GB2156862B - Cathode sputtering unit - Google Patents

Cathode sputtering unit

Info

Publication number
GB2156862B
GB2156862B GB08508836A GB8508836A GB2156862B GB 2156862 B GB2156862 B GB 2156862B GB 08508836 A GB08508836 A GB 08508836A GB 8508836 A GB8508836 A GB 8508836A GB 2156862 B GB2156862 B GB 2156862B
Authority
GB
United Kingdom
Prior art keywords
cathode sputtering
sputtering unit
unit
cathode
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08508836A
Other languages
English (en)
Other versions
GB8508836D0 (en
GB2156862A (en
Inventor
Peter Mahler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold Heraeus GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus GmbH filed Critical Leybold Heraeus GmbH
Publication of GB8508836D0 publication Critical patent/GB8508836D0/en
Publication of GB2156862A publication Critical patent/GB2156862A/en
Application granted granted Critical
Publication of GB2156862B publication Critical patent/GB2156862B/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB08508836A 1984-04-06 1985-04-04 Cathode sputtering unit Expired GB2156862B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843413001 DE3413001A1 (de) 1984-04-06 1984-04-06 Katodenzerstaeubungsanlage mit nebeneinander angeordneten stationen

Publications (3)

Publication Number Publication Date
GB8508836D0 GB8508836D0 (en) 1985-05-09
GB2156862A GB2156862A (en) 1985-10-16
GB2156862B true GB2156862B (en) 1986-10-22

Family

ID=6232865

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08508836A Expired GB2156862B (en) 1984-04-06 1985-04-04 Cathode sputtering unit

Country Status (5)

Country Link
US (1) US4595483A (enExample)
JP (1) JPS60230980A (enExample)
DE (1) DE3413001A1 (enExample)
FR (1) FR2562560B1 (enExample)
GB (1) GB2156862B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4701251A (en) * 1986-02-03 1987-10-20 Bvt Limited Apparatus for sputter coating discs
US5019233A (en) * 1988-10-31 1991-05-28 Eaton Corporation Sputtering system
DE3912297C2 (de) * 1989-04-14 1996-07-18 Leybold Ag Katodenzerstäubungsanlage
DE3912296C2 (de) * 1989-04-14 1996-07-18 Leybold Ag Vorrichtung zur Aufnahme und Halterung von Substraten
DE3912295C2 (de) * 1989-04-14 1997-05-28 Leybold Ag Katodenzerstäubungsanlage
JP3466607B2 (ja) * 1989-09-13 2003-11-17 ソニー株式会社 スパッタリング装置
US5322606A (en) * 1991-12-26 1994-06-21 Xerox Corporation Use of rotary solenoid as a shutter actuator on a rotating arm
US5482607A (en) * 1992-09-21 1996-01-09 Nissin Electric Co., Ltd. Film forming apparatus
DE4312014A1 (de) * 1993-04-13 1994-10-20 Leybold Ag Vorrichtung zum Beschichten und/oder Ätzen von Substraten in einer Vakuumkammer
US8679307B2 (en) * 2002-08-02 2014-03-25 E.A. Fischione Instruments, Inc. Method and apparatus for preparing specimens for microscopy
EP3091561B1 (en) * 2015-05-06 2019-09-04 safematic GmbH Sputter unit
AT519107B1 (de) * 2017-01-23 2018-04-15 Miba Gleitlager Austria Gmbh Verfahren zur Herstellung eines Mehrschichtgleitlagerelementes

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5130764B2 (enExample) * 1971-11-02 1976-09-02
DE2330710A1 (de) * 1973-06-16 1975-01-09 Leybold Heraeus Gmbh & Co Kg Vakuumaufdampfvorrichtung mit mehreren kammern
US3981791A (en) * 1975-03-10 1976-09-21 Signetics Corporation Vacuum sputtering apparatus
JPS53124968A (en) * 1977-04-08 1978-10-31 Hitachi Ltd Continuous vapor deposition apparatus
DE2932483A1 (de) * 1979-08-10 1981-04-02 Leybold-Heraeus GmbH, 5000 Köln Testglashalter mit einer drehbaren platine und mehreren ausnehmungen fuer testglaeser
DE2932438C3 (de) * 1979-08-10 1982-03-11 Aeg-Elotherm Gmbh, 5630 Remscheid Halbschaleninduktor zur induktiven Oberflächenerwärmung von wellenförmig ausgebildeten Werkstücken
JPS5643158U (enExample) * 1979-09-11 1981-04-20
JPS5730341A (en) * 1980-07-30 1982-02-18 Anelva Corp Substrate processing device
US4433951A (en) * 1981-02-13 1984-02-28 Lam Research Corporation Modular loadlock
US4450062A (en) * 1981-12-22 1984-05-22 Raytheon Company Sputtering apparatus and methods
US4444643A (en) * 1982-09-03 1984-04-24 Gartek Systems, Inc. Planar magnetron sputtering device
JPH0666298B2 (ja) * 1983-02-03 1994-08-24 日電アネルバ株式会社 ドライエッチング装置
DE3306870A1 (de) * 1983-02-26 1984-08-30 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zum herstellen von schichten mit rotationssymmetrischem dickenprofil durch katodenzerstaeubung
US4500407A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Disk or wafer handling and coating system
US4547247A (en) * 1984-03-09 1985-10-15 Tegal Corporation Plasma reactor chuck assembly
US4548699A (en) * 1984-05-17 1985-10-22 Varian Associates, Inc. Transfer plate rotation system

Also Published As

Publication number Publication date
FR2562560A1 (fr) 1985-10-11
US4595483A (en) 1986-06-17
FR2562560B1 (fr) 1989-07-28
JPS60230980A (ja) 1985-11-16
DE3413001A1 (de) 1985-10-17
GB8508836D0 (en) 1985-05-09
DE3413001C2 (enExample) 1991-08-29
GB2156862A (en) 1985-10-16

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19940404