GB2369687B - Method of manufacturing semiconductor devices - Google Patents

Method of manufacturing semiconductor devices

Info

Publication number
GB2369687B
GB2369687B GB0200338A GB0200338A GB2369687B GB 2369687 B GB2369687 B GB 2369687B GB 0200338 A GB0200338 A GB 0200338A GB 0200338 A GB0200338 A GB 0200338A GB 2369687 B GB2369687 B GB 2369687B
Authority
GB
United Kingdom
Prior art keywords
semiconductor devices
manufacturing semiconductor
manufacturing
devices
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0200338A
Other versions
GB2369687A (en
GB0200338D0 (en
Inventor
Mi-Sook Jeon
Chun-Deuk Lee
June-Ing Gil
Pil-Kwonjun
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1019970061935A external-priority patent/KR100271761B1/en
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of GB0200338D0 publication Critical patent/GB0200338D0/en
Publication of GB2369687A publication Critical patent/GB2369687A/en
Application granted granted Critical
Publication of GB2369687B publication Critical patent/GB2369687B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB0200338A 1997-11-21 1998-07-03 Method of manufacturing semiconductor devices Expired - Fee Related GB2369687B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1019970061935A KR100271761B1 (en) 1997-11-21 1997-11-21 Manufacturing method of semiconductor device
GB9814540A GB2331594B (en) 1997-11-21 1998-07-03 A method of manufacturing a semiconductor device

Publications (3)

Publication Number Publication Date
GB0200338D0 GB0200338D0 (en) 2002-02-20
GB2369687A GB2369687A (en) 2002-06-05
GB2369687B true GB2369687B (en) 2002-10-09

Family

ID=26313978

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0200338A Expired - Fee Related GB2369687B (en) 1997-11-21 1998-07-03 Method of manufacturing semiconductor devices

Country Status (1)

Country Link
GB (1) GB2369687B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101187788A (en) * 2006-11-17 2008-05-28 安集微电子（上海）有限公司 Low etching relative thick photoresist cleaning liquor

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4617251A (en) * 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same
JPH04350660A (en) * 1991-05-28 1992-12-04 Texas Instr Japan Ltd Peeling solution for positive type photoresist for producing semiconductor device and production of this device
US5279771A (en) * 1990-11-05 1994-01-18 Ekc Technology, Inc. Stripping compositions comprising hydroxylamine and alkanolamine
US5597678A (en) * 1994-04-18 1997-01-28 Ocg Microelectronic Materials, Inc. Non-corrosive photoresist stripper composition
WO1998050516A1 (en) * 1997-05-05 1998-11-12 Olin Microelectronic Chemicals, Inc. Non-corrosive stripping and cleaning composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4617251A (en) * 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same
US5279771A (en) * 1990-11-05 1994-01-18 Ekc Technology, Inc. Stripping compositions comprising hydroxylamine and alkanolamine
JPH04350660A (en) * 1991-05-28 1992-12-04 Texas Instr Japan Ltd Peeling solution for positive type photoresist for producing semiconductor device and production of this device
US5597678A (en) * 1994-04-18 1997-01-28 Ocg Microelectronic Materials, Inc. Non-corrosive photoresist stripper composition
WO1998050516A1 (en) * 1997-05-05 1998-11-12 Olin Microelectronic Chemicals, Inc. Non-corrosive stripping and cleaning composition

Also Published As

Publication number Publication date
GB2369687A (en) 2002-06-05
GB0200338D0 (en) 2002-02-20

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20140703