GB8419439D0 - X-ray collimator and exposure - Google Patents

X-ray collimator and exposure

Info

Publication number
GB8419439D0
GB8419439D0 GB848419439A GB8419439A GB8419439D0 GB 8419439 D0 GB8419439 D0 GB 8419439D0 GB 848419439 A GB848419439 A GB 848419439A GB 8419439 A GB8419439 A GB 8419439A GB 8419439 D0 GB8419439 D0 GB 8419439D0
Authority
GB
United Kingdom
Prior art keywords
exposure
ray collimator
collimator
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB848419439A
Other versions
GB2148680A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB8419439D0 publication Critical patent/GB8419439D0/en
Publication of GB2148680A publication Critical patent/GB2148680A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
GB08419439A 1983-08-06 1984-07-31 X-ray collimator Withdrawn GB2148680A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58144126A JPS6034018A (en) 1983-08-06 1983-08-06 X-ray collimator and exposing apparatus

Publications (2)

Publication Number Publication Date
GB8419439D0 true GB8419439D0 (en) 1984-09-05
GB2148680A GB2148680A (en) 1985-05-30

Family

ID=15354800

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08419439A Withdrawn GB2148680A (en) 1983-08-06 1984-07-31 X-ray collimator

Country Status (3)

Country Link
JP (1) JPS6034018A (en)
DE (1) DE3428717A1 (en)
GB (1) GB2148680A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02501338A (en) * 1986-08-15 1990-05-10 コモンウェルス　サイエンティフィック　アンド　インダストリアル　リサーチ　オーガナイゼイション Instrumentation for X-ray or neutron beam adjustment
DE3711164A1 (en) * 1987-04-02 1988-10-20 Zeiss Carl Fa PLUG-ELEMENT DEVICE FOR HOLDING COMPONENTS IN STACKS
US5528659A (en) * 1994-04-25 1996-06-18 Gray*Star, Inc. Radiation flux polarizer or distributor
US6175615B1 (en) * 1999-04-12 2001-01-16 General Electric Company Radiation imager collimator
DE19947537A1 (en) * 1999-10-02 2001-04-05 Philips Corp Intellectual Pty X-ray absorption grating
EP1680789B1 (en) * 2003-09-12 2011-11-16 Philips Intellectual Property & Standards GmbH Arrangement for collimating electromagnetic radiation
DE102008030893A1 (en) * 2008-06-30 2009-12-24 Siemens Aktiengesellschaft Stray radiation collimator for use in radiation detector, has group of absorber elements arranged in collimation direction and another group of another absorber elements arranged in another collimation direction

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3543384A (en) * 1966-11-14 1970-12-01 Picker Corp Methods of collimator fabrication
GB1218096A (en) * 1967-05-09 1971-01-06 Tokyo Shibaura Electric Co Honeycomb block used for collimation of radiations and method of manufacturing the same
FR2005268B1 (en) * 1968-04-01 1973-04-06 Nuclear Chicago Corp
GB1274213A (en) * 1968-06-05 1972-05-17 Coal Industry Patents Ltd Improvements in and relating to density-measuring apparatus
GB1343339A (en) * 1970-07-07 1974-01-10 Nuclear Chicago Corp Radiation collimators
US3732419A (en) * 1970-10-12 1973-05-08 Nuclear Chicago Corp Scintillation camera with improved resolution
SE361948B (en) * 1971-11-23 1973-11-19 G Larsson
US3925660A (en) * 1972-05-08 1975-12-09 Richard D Albert Selectable wavelength X-ray source, spectrometer and assay method
FR2323158A1 (en) * 1974-01-10 1977-04-01 Radiologie Cie Gle HYBRID SCAN SCINTIGRAPHY UNIT
GB1478573A (en) * 1974-06-11 1977-07-06 Medical Data Systems Corp Tomographic gamma ray imaging devices
GB1536497A (en) * 1975-03-17 1978-12-20 Galileo Electro Optics Corp X and gamma radiation collimator and method of manufacturing such collimator
GB1578881A (en) * 1976-02-09 1980-11-12 Univ Ohio State Gamma camera system
SE423458B (en) * 1980-09-10 1982-05-03 Agne Larsson DEVICE OF A CAMERA INCLUDING A DIFFERENT COLLIMATOR

Also Published As

Publication number Publication date
DE3428717A1 (en) 1985-02-14
GB2148680A (en) 1985-05-30
JPS6034018A (en) 1985-02-21

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)