639853B2 (ja) * | 1990-05-18 | 1997-08-13 | 富士写真フイルム株式会社 | 新規キノンジアジド化合物及びそれを含有する感光性組成物 |
| JPH0876380A (ja) | 1994-09-06 | 1996-03-22 | Fuji Photo Film Co Ltd | ポジ型印刷版組成物 |
| EP0887182B1 (en) | 1996-04-23 | 2002-07-24 | Kodak Polychrome Graphics Company Ltd. | Heat-sensitive composition for making a lithographic printing form precursor |
| US6117610A (en) * | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
| GB9622657D0 (en) | 1996-10-31 | 1997-01-08 | Horsell Graphic Ind Ltd | Direct positive lithographic plate |
| US6090532A (en) * | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
| US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| WO1999001795A2 (en) | 1997-07-05 | 1999-01-14 | Kodak Polychrome Graphics Company Ltd. | Pattern-forming methods and radiation sensitive materials |
| US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| US6045963A (en) * | 1998-03-17 | 2000-04-04 | Kodak Polychrome Graphics Llc | Negative-working dry planographic printing plate |
| US6296982B1 (en) | 1999-11-19 | 2001-10-02 | Kodak Polychrome Graphics Llc | Imaging articles |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE506016A (en, 2012) * | ||||
| DE872154C (de) * | 1950-12-23 | 1953-03-30 | Kalle & Co Ag | Photomechanisches Verfahren zur Herstellung von Bildern und Druckformen mit Hilfe von Diazoverbindungen |
| NL166823B (nl) * | 1951-02-02 | Petroles Cie Francaise | Electrisch koppelingsorgaan voor koppeling onder water. |
-
0
- NL NL7811348.A patent/NL166823B/xx unknown
- BE BE508664D patent/BE508664A/xx unknown
- NL NL78025D patent/NL78025C/xx active
-
1952
- 1952-01-11 GB GB953/52A patent/GB706879A/en not_active Expired
- 1952-01-26 CH CH302940D patent/CH302940A/de unknown
- 1952-01-31 FR FR1056917D patent/FR1056917A/fr not_active Expired
-
1957
- 1957-12-27 US US705719A patent/US3046115A/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3126281A (en) * | 1959-02-04 | 1964-03-24 | Formula | |
| US3130049A (en) * | 1959-04-16 | 1964-04-21 | Azoplate Corp | Process for preparing printing plates comprising naphthoquinone diazides reproduction coatings |
| CN104447393A (zh) * | 2014-11-28 | 2015-03-25 | 济宁阳光化学有限公司 | 一种生产色酚as及废弃物回收利用的方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US3046115A (en) | 1962-07-24 |
| FR1056917A (fr) | 1954-03-03 |
| NL166823B (nl) | |
| BE508664A (en, 2012) | |
| NL78025C (en, 2012) | |
| CH302940A (de) | 1954-11-15 |
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