GB2464010A - A device providing a live three-dimensional image of a speciment - Google Patents
A device providing a live three-dimensional image of a speciment Download PDFInfo
- Publication number
- GB2464010A GB2464010A GB0922723A GB0922723A GB2464010A GB 2464010 A GB2464010 A GB 2464010A GB 0922723 A GB0922723 A GB 0922723A GB 0922723 A GB0922723 A GB 0922723A GB 2464010 A GB2464010 A GB 2464010A
- Authority
- GB
- United Kingdom
- Prior art keywords
- tilting
- scanning
- source
- signal
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000002245 particle Substances 0.000 abstract 3
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1478—Beam tilting means, i.e. for stereoscopy or for beam channelling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1506—Tilting or rocking beam around an axis substantially at an angle to optical axis
- H01J2237/1507—Tilting or rocking beam around an axis substantially at an angle to optical axis dynamically, e.g. to obtain same impinging angle on whole area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/2611—Stereoscopic measurements and/or imaging
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2813—Scanning microscopes characterised by the application
- H01J2237/2814—Measurement of surface topography
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Microscoopes, Condenser (AREA)
Abstract
The beam of particles from the primary source is led to the secondary source (1) and a tilting and simultaneously scanning unit (2) placed above the objective (3) is inserted to the path of the output beam of particles with an axis (5). The tilting and scanning unit (2), seen in the direction from the viewed specimen (4) upwards, consists of a bottom stage (2.2) and a top stage (2.1). The top stage (2.1) and the bottom stage (2.2) consist of at least two tilting and scanning elements (6, 7) arranged to create fields orthogonal to each other in the area where the beam of particles with the axis (5) passes through them. Both the output of the first adjustable source (6.1) of a direct tilting signal and the first adjustable source (6.2) of an alternating scanning signal are connected to the first tilting and scanning element (6). Both the output of the second adjustable source (7.1) of a direct tilting signal and the second adjustable source (7.2) of an alternating scanning signal are connected to the second tilting and scanning element (7).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CZ20070510A CZ2007510A3 (en) | 2007-07-30 | 2007-07-30 | Device for spatial, real time representation of a sample |
PCT/CZ2008/000050 WO2009015615A1 (en) | 2007-07-30 | 2008-04-28 | A device providing a live three-dimensional image of a speciment |
Publications (2)
Publication Number | Publication Date |
---|---|
GB0922723D0 GB0922723D0 (en) | 2010-02-17 |
GB2464010A true GB2464010A (en) | 2010-04-07 |
Family
ID=38973036
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0922723A Withdrawn GB2464010A (en) | 2007-07-30 | 2008-04-28 | A device providing a live three-dimensional image of a speciment |
Country Status (4)
Country | Link |
---|---|
CZ (1) | CZ2007510A3 (en) |
DE (2) | DE112008002044T5 (en) |
GB (1) | GB2464010A (en) |
WO (1) | WO2009015615A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5259688B2 (en) | 2010-12-09 | 2013-08-07 | 本田技研工業株式会社 | Scanning electron microscope |
JP5364112B2 (en) * | 2011-01-25 | 2013-12-11 | 株式会社日立ハイテクノロジーズ | Charged particle beam equipment |
CN111508807B (en) * | 2020-04-26 | 2022-11-25 | 北京工业大学 | Scanning electron microscope stereo imaging system |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4983832A (en) * | 1988-07-25 | 1991-01-08 | Hitachi, Ltd. | Scanning electron microscope |
EP1045425A2 (en) * | 1999-04-15 | 2000-10-18 | ICT Integrated Circuit Testing GmbH | Charged particle beam column |
US20010025925A1 (en) * | 2000-03-28 | 2001-10-04 | Kabushiki Kaisha Toshiba | Charged particle beam system and pattern slant observing method |
EP1463087A1 (en) * | 2003-03-24 | 2004-09-29 | ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh | Charged particle beam device |
US6930308B1 (en) * | 2002-07-11 | 2005-08-16 | Kla-Tencor Technologies Corporation | SEM profile and surface reconstruction using multiple data sets |
US20050199827A1 (en) * | 2004-01-21 | 2005-09-15 | Osamu Nagano | Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device |
US6963067B2 (en) * | 2003-01-06 | 2005-11-08 | Hitachi High-Technologies Corporation | Scanning electron microscope and sample observing method using it |
US20060033037A1 (en) * | 2004-08-10 | 2006-02-16 | Takeshi Kawasaki | Charged particle beam column |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3986027A (en) * | 1975-04-07 | 1976-10-12 | American Optical Corporation | Stereo scanning microprobe |
-
2007
- 2007-07-30 CZ CZ20070510A patent/CZ2007510A3/en not_active IP Right Cessation
-
2008
- 2008-04-28 GB GB0922723A patent/GB2464010A/en not_active Withdrawn
- 2008-04-28 DE DE112008002044T patent/DE112008002044T5/en not_active Ceased
- 2008-04-28 WO PCT/CZ2008/000050 patent/WO2009015615A1/en active Application Filing
- 2008-04-28 DE DE202008018179U patent/DE202008018179U1/en not_active Expired - Lifetime
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4983832A (en) * | 1988-07-25 | 1991-01-08 | Hitachi, Ltd. | Scanning electron microscope |
EP1045425A2 (en) * | 1999-04-15 | 2000-10-18 | ICT Integrated Circuit Testing GmbH | Charged particle beam column |
US20010025925A1 (en) * | 2000-03-28 | 2001-10-04 | Kabushiki Kaisha Toshiba | Charged particle beam system and pattern slant observing method |
US6930308B1 (en) * | 2002-07-11 | 2005-08-16 | Kla-Tencor Technologies Corporation | SEM profile and surface reconstruction using multiple data sets |
US6963067B2 (en) * | 2003-01-06 | 2005-11-08 | Hitachi High-Technologies Corporation | Scanning electron microscope and sample observing method using it |
EP1463087A1 (en) * | 2003-03-24 | 2004-09-29 | ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh | Charged particle beam device |
US20050199827A1 (en) * | 2004-01-21 | 2005-09-15 | Osamu Nagano | Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device |
US20060033037A1 (en) * | 2004-08-10 | 2006-02-16 | Takeshi Kawasaki | Charged particle beam column |
Also Published As
Publication number | Publication date |
---|---|
CZ298798B6 (en) | 2008-01-30 |
WO2009015615A8 (en) | 2011-05-26 |
DE202008018179U1 (en) | 2012-01-16 |
DE112008002044T5 (en) | 2010-12-30 |
CZ2007510A3 (en) | 2008-01-30 |
GB0922723D0 (en) | 2010-02-17 |
WO2009015615A1 (en) | 2009-02-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |