GB2486039A - CMOS TDI sensor for X-ray imaging applications - Google Patents

CMOS TDI sensor for X-ray imaging applications Download PDF

Info

Publication number
GB2486039A
GB2486039A GB1113980.5A GB201113980A GB2486039A GB 2486039 A GB2486039 A GB 2486039A GB 201113980 A GB201113980 A GB 201113980A GB 2486039 A GB2486039 A GB 2486039A
Authority
GB
United Kingdom
Prior art keywords
integrating
amplifier
stage
summing
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB1113980.5A
Other versions
GB2486039B (en
GB201113980D0 (en
Inventor
Shizu Li
Chinlee Wang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SCAN IMAGING CORP X
Original Assignee
SCAN IMAGING CORP X
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/927,961 external-priority patent/US8039811B1/en
Application filed by SCAN IMAGING CORP X filed Critical SCAN IMAGING CORP X
Publication of GB201113980D0 publication Critical patent/GB201113980D0/en
Publication of GB2486039A publication Critical patent/GB2486039A/en
Application granted granted Critical
Publication of GB2486039B publication Critical patent/GB2486039B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N5/00Details of television systems
    • H04N5/30Transforming light or analogous information into electric information
    • H04N5/32Transforming X-rays
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/768Addressed sensors, e.g. MOS or CMOS sensors for time delay and integration [TDI]
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/71Charge-coupled device [CCD] sensors; Charge-transfer registers specially adapted for CCD sensors
    • H04N25/75Circuitry for providing, modifying or processing image signals from the pixel array
    • H04N5/3743
    • H04N5/378

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Measurement Of Radiation (AREA)

Abstract

A Complementary Metal Oxide Semi-conductor (CMOS) TDI detector stage 100 comprising a photo-detector 101 and a pre-amplifier 103 containing an integration capacitor C1 and reset switch SW1 that proportionally converts the photo-charge to a voltage. The stage further comprises a summing capacitor 102 that is connected to the output of a prior stage and a correlated double sample (CDS) circuit 104 that stores the integrated signal voltages and passes them onto the next stage. Each CDS circuit comprises a plurality of switches SW2-SW6 and storage circuits (e.g. capacitors) C2-C4. The CDS signal voltages can be passed from one TDI stage to the next along a column for summing. The CDS signal voltages of the last TDI stages (Figure 2, 200) may be read out with a differential amplifier (Figure 2, 205,206). The CMOS TDI structure can be used for implementing X-ray scanning detector systems requiring large pixel sizes and signal processing circuitry that is physically separated from the photodiode array for X-ray shielding.

Description

CMOS TIME DELAY INTEGRATION SENSOR FOR X-RAY IMAGING
APPLICATIONS
RELATED APPLiCATIONS
This application claims benefit of Provisional Application 61283541, filed on December 4, 2009, which is incorporated herein by reference.
BACKGROUND OF THE INVENTION
Field of the Invention
The present invention pertains generally to the field of solid-state image sensor and more particularly is a CMOS Time Delay and Integration (TDI) sensor for X-ray image scanning applications.
Background of the Invention
This invention is related to Time Delay and Integration (WI) CMOS linear image sensor suitable for high-speed X-ray image scanning applications. ml image sensors are used in high-speed line scan applications where the integrated input light signal is very low. In normal line scan application, one way to increase the integrated input light signal is to reduce the scan speed and thus increase the integration time. The TDI sensor allows the line scan detector system to increase the light signal without sacrificing the scan speed. It is normally implemented using charge transfer device, such as charge-coupled device (CCD).
In a CCD TDI array, each detector pixel contains N stages of WI locations. For example, for an M pixels linear detector, it will contain a two dimensional M by N stages CCD array. The N stages CCD for each pixel is in parallel to the direction of scan. In operation, the first stage of CCD integrates the light signal within one integration time which equals to one line time. The signal charge will then transfer from the first stage to the second stage of CCD while the object under scan also moves from the first stage to the second stage of CCD in synchronization with the movement of the signal charge. The second stage CCD will integrate signal charge during the second integration time for the same object. As a result, at the end of the integration time the signal charge at the second stage CCD will be twice the signal charge as compared with the charge it receives from the first stage. The signal charge of the second stage will then move to the third stage in synchronization with the object movement. Again, the third stage CCD integrates light signal in addition to the signal it receives from the second stage. The process repeats and when it reaches the final N stage CCD, the light signal is multiplied by N times. An output CCD shift register then reads out the M pixels signal in sequence.
Although CCD WI imaging system has been used extensively in visible high-speed industrial inspection applications and medical X-ray scanning applications, such as cr scan and panoramic dental scan, it does have drawbacks in industrial x-ray inspection applications. In an industrial X-ray inspection system, the detector pixel size is normally quite big as compared with normal CCD sensor pixel size. The required pixel size in such an application ranges from a few tenth of millimeters to a few millimeters. As the pixel size increases, the CCD scanning speed decreases significantly and as a result, make it unsuitable for such an application.
A second drawback for a CCD WI system is that it is very susceptible to X-ray radiation damage. In medical X-ray scanning applications, the X-ray energy and dose used is normally much lower than that of industrial inspection applications. In medical applications, not only the X-ray dose is regulated by Federal Drug administration (FDA), the energy is normally less than 100 Key because of soft human tissue. For industrial applications, the energy used can range from 50 Key to 15 MeV depending on what kind of material needs to be inspected. Since there is no regulation to limit the X-ray dose in an industrial inspection system, the dose can be much higher than that of medical scanning systems. The accumulation of radiation exposure of a CCD sensor under X-ray will increase its dark current, shift its well potentials, and, as a result, reduce its usable lifetime.
The current invention is to implement a CMOS detector system that alleviates the drawbacks of CCD detector in an industrial X-ray inspection system. Since signal charges can not move from one CMOS circuit to another CMOS circuit in charge domain, it is more difficult to implement a ml sensor using CMOS circuitry. The present invention is a method to implement TDI sensor in CMOS circuitry using charge integrating and summing amplifiers.
Accordingly, it is an object of the present invention to provide a Time Delay and Integration (IDI) image sensing structure that can be implemented using standard CMOS manufacturing processes.
Another object of the present invention is to provide a IDI image sensing detector system that is suitable for bigger pixel-to-pixel pitch, such as in an industrial X-ray detector system, without sacrificing the readout speed.
A further objective of the current invention is to provide an X-ray TDI detector system that the CMOS circuitry can be separated and away from the photodiode detectors so that the CMOS circuitry can be easily shielded from X-ray radiation damage.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 shows the schematic diagram of one CMOS IDI stage of the present invention.
FIG. 2 shows the schematic diagram of one column of the TDI pixel with N ThI stages and a block diagram of the digital scanning shift register.
FIG. 3 shows a block diagram of the output differential amplifier to read out the video signal.
FIG. 4 shows the timing diagram to operate the liD! sensor.
FIG. 5 shows the schematic diagram of another preferred embodiment of the present invention.
FIG. 6 shows an alternative timing to operate the WI sensor.
SUMMARY OF ThE INVENTION
The advantages of the present invention of using CMOS circuitry to implement a TO! sensor are numerous. Firstly, all the peripheral circuits such as amplifiers, timing generator, and drivers can be integrated with the photodetectors using standard commercial CMOS process.
Secondly, it can be implemented with large pixel size detector, such as 0.8 mm to a few millimeters pixel size. This is especially beneficial for X-ray scanning application where large pixel size is required, such as cargo container and oil pipe inspections. It is well known that CCD works better with smaller pixel size. When the pixel size gets bigger, the CCD speed slows down significantly. Therefore the CMOS TDI sensor is more suitable for industrial X-ray scanning applications. Thirdly, it is well known that CCD device and CMOS drcuitry are susceptible to X-ray radiation damage. In the present CMOS implementation, the peripheral circuits can be integrated on the same chip with photodiode array but with enough separation or gap from the photodiode detectors. As a result, the peripheral circuits can be easily covered with heavy metal, such as lead, to shield from X-ray radiation damage.
The present invention uses photodiode as detector to integrate the input light signal. Each TDI stage contains a photodiode detector, a plural of amplifiers, a plural of storage capacitors, and a plural of control switches. Each photodiode is connected to an integrating amplifier, a Is summing circuit, and a plural of storage circuits. The integrating and summing functions can be implemented in one single amplifier or multiple amplifiers. The storage circuit is implemented using a storage capacitor and a buffer amplifier. Correlated Double Sampling (CDS) technique is used to maintain both the photo-signal and reset voltages simultaneously. The CDS photo-signal (both signal and reset) voltages can be passed to the next TDI stage for summing without accumulation of offset noise. The next TIN stage in sequence not only integrates the photo-signal during one integration time (line time), it also receives the stored CDS voltages from the prior TDI stage. A summing circuit combines both the current and the prior TDI stage CDS photo-signals and output the new CDS voltages to the storage circuits. The stored CDS voltages then pass to the next TDI stage. The process repeats until it reaches the final TDI stage where the CDS signal is read out with a differential amplifier. The readout is normally performed using a digital scanning shift register similar to a standard CMOS linear photodiode array (PDA). The operation of the 101 function, including charge integration and summation, and CDS signal storage and transfer, is controlled by a plural of control switches and a set of timing signals.
One advantage of using CMOS circuitry in implementing the TDI detector system is that it can be integrated with all the operating clock generators and signal processing circuitry on a single chip using standard CMOS process. As a result, it reduces the manufacture cost.
Another advantage of using CMOS circuitry in implementing the X-ray TDI detector system is that it can be implemented with larger pixel size and at the same time, with very high scanning speed.
Another advantage of using CMOS circuitry in the current invention in implementing the 101 detector is that the CMOS circuitry can be separated and away from photodiode array. As a result, the CMOS circuitry can be properly shielded from X-ray radiation damage.
These and other objects and advantages of the present invention will become apparent to those skilled in the art in view of the description of the best presently known mode of carrying out the invention as described herein and as illustrated in the drawings.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
FIGS. 1 to 4 depict one preferred embodiment of the present invention. FIG.1 shows the schematic circuit diagram of one ID! stage 100. FIG. 2 shows the schematic circuit diagram of one pixel of a linear detector with N ID! stages. For an NI pixel array, it will contain M columns of the circuitry as shown in FIG. 2. FIG. 3 shows a block diagram of a CDS differential amplifier at the last 10! stage to read out the signal. FIG. 4 shows the timing diagram for the operation of the 101 sensor.
As shown in FIG. 1, each ID! stage 100 consists of one photodiode 101, one summing capacitor 102, one integrating and summing amplifier 103, and one CDS circuit 104. Integrating and summing amplifier 103 comprises an amplifier Al, an integrating capacitor Cl, and a reset switch SW1. Both integrating capacitor Cl and reset switch SWl are coupled between the input and output terminals of amplifier Al. CDS circuit 104 comprises two input switches SW2 and SW3, a first storage circuit comprising capacitor C2 and buffer amplifier A?, one transfer switch SW4, a second storage circuit comprising storage capacitor C3 and buffer amplifier A3, a third storage circuit comprising storage capacitor C4 and buffer amplifier A4, and two output switches SW5 and SW6. Summing capacitor 102 is used to receive both the reset and photo-signal voltages from the prior I stage. Integrating and summing amplifier 103 is used to reset photodiode 101 and to integrate and sum the reset and photo-signal voltages from the prior IDI stage and its own photodiode 101. CDS circuit 104 is used to sample and hold both the combined reset and photo-signal voltages from the output of integrating and summing amplifier 103.
FIG. 2 shows a column pixel with N stages of individual TDI circuit connected in cascade.
Each individual TN stage is a replica of TN stage 100 except the first stage 50 and last stage 200. In first TDI stage 50, since there is no prior stage, one plate of summing capacitor 52 is grounded. In last stage 200, buffer amplifiers A3 and A4 are replaced with buffer amplifiers 205 and 206 which have more driving capacity to drive heavier capacitive loading of the output differential amplifier 20 as shown in FIG. 3. To facilitate signal readout, both reset and photo signals, the output switches SW5 and SW6 of last stage 200 is replaced with a set of switches 207. Switches 207 are driven by SM which represents the output from digital scanning shift register 10. Scanning shift register 10 reads out each pixel of the M-stages array in sequence similar to a standard photodiode array. All the switches from SW1 to SW6 in each TO! stage are driven by the same clock pulses as shown in FIG. 4.
In operation, referring to FIG. 1, photodiode 101 and integrating and summing amplifier 103 are reset by closing switch SW1 before the start of its photo-signal integrating process.
Simultaneously, both switches SW? and SW6 are also closed. The close of SW6 allows the reset voltage stored on capacitor C4 to transfer to the following TDI stage. Consequently, the reset voltage of prior TD! stage is summed, through summing capacitor 102, with the reset voltage of amplifier 103. The combined reset voltage is stored on capacitor C? through switch SW?. To begin the integration process for each TN stage, SW1 is open followed by opening both SW2 and SW6 switches. There is a delay between the opening of SW2 and SW1 (SW1 is open earlier than SW2) as shown in the FIG. 4 timing diagram. This is to allow the settling of amplifier Al before sampling the reset voltage into capacitor C2.
Once the integration process begins, the switch 5W5 is closed to allow the photo-signal stored on capacitor C3 to transfer to the following IDI stage. Consequently, the photo-signal of prior TDI stage is summed, through summing capacitor 102, with current TDI stage photo-signal from photodetector 101. At the end of the integration cycle, switch SW3 is closed and the combined photo-signal is sampled and stored into capacitor Ci After SW3 opens, SW4 is closed and the reset voltage stored on C3 is transferred to capacitor C4. The photodiode 101 and amplifier Al are again reset to begin the next integration cycle. The process repeats until it reaches the last WI stage 200 as shown in FIG 2.
Scanning shift register 10 is then initiated by a start pulse SI to read out the signal from the M pixels linear array in sequence similar to a standard photodiode array. When a pixel is addressed by the output SM of scanning register 10, the reset and photo-signal voltages of the pixel are transferred to the CDS output differential amplifier 20 for processing. A gain stage 30 can be added to increase the signal level. As a result, a single-ended video signal is obtained as shown in FIG. 4.
FIG. 5 shows the schematic diagram of another preferred embodiment of the present invention. It depicts one TDI stage. The only difference between the circuits in FIG. 2 and FIG. 5 is that the function of integrating and summing amplifier 103 in FIG. 2 is replaced with an integrating amplifier 60 and a summing amplifier 70 in FIG. 5. The CDS circuits in both FIG. 2 and FIG. 5 are the same. Integrating amplifier 60 comprises amplifier Ala, integrating capacitor Cia, and reset switch SWia. The function of integrating amplifier 60 is to reset the photodiode 101 and to integrate its photo-signal into integrating capacitor Cia. Summing amplifier 70 comprises amplifier Aib, integrating capacitor Cib, and reset switch SW1b. The function of summing amplifier 70 is to sum the reset and photo voltages of photodiode 101 through summing capacitor 61 with the reset and photo voltages received from prior TDI stage through summing capacitor 62.
The CDS circuit 104 then performs the same sample-and-hold function as described before.
The timing diagram in FIG. 4 will need to be modified slightly to facilitate the separation of the integrating and summing functions.
The COS circuit 104, as shown in both FIGS. 1 & 4, uses two parallel, independent storage circuits to convey the reset signal and photo-signal. Alternatively, a chain of storage circuits can be used and where the reset signal and photo-signal can be conveyed through the chain one at a time. The advantage of using a single chain of storage circuits is that both the reset voltage and photo-signal will have the same offset induced by the buffer amplifiers. As a result, the offset can be completely eliminated by the following TDI stage.
In yet another preferred embodiment of the present invention, the itt stage as shown in FIG. 1 can be operated alternatively with timing sequence as shown in FIG. 6. In this mode of operation, fIrst the difference between the reset signal and photo-signal stored in CDS circuit 104 are taken before being summed with the photo-signal of photodiode 101. The cumulative photo-signal is then sampled and held into storage capacitor C3. The reset signal of photodiode 101 alone is also sampled and held into capacitor C?. It does not combined with the reset signal of prior TDI stage. Both modes of operation represented by timing diagrams in FIGS. 4 & 6 maintain the merit of the present invention.
Similarly the new mode of operation represented by FIG. 6 is also applicable to the ml circuit in FIG. 5 with minor timing modification to facilitate the separation of integrating and summing functions.
The preferred embodiments described above are just examples of the present invention.
There are numerous variations can be derived from this invention.

Claims (25)

  1. CLAIMS1. A CMOS IDI detector stage comprising: an integrating and summing amplifier having an integrating input terminal, a summing input terminal which may be joined to or may be separated from said integrating input terminal, an output terminal, an integration capacitor, and a reset switch; a photo-detector connecting to said integrating input terminal of said integrating and summing amplifier; a summing capacitor of which a first electrode is connected to output of prior TDI stage and a second electrode is connected to said summing input terminal of said integrating and summing amplifier; a correlated double sample and hold (CDS) circuit comprising a plural of switches and a plural of storage circuits, having an input terminal connected to said output terminal of said integrating and summing amplifier, and an output terminal connected to summing capacitor of the following 1DI stage; and wherein said integrating and summing amplifier is first reset by closing said reset switch, and when said reset switch is subsequently open, the reset signal of said photo-detector and the reset signal stored in CDS circuit of said prior TDI stage are summed and immediately sampled and held by said CDS circuit; thereafter said integrating and summing amplifier starts integrating photo-signal of said photo-detector and simultaneously sums integrated photo-signal of said photo-detector and the photo-signal stored in said CDS circuit of said prior TDI stage into a combined photo-signal which is sampled and held by said CDS circuit; and consequently said combined photo-signal and said reset signal held in said CDS circuit are ready for transfer to said following TDI stage.
  2. 2. A CMOS TOT detector stage according to claim 1, wherein said integrating and summing amplifier comprises one or more stages.
  3. 3. A CMOS WI detector stage according to claim 1, wherein said integrating input terminal and said summing input terminal are joined together into one input terminal, and further wherein said integration capacitor of said integrating and summing amplifier has its first electrode connected to said input terminal and its second electrode connected to said output terminal.
  4. 4. A CMOS WI detector stage according to claim 3, wherein said integrating and summing amplifier is an analog amplifier, either with single or differential inputs.
  5. 5. A CMOS IDI detector stage according to claim 1, wherein said integrating and summing amplifier having a dual-stage amplifier with the first-stage amplifier performing the integration of said photo-signal and the second-stage performing the summing function, and furthermore the input of said first-stage amplifier becomes integrating input terminal of said integrating and summing amplifier, the input of said second-stage amplifier is connected to the output of said first-stage amplifier and becomes said summing input terminal of said integrating and summing amplifier, and output of said second-stage amplifier becomes said output terminal of said integrating and summing amplifier.
  6. 6. A CMOS ID! detector stage according to claim 5, wherein said first-stage amplifier is an analog amplifier with single or differential inputs, and furthermore said integration capacitor has its first electrode connected to said integrating input terminal and its second electrode connected to output of said first-stage amplifier.
  7. 7. A CMOS ID! detector stage according to claim 5, wherein said second-stage amplifier is an analog amplifier with single or differential inputs, and further having an additional capacitor of which its first electrode connected to said input of said second-stage amplifier and its second electrode connected to said output of said second-stage amplifier.
  8. 8. A CMOS WI detector stage according to claim 1, wherein said photo-detector having a photo-sensitive diode capable of converting light into electrical current.
  9. 9. A CMOS IDI detector stage according to claim 1, wherein said storage circuit of said CDS circuit having a storage capacitor and a buffer amplifier.
  10. 10. A CMOS TO! detector stage according to claim 1, wherein said combined reset signal and said combined photo-signal are conveyed in parallel, independent storage circuits in said CDS circuit.
  11. 11. A CMOS TDJ detector stage according to claim 1, wherein said combined reset signal and said combined photo-signal are both conveyed in a single chain of storage circuits; furthermore said combined reset signal and said combined photo-signal are conveyed one-at-a-time through each storage circuit.
  12. 12. A CMOS TDI detector stage according to claim 1, wherein said photo-detector, said integrating and summing amplifier, and said CDS circuit are integrated on a single substrate, and further wherein a plurality of integrating and summing amplifiers and CDS circuits are physically isolated from a plurality of photo-detectors, so that the said plurality of integrating and summing amplifiers and CDS circuits may be shielded from harmful radiation while a plurality of photo-detectors is exposed to some harmful radiation in the process of receiving light.
  13. 13. A CMOS TDI detector stage comprising: an integrating and summing amplifier having an integrating input terminal, a summing input terminal which may be joined to or may be separated from said integrating input terminal, an output terminal, an integration capacitor, and a reset switch; a photo-detector connecting to said integrating input terminal of said integrating and summing amplifier; a summing capacitor of which a first electrode is connected to output of prior TOT stage and a second electrode is connected to said summing input terminal of said integrating and summing amplifier; a correlated double sample and hold (CDS) circuit comprising a plural of switches and a plural of storage circuits, having an input terminal connected to said output terminal of said integrating and summing amplifier, and an output terminal connected to summing capacitor of the following 101 stage; and -12 -wherein said integrating and summing amplifier is first reset by closing said reset switch, and when said reset switch is subsequently open, the resulting reset signal is sampled and held by said CDS circuit; thereafter said integrating and summing amplifier starts integrating photo-signal of said photo-detector and generates a cumulative signal that is the summation of integrated photo-signal of said photo-detector and the difference between the prior cumulative signal held in CDS circuit of said prior IDI stage and the reset signal held in said CDS circuit of said prior TDI stage; furthermore said cumulative signal is sampled and held by said CDS circuit; and consequently said cumulative signal and said reset signal held in said CDS circuit are ready for transfer to said following IDI stage.
  14. 14. A CMOS IDI detector stage according to claim 13, wherein said integrating and summing amplifier comprises one or more stages.
  15. 15. A CMOS TDI detector stage according to claim 13, wherein said integrating input terminal and said summing input terminal are joined together into one input terminal, and further wherein said integration capacitor of said integrating and summing amplifier has its first electrode connected to said input terminal and its second electrode connected to said output terminal.
  16. 16. A CMOS ID! detector stage according to claim 15, wherein said integrating and summing amplifier is an analog amplifier, either with single or differential inputs.
  17. 17. A CMOS TDI detector stage according to claim 13, wherein said integrating and summing amplifier having a dual-stage amplifier with the first-stage amplifier performing the integration of said photo-signal and the second-stage performing the summing function, and furthermore the input of said first-stage amplifier becomes integrating input terminal of said integrating and summing amplifier, the input of said second-stage amplifier is connected to the output of said first-stage amplifier and becomes said summing input terminal of said integrating and summing amplifier, and output of said second-stage amplifier becomes said output terminal of said integrating and summing amplifier.
  18. 18. A CMOS TDI detector stage according to claim 17, wherein said first-stage amplifier is an analog amplifier with single or differential inputs, and furthermore said integration capacitor has its first electrode connected to said integrating input terminal and its second electrode connected to output of said first-stage amplifier.
  19. 19. A CMOS TDI detector stage according to claim 17, wherein said second-stage amplifier is an analog amplifier with single or differential inputs, and further having an additional capacitor of which its first electrode connected to said input of said second-stage amplifier and its second electrode connected to said output of said second-stage amplifier.
  20. 20. A CMOS TDI detector stage according to claim 13, wherein said photo-detector having a photo-sensitive diode capable of converting light into electrical current.
  21. 21. A CMOS IDI detector stage according to claim 13, wherein said storage circuit of said CDS circuit having a storage capacitor and a buffer amplifier.
  22. 22. A CMOS TDI detector stage according to claim 13, wherein said reset signal and said cumulative signal are conveyed in parallel, independent storage circuits in said CDS circuit.
  23. 23. A CMOS TDI detector stage according to claim 13, wherein said reset signal and said cumulative signal are both conveyed in a single chain of storage circuits; furthermore said reset signal and said cumulative signal are conveyed one-at-a-time through each storage circuit.
  24. 24. A CMOS IDI detector stage according to claim 13, wherein said photo-detector, said integrating and summing amplifier, and said CDS circuit are integrated on a single substrate, and further wherein a plurality of integrating and summing amplifiers and CDS circuits are physically isolated from a plurality of photo-detectors, so that said plurality of integrating and summing amplifiers and CDS circuits may be shielded from harmful radiation while a plurality of photo-detectors is exposed to some harmful radiation in the process of receiving light.
  25. 25. A CMOS TDI detector stage substantially as described herein with reference to the drawings.
GB1113980.5A 2010-11-30 2011-08-12 CMOS time delay integration sensor for X-ray imaging applications Active GB2486039B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/927,961 US8039811B1 (en) 2009-12-04 2010-11-30 CMOS time delay integration sensor for X-ray imaging applications

Publications (3)

Publication Number Publication Date
GB201113980D0 GB201113980D0 (en) 2011-09-28
GB2486039A true GB2486039A (en) 2012-06-06
GB2486039B GB2486039B (en) 2016-10-05

Family

ID=44764467

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1113980.5A Active GB2486039B (en) 2010-11-30 2011-08-12 CMOS time delay integration sensor for X-ray imaging applications

Country Status (5)

Country Link
JP (1) JP5809492B2 (en)
CN (1) CN102611853B (en)
DE (1) DE102011052874B4 (en)
GB (1) GB2486039B (en)
IT (1) ITUD20110133A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4020975A3 (en) * 2020-12-22 2022-09-14 Samsung Electronics Co., Ltd. Time-resolving computational image sensor architecture for time-of-flight, high-dynamic-range, and high-speed imaging

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104270584A (en) * 2014-09-15 2015-01-07 天津大学 Current summation type pixel structure used for CMOS-TDI image sensor
JP6623734B2 (en) * 2015-12-14 2019-12-25 セイコーエプソン株式会社 Image reading device and semiconductor device
FR3047112B1 (en) * 2016-01-22 2018-01-19 Teledyne E2V Semiconductors Sas MULTILINEAR IMAGE SENSOR WITH LOAD TRANSFER WITH INTEGRATION TIME ADJUSTMENT
CN110034136B (en) * 2017-12-08 2022-12-16 X-Scan映像股份有限公司 Multi-energy X-ray detector based on integrated side-by-side pixel array sensor
KR102639599B1 (en) * 2018-12-28 2024-02-21 엘지디스플레이 주식회사 Digital x-ray detector and method for driving the same
JP7311731B2 (en) * 2021-07-13 2023-07-19 浜松ホトニクス株式会社 X-ray image acquisition device and X-ray image acquisition system
CN113824910B (en) * 2021-08-10 2023-07-21 西安理工大学 Analog domain advanced TDI (time delay integration) acceleration circuit and acceleration implementation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007141388A1 (en) * 2006-06-05 2007-12-13 Planmeca Oy X-ray imaging sensor and x-ray imaging method
CN101883221A (en) * 2010-06-29 2010-11-10 天津大学 Circuit and method for realizing TDI in CMOS image sensor
US8039811B1 (en) * 2009-12-04 2011-10-18 X-Scan Imaging Corporation CMOS time delay integration sensor for X-ray imaging applications

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6678048B1 (en) 1998-07-20 2004-01-13 Sandia Corporation Information-efficient spectral imaging sensor with TDI
US7397506B2 (en) * 1998-08-06 2008-07-08 Intel Corporation Reducing the effect of noise in an imaging system
AU1074901A (en) 1999-10-05 2001-05-10 California Institute Of Technology Time-delayed-integration imaging with active pixel sensors
US7268814B1 (en) * 1999-10-05 2007-09-11 California Institute Of Technology Time-delayed-integration imaging with active pixel sensors
JP4265964B2 (en) * 2003-11-12 2009-05-20 富士フイルム株式会社 Radiation image reading method and apparatus
US7532242B1 (en) * 2004-07-26 2009-05-12 Raytheon Company Pipelined amplifier time delay integration
FR2906081B1 (en) * 2006-09-19 2008-11-28 E2V Semiconductors Soc Par Act CMOS LINEAR IMAGE SENSOR WITH CHARGE TRANSFER TYPE OPERATION
US7675561B2 (en) 2006-09-28 2010-03-09 Cypress Semiconductor Corporation Time delayed integration CMOS image sensor with zero desynchronization
DE102007030985B4 (en) 2007-07-04 2009-04-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Image sensor, method of operating an image sensor and computer program
GB0806427D0 (en) 2008-04-09 2008-05-14 Cmosis Nv Parallel analog-to-digital conversion in pixel arrays
JP2010135464A (en) * 2008-12-03 2010-06-17 Konica Minolta Business Technologies Inc Solid-state imaging element, and imaging apparatus
JP5257134B2 (en) 2009-02-25 2013-08-07 コニカミノルタビジネステクノロジーズ株式会社 Solid-state imaging device and imaging apparatus including the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007141388A1 (en) * 2006-06-05 2007-12-13 Planmeca Oy X-ray imaging sensor and x-ray imaging method
US8039811B1 (en) * 2009-12-04 2011-10-18 X-Scan Imaging Corporation CMOS time delay integration sensor for X-ray imaging applications
CN101883221A (en) * 2010-06-29 2010-11-10 天津大学 Circuit and method for realizing TDI in CMOS image sensor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4020975A3 (en) * 2020-12-22 2022-09-14 Samsung Electronics Co., Ltd. Time-resolving computational image sensor architecture for time-of-flight, high-dynamic-range, and high-speed imaging
US11877079B2 (en) 2020-12-22 2024-01-16 Samsung Electronics Co., Ltd. Time-resolving computational image sensor architecture for time-of-flight, high-dynamic-range, and high-speed imaging

Also Published As

Publication number Publication date
CN102611853A (en) 2012-07-25
ITUD20110133A1 (en) 2012-05-31
JP5809492B2 (en) 2015-11-11
GB2486039B (en) 2016-10-05
DE102011052874B4 (en) 2021-08-05
CN102611853B (en) 2016-06-08
DE102011052874A1 (en) 2012-06-14
GB201113980D0 (en) 2011-09-28
JP2012120153A (en) 2012-06-21

Similar Documents

Publication Publication Date Title
US8039811B1 (en) CMOS time delay integration sensor for X-ray imaging applications
GB2486039A (en) CMOS TDI sensor for X-ray imaging applications
RU2589489C2 (en) Image forming apparatus, image forming system and method for actuation of image forming apparatus
US9706150B2 (en) Image pickup device and camera system with high precision at high speed pixel read
US8482644B2 (en) Solid-state imaging device
US7268814B1 (en) Time-delayed-integration imaging with active pixel sensors
US7675561B2 (en) Time delayed integration CMOS image sensor with zero desynchronization
KR100434806B1 (en) Time-delayed-integration imaging with active pixel sensors
EP2800356A1 (en) Image pickup element, image pickup apparatus, electronic device, and image pickup method
TWI586172B (en) Readout circuit for use in an image sensor and image system
EP3606048B1 (en) Solid-state imaging apparatus, method for driving solid-state imaging apparatus, and electronic device
US8681253B2 (en) Imaging system for creating an output signal including data double-sampled from an image sensor
JP2009527192A (en) A / D converter using transfer gate clock with slope
US11653886B2 (en) Ultra-fast scanning x-ray imaging device
US8975570B2 (en) CMOS time delay and integration image sensor
JP4566013B2 (en) Imaging device
US11523073B2 (en) Image sensor with noise cancellation feature and electronic device with same
JP4619640B2 (en) Signal detection method and apparatus
US7057147B1 (en) Imaging system and method for collecting energy from at least two sensing elements adjacent one another between rows of sensing elements
US20230131491A1 (en) Solid-state imaging device, imaging device, and distance measurement device
EP0928102A2 (en) Array sensors
JP2008227255A (en) Electronic device having charge detection amplifier
TW202318860A (en) Time delay integration sensor with dual gains
CN117813835A (en) Pixel device, image sensor, and method of operating pixel device
JP2019213742A (en) Radiation imaging apparatus, radiation imaging system, and control method for radiation imaging apparatus