GB2148680A - X-ray collimator - Google Patents

X-ray collimator Download PDF

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Publication number
GB2148680A
GB2148680A GB08419439A GB8419439A GB2148680A GB 2148680 A GB2148680 A GB 2148680A GB 08419439 A GB08419439 A GB 08419439A GB 8419439 A GB8419439 A GB 8419439A GB 2148680 A GB2148680 A GB 2148680A
Authority
GB
United Kingdom
Prior art keywords
ray
collimator
accompanying drawings
holes
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB08419439A
Other versions
GB8419439D0 (en
Inventor
Yasuo Kawai
Takao Kariya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB8419439D0 publication Critical patent/GB8419439D0/en
Publication of GB2148680A publication Critical patent/GB2148680A/en
Withdrawn legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Abstract

An X-ray collimator 7 minimizing the attenuation of an X-ray to improve an X-ray transmission factor includes an X-ray transmitting portion having a plurality of through-holes 9, 9' and a frame member 8 for supporting the X-ray transmitting portion so that the attenuation of the X-ray is suppressed and the X-ray transmission factor is improved. The collimator is applied to apparatus in which an integrated circuit pattern is transferred to a wafer by exposure to soft X-rays through a photomask (Figure 5). <IMAGE>

Description

SPECIFICATION An X-ray collimator and an X-ray exposure apparatus having the X-ray collimator This invention relates to a collimatorfor collimating X-rays, particularly soft X-rays, and to an X-ray exposure apparatus having such collimator.
X-ray collimators have been used inthefield of X-ray analyzers, and recently are used in X-ray exposure apparatuses wherein X-rays are used to transfer an integrated circuit pattern formed on a mask or reticle to a radiation-sensitive layer on a wafer. In the X-ray exposure apparatus, the mask or reticle (which will hereinafter be referred to simply as "mask") having a pattern formed thereon is irradiated by diverging soft X-rays so that the image transfer onto the sensitive layer on the wafer tends to be affected by the angles of incidence ofthe X-rays. In view ofthis, an X-ray collimator is employed to collimatethesoftX-rays irradiating the maskto improve the accuracy oftransfer ofthe circuit pattern ofthe mask onto the sensitive layer.
Figure 1 shows an example of a basic X-ray collimator. The collimator comprises two blocks each of which includes a plurality of thin metal slit plates 1 connected to each other with spacers 2 intervening therebetween. The slit plates 1 and spacers 2 are secured to a support frame (not shown) to provide each block. As is shown in the drawing, one ofthethus formed blocks rests on the other in the manner that the lengthwise direction ofthe slit of one block extends perpendicular to that of the other block. Among the diverging X-rays 3 emerging from an unshown source, onlythecomponents substantially orthogonal tothecollimatingsystemaretaken upsothatan approximately parallel X-rayflux 6 is obtainable.For the purpose of description, the wide dand the length I of each slit in one block are equal respectively to those in the other block in the illustrated arrangement.
Therefore, the angle of divergence is2tan-1(dll) degrees and the X-ray transmission factor is 11(1 +t/d)2 where tis the thickness ofthe slit plate. The intensity of X-ray decreases in inverse proportion to the square of the distance from the X-ray source. It is understood from the above mathematical conditions that, in order to assure good parallelism (small angle of divergence), a high transmission factorand a high intensity ofX-rayflux, the width dot the slit and the thickness t ofthe slit plate should desirably be decreased to prevent increase in the length Jofthe slit. Moreover, in orderto facilitate industrial manufacture, the structure should be simple and the increase in the cost should be suppressed.
In usual, however, the thickness tofthe slit plate can not be less than ofthe order of 0.03 mm even if the slit plate is made of metal having a high rigidity. If a lesser thickness is employed, it becomes necessary to incorporate additionat means for removing flexure of the slit plate, which disadvantageously leads to a complicated structure and an increased cost of manufacture of the device.
It is accordingly a primary object ofthe present invention to provide an X-raycollimatorwhich ensures improved parallelism and an increased transmission factor ofthe X-rayflux.
Another object of the present invention is to provide an X-ray exposure apparatus including an improved X-ray collimator as above.
These and other objects, features and advantages of the present invention will become more apparatus upon a consideration ofthefollowing description of the preferred embodiments ofthe present invention taken in conjunction with the accompanying drawings.
Figure lisa perspective view showing an example of a basic X-ray collimator.
Figure 2 is a perspective view showing an X-ray collimator according to one aspect ofthe present invention.
Figure 3 is an enlarged view showing the major part oftheX-raycollimatorshown in Figure 3.
Figures 4A, 4B and 4C illustrate, respectively, modified forms of X-ray collimators according to the present invention.
Figure5 is a schematic view showing an X-ray exposure apparatus according to a further aspect of the present invention.
Referring now to Figure 2 - 5, embodiments of the present invention wil be described.
Figure2 generally shows a softX-raycollimator according to one aspect ofthe present invention, while Figure 3 shows, in an enlarged scale, the major partofthe structure shown in Figure 2. The collimator includes a soft X-ray collimating portion 7 made of a glass. As is best shown in Figure 3, the collimating portion 7 includes a multiplicity of unit fine throughbores or holes 9, 9' each ofwhich has an interior diameter dofthe orderof 10 microns and a length lof the order of millimeters. The collimating portion 7 is supported bya support frame 8 made of a glass or other suitable material.
With this arrangement, diverging soft X-rays denoted at3 in Figure 3 and emitted from an X-ray generator 22 are collirr.ated bythe collimating portion 7sothatan approximatelyparallelX-rayflux6' is obtained. More specifically, only those ofthe soft X-rays having angles of divergence notgreaterthan 2tan-l(d/l) are taken up by the provision offine through-bores 9, 9' each ofwhich has an interior diameterdanda length!. Considering nowthe collimation at one one the fine through-bores 9, 9', a part of the diverging softX-raysenteringthefine through-bore impinges against the glass wall of the through-bore so that it is restrained thereby, while the remaining part passesthrough thefinethrough-bore without impringing againstthe glass wall.The latter, emerging X-ray flux, has a divergence angle of 2tan1(d/l) as has been described in the foregoing. If, for example, a divergence angle of 1 degree isto be obtained, and wherethe interiordiameterdofthe through-bore is 30 microns, the length lof the through-bore may about3.44 mm.
Thefinethrough-borescan be manufactured buy a known method, e.g. a glass-plate fine mesh manufacturing method forthe manufacture of micro-channel plate (such as disclosed in "Optical Fiber", pages 191 193, published by Kyoritsu Shuppan Kabushiki Kaisha).Thistechnique has beenwidely used, and the plate with fine bores can be considered as being equivalent to the fine mesh plate before the formation of electrodes or the like. Accordingly,the fine throughbores ofthe present invention can be conveniently manufactured.
Referring nowto Figures4A-4C, modified forms of the collimator according to the present invention will be described. The collimator shown in Figure 4A comprises a glass frame 10 and a multiplicity offine tubular element 11 supportedly arranged within the frame 10. Sincethe diameter of each tubular element is so small thatthe handling thereof is notso easy,the tubular elements are first disposed in a multi-array fashion and then are subjected to a high-temperature and a high pressure within an oven sothattheyare welded to each other.
As an alternative,thetubular element 1 may be replaced by optical fibers each of which has a meltable core. In this case, the core is removed by a suitable acid treatment afterthe welding.
The thus formed weld plate is then sliced up to provide collimators of desired thickness. In the collimatorshown in Figure 4A,thewall thickness of each tubular element is of the order of 2.5 microns whilethe interior diameter is ofthe order of 25 micron.
Figures 4B and 4C showfurther modified forms wherein each fine through-bore shown in Figure 4B has a rectangular cross-section while each fine through-bore shown in Figure 4C has a hexagonal cross-section. The embodiments ofcircularcross- section and hexagonal cross-section are particularly advantageous, since the fine through-bores of these embodiments are easy to manufacture and, in addition thereto, the cross-sectional area to be occupied bythe partition walls is small so thatthe X-ray transmission factor can be improved further.
The collimator according to the present invention can be used in all the fields wherein collimated soft X-rays are to be used, such as typically X-ray analyzers and X-ray exposure apparatuses.
Referring now to Figure 5, an X-ray exposure apparatus according to another aspect ofthe present invention will be described. The X-ray exposure apparatus comprises a vacuum chamber 12, electron guns 13, a soft X-ray generating target 14 and a window for passing therethrough the soft X-rays generated bythetarget 14. The electron guns 13 are arrayed in the direction perpendicularto the sheet of the drawing and the target 14 extends perpendicularly to the sheet of the drawing so that a linear soft X-ray flux is provided.
The X-ray exposure apparatusfurther comprises an X-ray collimator including a collimating portion 7 and aframe member8forthecollimating portion. The collimator shown in this drawing has substantially the same arrangement as of Figure 2 embodiment. The apparatusfurthercomprisesa photomaskchuckl7 for holding a photomask 16 having formed thereof an integrated circuit pattern, and a wafer chuck 19 for holding a wafer 18 having thereon a sensitive layer.
The photomaskchuck 17 andthewaferchuckl9are arranged so thatthey are moved as a unit at a constant speed along a guide member 20 by an unshown driving mechanismwhilethey hold the photomask 16 and wafer 18 with a proximity relation being main tained therebetween.
With this arrangement, the electron beams emitted from the electron guns 13 irradiate the target 14so that soft X-rays are generated. The thus generated soft X-raysdiverginglypassthroughthewindowand are incident on the collimating portion 7. Bythiscollimat- ing portion 7,the non-parallel components are restrained while the parallel components pass throughthecollimating portion 7 to linearly irradiate the photomask 16. Since the photomask 16 and wafer 18 are scanningly moved as a unit as described before, the whole surface of each of the photomask 16 and wafer 18 is uniformly irradiated with the soft X-rays.
It is known that the soft X-ray steeply attenuates in the air as compared with the hard X-ray used in the medical field. Whilethe collimatorshown in Figure 1 requires a distance of not less than 12cm from the X-ray generating point to the surface of the sensitive layer on the wafer 16 in orderto obtain a satisfactory parallelism,the collimator according to the present invention effectively reduces the necessary distance between the X-ray generating point and the surface of the sensitive layerto a degree offew millimeters.
Therefore, the exposure time is advanageously decreased to a degree of 1110 - 1120 or less, as compared with that in the case of Figure 1 collimator.
Moreover, the X-ray collimator according to the present invention is itself of simple structure and can be manufactured at a decreased cost. Further, the thickness of the collimator is sufficiently thin so that the attenuation of the X-rays is minimized to ensure a higherX-raytransmission factor.
As has been in the foregoing, the X-ray collimator and the X-ray exposure apparatus, in accordance with the present invention provide various advantageous effects.
Whilethe invention has been described with reference to the structures disclosed herein, it is not confined to the details setforth and this application is intended to cover such modifications or changes as may come within the purposes ofthe improvements orthe scope of the following claims.

Claims (10)

1. An X-ray collimator comprising: an X-raytransmitting portion having a plurality of through-holes; and a frame memberforsupporting said X-ray transmitting portion.
2. An X-ray collimator according to claim 1, wherein each of said through-holes has a circular cross-section.
3. An X-ray collimator according to claim 1, wherein each of said through-holes has a polygonal cross-section.
4. An X-ray exposure apparatus for exposing a sensitive layer on a wafer to a circuit pattern formed on a maskwith the use of an X-ray, comprising: means for generating the X-ray; means for holding the mask; means for holding the wafer; and X-ray collimating means disposed between said mask holding means and said X-ray generating means to collimate the X-ray, said X-ray collimating means including an X-ray transmitting portion having a plurality ofthrough-holes and a frame memberfor supporting said X-raytransmitting portion so that the X-ray generated by said X-ray generating portion is collimator to irradiate the mask.
5. An X-ray collimator comprising a member having an arrayofX-raytransmissive portions, each ofwhich isso shaped asto inhibitthe spreading of X-rays passing thereth rough in all directions trans- verse to the principal direction ofthe rays.
6. An X-ray collimator substantially as herein described with reference to Figs. 2 and 3 of the accompanying drawings.
7. An X-raycollimatorsubstantially as herein described with reference to Fig. 4a of the accompanying drawings.
8. An X-ray collimator substantially as herein described with reference to Fig. 4b of the accompanying drawings.
9. An X-ray collimator substantially as herein described with reference to Fig. 4c of the accompanying drawings.
10. Exposure apparatus substantially as herein described with reference to Fig. 5 ofthe accompanying drawings.
GB08419439A 1983-08-06 1984-07-31 X-ray collimator Withdrawn GB2148680A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58144126A JPS6034018A (en) 1983-08-06 1983-08-06 X-ray collimator and exposing apparatus

Publications (2)

Publication Number Publication Date
GB8419439D0 GB8419439D0 (en) 1984-09-05
GB2148680A true GB2148680A (en) 1985-05-30

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Family Applications (1)

Application Number Title Priority Date Filing Date
GB08419439A Withdrawn GB2148680A (en) 1983-08-06 1984-07-31 X-ray collimator

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JP (1) JPS6034018A (en)
DE (1) DE3428717A1 (en)
GB (1) GB2148680A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5016267A (en) * 1986-08-15 1991-05-14 Commonwealth Scientific And Industrial Research Instrumentation for conditioning X-ray or neutron beams
EP1045398A3 (en) * 1999-04-12 2003-12-17 General Electric Company Radiation imager collimator
WO2005027143A2 (en) * 2003-09-12 2005-03-24 Philips Intellectual Property & Standards Gmbh Arrangement for collimating electromagnetic radiation

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3711164A1 (en) * 1987-04-02 1988-10-20 Zeiss Carl Fa PLUG-ELEMENT DEVICE FOR HOLDING COMPONENTS IN STACKS
US5528659A (en) * 1994-04-25 1996-06-18 Gray*Star, Inc. Radiation flux polarizer or distributor
DE19947537A1 (en) * 1999-10-02 2001-04-05 Philips Corp Intellectual Pty X-ray absorption grating
DE102008030893A1 (en) * 2008-06-30 2009-12-24 Siemens Aktiengesellschaft Stray radiation collimator for use in radiation detector, has group of absorber elements arranged in collimation direction and another group of another absorber elements arranged in another collimation direction

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1160609A (en) * 1966-11-14 1969-08-06 Picker Corp Multi-Passage Collimators
GB1218096A (en) * 1967-05-09 1971-01-06 Tokyo Shibaura Electric Co Honeycomb block used for collimation of radiations and method of manufacturing the same
GB1236163A (en) * 1968-04-01 1971-06-23 Nuclear Chicago Corp Radiation detector devices
GB1274213A (en) * 1968-06-05 1972-05-17 Coal Industry Patents Ltd Improvements in and relating to density-measuring apparatus
GB1343339A (en) * 1970-07-07 1974-01-10 Nuclear Chicago Corp Radiation collimators
GB1363246A (en) * 1970-10-12 1974-08-14 Nuclear Chicago Corp Scintillation cameras
GB1387895A (en) * 1971-11-23 1975-03-19 Larsson G A B Scintillation camera with improved resolution
GB1436871A (en) * 1972-05-08 1976-05-26 Albert R D Spectrometry
GB1478573A (en) * 1974-06-11 1977-07-06 Medical Data Systems Corp Tomographic gamma ray imaging devices
GB1489652A (en) * 1974-01-10 1977-10-26 Radiologie Cie Gle Hybrid scintillation scanning apparatus
GB1536497A (en) * 1975-03-17 1978-12-20 Galileo Electro Optics Corp X and gamma radiation collimator and method of manufacturing such collimator
GB1578883A (en) * 1976-02-09 1980-11-12 Univ Ohio State Gamma camera
WO1982000897A1 (en) * 1980-09-10 1982-03-18 A Larsson Multitube collimator for instance scintillation cameras

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1160609A (en) * 1966-11-14 1969-08-06 Picker Corp Multi-Passage Collimators
GB1218096A (en) * 1967-05-09 1971-01-06 Tokyo Shibaura Electric Co Honeycomb block used for collimation of radiations and method of manufacturing the same
GB1236163A (en) * 1968-04-01 1971-06-23 Nuclear Chicago Corp Radiation detector devices
GB1274213A (en) * 1968-06-05 1972-05-17 Coal Industry Patents Ltd Improvements in and relating to density-measuring apparatus
GB1343339A (en) * 1970-07-07 1974-01-10 Nuclear Chicago Corp Radiation collimators
GB1363246A (en) * 1970-10-12 1974-08-14 Nuclear Chicago Corp Scintillation cameras
GB1387895A (en) * 1971-11-23 1975-03-19 Larsson G A B Scintillation camera with improved resolution
GB1436871A (en) * 1972-05-08 1976-05-26 Albert R D Spectrometry
GB1489652A (en) * 1974-01-10 1977-10-26 Radiologie Cie Gle Hybrid scintillation scanning apparatus
GB1478573A (en) * 1974-06-11 1977-07-06 Medical Data Systems Corp Tomographic gamma ray imaging devices
GB1536497A (en) * 1975-03-17 1978-12-20 Galileo Electro Optics Corp X and gamma radiation collimator and method of manufacturing such collimator
GB1578883A (en) * 1976-02-09 1980-11-12 Univ Ohio State Gamma camera
WO1982000897A1 (en) * 1980-09-10 1982-03-18 A Larsson Multitube collimator for instance scintillation cameras

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5016267A (en) * 1986-08-15 1991-05-14 Commonwealth Scientific And Industrial Research Instrumentation for conditioning X-ray or neutron beams
EP1045398A3 (en) * 1999-04-12 2003-12-17 General Electric Company Radiation imager collimator
WO2005027143A2 (en) * 2003-09-12 2005-03-24 Philips Intellectual Property & Standards Gmbh Arrangement for collimating electromagnetic radiation
WO2005027143A3 (en) * 2003-09-12 2005-05-26 Philips Intellectual Property Arrangement for collimating electromagnetic radiation
US7356125B2 (en) 2003-09-12 2008-04-08 Koninklijke Philips Electronics N.V. Arrangement for collimating electromagnetic radiation

Also Published As

Publication number Publication date
JPS6034018A (en) 1985-02-21
GB8419439D0 (en) 1984-09-05
DE3428717A1 (en) 1985-02-14

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