GB2263708B - II-VI Epitaxial layer on (111) substrate and method - Google Patents

II-VI Epitaxial layer on (111) substrate and method

Info

Publication number
GB2263708B
GB2263708B GB9301489A GB9301489A GB2263708B GB 2263708 B GB2263708 B GB 2263708B GB 9301489 A GB9301489 A GB 9301489A GB 9301489 A GB9301489 A GB 9301489A GB 2263708 B GB2263708 B GB 2263708B
Authority
GB
United Kingdom
Prior art keywords
substrate
epitaxial layer
epitaxial
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9301489A
Other languages
English (en)
Other versions
GB9301489D0 (en
GB2263708A (en
Inventor
Hiroji Ebe
Akira Sawada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of GB9301489D0 publication Critical patent/GB9301489D0/en
Publication of GB2263708A publication Critical patent/GB2263708A/en
Application granted granted Critical
Publication of GB2263708B publication Critical patent/GB2263708B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
    • H10P14/3424—Deposited materials, e.g. layers characterised by the chemical composition being Group IIB-VIA materials
    • H10P14/3432—Tellurides
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/46—Sulfur-, selenium- or tellurium-containing compounds
    • C30B29/48—AIIBVI compounds wherein A is Zn, Cd or Hg, and B is S, Se or Te
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
    • H10P14/2901—Materials
    • H10P14/2902—Materials being Group IVA materials
    • H10P14/2905—Silicon, silicon germanium or germanium
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
    • H10P14/2901—Materials
    • H10P14/2907—Materials being Group IIIA-VA materials
    • H10P14/2911—Arsenides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
    • H10P14/2926—Crystal orientations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3466—Crystal orientation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/973—Substrate orientation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Recrystallisation Techniques (AREA)
  • Light Receiving Elements (AREA)
GB9301489A 1992-01-31 1993-01-26 II-VI Epitaxial layer on (111) substrate and method Expired - Fee Related GB2263708B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01666392A JP3263964B2 (ja) 1992-01-31 1992-01-31 半導体装置形成用結晶とその製造方法

Publications (3)

Publication Number Publication Date
GB9301489D0 GB9301489D0 (en) 1993-03-17
GB2263708A GB2263708A (en) 1993-08-04
GB2263708B true GB2263708B (en) 1995-01-18

Family

ID=11922573

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9301489A Expired - Fee Related GB2263708B (en) 1992-01-31 1993-01-26 II-VI Epitaxial layer on (111) substrate and method

Country Status (4)

Country Link
US (2) US5302232A (enExample)
JP (1) JP3263964B2 (enExample)
FR (1) FR2687010A1 (enExample)
GB (1) GB2263708B (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5449927A (en) * 1994-05-16 1995-09-12 Santa Barbara Research Center Multilayer buffer structure including II-VI compounds on a silicon substrate
JPH08107068A (ja) * 1994-10-03 1996-04-23 Nec Corp ＭＢＥ法によるＳｉ基板上ＣｄＴｅ成長方法
JP2570646B2 (ja) * 1994-12-13 1997-01-08 日本電気株式会社 Ｓｉベ−ス半導体結晶基板及びその製造方法
GB2302209A (en) * 1994-12-20 1997-01-08 Mitsubishi Electric Corp Method of growing compound semiconductor layer
US5833749A (en) * 1995-01-19 1998-11-10 Nippon Steel Corporation Compound semiconductor substrate and process of producing same
US5998809A (en) * 1995-10-06 1999-12-07 Raytheon Company Room temperature 3-5 micrometer wavelength HgCdTe heterojunction emitter
US6045614A (en) * 1996-03-14 2000-04-04 Raytheon Company Method for epitaxial growth of twin-free, (111)-oriented II-VI alloy films on silicon substrates
US6036770A (en) * 1996-04-04 2000-03-14 Raytheon Company Method of fabricating a laterally continuously graded mercury cadmium telluride layer
US6091127A (en) * 1997-04-02 2000-07-18 Raytheon Company Integrated infrared detection system
US5861626A (en) * 1996-04-04 1999-01-19 Raytheon Ti System, Inc. Mercury cadmium telluride infrared filters and detectors and methods of fabrication
US5998235A (en) 1997-06-26 1999-12-07 Lockheed Martin Corporation Method of fabrication for mercury-based quaternary alloys of infrared sensitive materials
DE19938631A1 (de) * 1999-08-14 2001-02-22 Hatto Schick Verfahren zur Herstellung dünner einkristalliner Schichten
US6872252B2 (en) 2002-03-06 2005-03-29 Agilent Technologies, Inc. Lead-based perovskite buffer for forming indium phosphide on silicon
US7541105B2 (en) * 2006-09-25 2009-06-02 Seagate Technology Llc Epitaxial ferroelectric and magnetic recording structures including graded lattice matching layers
WO2009052475A1 (en) * 2007-10-18 2009-04-23 U.S.A. As Representated By The Administrator Of The National Aeronautics And Space Administration Method of generating x-ray diffraction data for integral detection of twin defects in super-hetero-epitaxial materials
GB2489924A (en) * 2011-04-06 2012-10-17 Isis Innovation Integrating III-V or II-VI devices with high resistivity silicon or germanium substrates
CN102888584B (zh) * 2012-09-17 2014-05-14 上海大学 一种基于金刚石薄膜上沉积CdTe薄膜的方法
US8823146B1 (en) * 2013-02-19 2014-09-02 Raytheon Company Semiconductor structure having silicon devices, column III-nitride devices, and column III-non-nitride or column II-VI devices
US9614026B2 (en) 2013-03-13 2017-04-04 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration High mobility transport layer structures for rhombohedral Si/Ge/SiGe devices
CN106883419B (zh) * 2017-01-19 2020-07-03 湖北大学 一种钴基金属-有机骨架材料的快速合成方法及其应用
MY204554A (en) 2017-02-24 2024-09-04 First Solar Inc Doped photovoltaic semiconductor layers and methods of making
JP7684893B2 (ja) * 2021-12-20 2025-05-28 株式会社東芝 ウェーハ、半導体装置、及び、ウェーハの製造方法
WO2025250817A1 (en) * 2024-05-31 2025-12-04 MONDE Wireless, Inc. Methods and systems for the deposition of n-polar iii-nitrides on silicon substrates

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2078695A (en) * 1980-05-27 1982-01-13 Secr Defence Cadmium Mercury Telluride Deposition
GB2130189A (en) * 1982-10-19 1984-05-31 Secr Defence Vapour deposition of films
GB2156857A (en) * 1983-11-30 1985-10-16 Philips Electronic Associated Method of manufacturing a semiconductor device
US4828938A (en) * 1986-04-11 1989-05-09 Hughes Aircraft Company Method for depositing materials containing tellurium and product
EP0332198A1 (en) * 1988-03-11 1989-09-13 Production Engineering Association Method for producing semiconductive single crystal

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61274313A (ja) * 1985-05-29 1986-12-04 Mitsubishi Electric Corp 半導体装置
JPS61276313A (ja) * 1985-05-31 1986-12-06 Oki Electric Ind Co Ltd 半導体装置の製造方法
JPS63194322A (ja) * 1987-02-09 1988-08-11 Sharp Corp 化合物半導体基板
JP2563937B2 (ja) * 1987-08-24 1996-12-18 日本電信電話株式会社 ▲ｉｉｉ▼−▲ｖ▼族化合物半導体結晶基板
JP2687445B2 (ja) * 1988-06-11 1997-12-08 ソニー株式会社 ヘテロエピタキシャル成長方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2078695A (en) * 1980-05-27 1982-01-13 Secr Defence Cadmium Mercury Telluride Deposition
GB2130189A (en) * 1982-10-19 1984-05-31 Secr Defence Vapour deposition of films
GB2156857A (en) * 1983-11-30 1985-10-16 Philips Electronic Associated Method of manufacturing a semiconductor device
US4828938A (en) * 1986-04-11 1989-05-09 Hughes Aircraft Company Method for depositing materials containing tellurium and product
EP0332198A1 (en) * 1988-03-11 1989-09-13 Production Engineering Association Method for producing semiconductive single crystal

Also Published As

Publication number Publication date
JP3263964B2 (ja) 2002-03-11
US5302232A (en) 1994-04-12
FR2687010B1 (enExample) 1995-05-12
JPH05217890A (ja) 1993-08-27
GB9301489D0 (en) 1993-03-17
FR2687010A1 (fr) 1993-08-06
GB2263708A (en) 1993-08-04
US5394826A (en) 1995-03-07

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20040126