GB2120232A - Glass composition - Google Patents

Glass composition Download PDF

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Publication number
GB2120232A
GB2120232A GB08313476A GB8313476A GB2120232A GB 2120232 A GB2120232 A GB 2120232A GB 08313476 A GB08313476 A GB 08313476A GB 8313476 A GB8313476 A GB 8313476A GB 2120232 A GB2120232 A GB 2120232A
Authority
GB
United Kingdom
Prior art keywords
mol
glass
sio2
glass composition
alkali
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB08313476A
Other versions
GB8313476D0 (en
Inventor
Thomas Joseph Loretz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Netoptix Inc
Original Assignee
Corning Netoptix Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Netoptix Inc filed Critical Corning Netoptix Inc
Publication of GB8313476D0 publication Critical patent/GB8313476D0/en
Publication of GB2120232A publication Critical patent/GB2120232A/en
Withdrawn legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/102Glass compositions containing silica with 40% to 90% silica, by weight containing lead
    • C03C3/105Glass compositions containing silica with 40% to 90% silica, by weight containing lead containing aluminium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/07Glass compositions containing silica with less than 40% silica by weight containing lead
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/102Glass compositions containing silica with 40% to 90% silica, by weight containing lead
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02Main electrodes
    • H01J1/32Secondary-electron-emitting electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J43/00Secondary-emission tubes; Electron-multiplier tubes
    • H01J43/04Electron multipliers
    • H01J43/06Electrode arrangements
    • H01J43/18Electrode arrangements using essentially more than one dynode
    • H01J43/24Dynodes having potential gradient along their surfaces
    • H01J43/246Microchannel plates [MCP]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)

Abstract

Glass useful in manufacturing microchannel plates has 63-72 mol % S02, 20-30 mol % PbO, 3-7 mol % alkali oxide components, 1-3.5 mol % alkaline earth oxide components and less than 1 mol% As2O3, Bi2O3, and Al2O3.

Description

SPECIFICATION Glass composition The invention relates to a glass composition suitable for use in manufacturing microchannel plates.
Alkali-lead-silicate glasses have often been used in the manufacture of microchannel plates, in which the current of electrons entering each of a plurality of parallel microchannels is multiplied, a plurality of electrons being emitted ("secondary emission") from a glass channel-defining wall for each electron that strikes it.
It has been discovered that microchannel plates manufactured from glasses having 63-72 mol % SiO2, 20-30 mol % PbO, 3-7 mol % alkali oxide components, 1-3.5 mol % alkaline earth oxide components and less than 1 mol % As203, Bi203, and Al203 have desirable secondary emission properties and gain stability.
Preferably the glass has more than 65 mol % SiO2, and has more K, Rb, and Cs alkali components than Li or Na components, to permit greater working temperatures. Preferably the glass transition temperature, Tg, of the glass is greater than 450"C, to provide thermal deformation resistance to the microchannel plates, and the sag temperature, Ts, above which material viscously deforms under its own weight) is more than 80"C greater than Tg to allow for process control flexibility in the manufacture of the microchannel plates.
In a preferred embodiment of glass particularly useful in microchannel plates in medical gamma ray cameras, there are low concentrations of alkali elements with substantial radioactive isotope content (e.g.
potassium oxide, which contains 19K40, and rubidium oxide, which contains 37Rb87), which would otherwise cause background noise, resulting in loss of image resolution and contrast.
The structure, composition and manufacture of a preferred embodiment of the invention will now be described, by way of example, with reference to the drawing, which is a diagrammatic vertical sectional view of a microchannel plate of glass according to the invention.
Microchannel plate 10 has plurality of parallel microchannels 12 formed by tubular channel defining walls 14 of glass having the composition described below.
The composition of the preferred embodiment of the invention is presented in the column under "Glass 6" in the following table.
GLASS COMPOSITION AND PROPERTIES Glass 7 Glass 2 Glass 3 Glass 4 Glass 5 Glass 6 Composition (dol Percent of Oxide) SiO2 68.00 69.90 64.40 69.00 71.2 65.72 PbO 24.00 21.15 28.06 23.18 21.55 27.91 Alkali Li2O 1.60 - - - 0.20 Na2O 2.80 - - - 0.45 K2O - - - 5.24 3.35 Rb2O - 1.38 2.20 1.10 1.20 2.12 Cs2O 0.30 4.77 2.05 0.18 - 0.97 Alkaline Earth SrO 3.00 - - - 1.63 BaO - 2.40 3.00 1.14 0.30 2.96 As203 0.06 0.09 0.07 0.13 0.08 0.10 Bi203 0.04 0.05 - 0.03 0.04 Al203 0.30 0.26 0.22 - - 0.22 Physical Properties Glass Transition (Tg,"C) 452 523 472 455 489 474 Glass Sag Point (Ts, 'C) 533 608 560 546 575 566 Index of Refraction (nd) 1.672 1.642 1.694 1.654 1.640 1.696 Thermal expansion coeff.
(a x 107/"C, 20-300"C) 80 76 84 86 82 77 The glass composition is prepared from appropriate raw materials in proportions to supply to specific amounts of listed compounds by standard melting practices in ceramic lined crucibles in a melting atmosphere rich in oxygen. Although the formulas are given in the table in the oxide mol percent, as is recognised in the art of glass science, carbonates, nitrates, sulphates, or halides are acceptable raw materials.
Glass tubing is prepared from the glass composition by extrusion, as is well known in the art. Glass 6 has a glass transition temperature, Tg, greater than 450"C, and a sag temperature, Ts, more than 80"C greater than Tg to provide process control flexibility, without a large risk of thermal deformation, during the manufacture of microchannel plates at high temperatures and pressure. High working temperatures are made possible by the large proportion of SiO2 and the absence of low atomic number alkali components, i.e., Li and Na.
In addition to the preferred glass composition identified as Glass 6 in the above tables, the compositions identified as Glasses 1-5 in the table and glasses having 63-72 mol % SiO2, 20-30 mol% PbO, 3-7 mol % alkali oxide components, 1-3.5 mol % alkaline earth oxide components and less than 1 mol % As203, By203, and Al203 are in accordance with the present invention. Preferably the glass has more than 65 mol % SiO2, and has more K, Rb, and Cs alkali components than Li or Na components, to permit greater working temperatures.
When the glass is to be used in microchannel plates in medical gamma ray cameras, it is desirable that the glass have low concentrations of alkali elements with substantial radioactive isotope content (e.g., potassium oxide, which contains 19K40 and rubidium oxide, which contains 37Rb87). This is because gamma ray cameras typically have exposure times of 5 to 10 minutes, and intrinsic noise from the microchannel plate detector results in loss of image resolution and contrast. Glass 1 is an example of an ultra-low noise glass having no detectable potassium oxide or rubidium oxide, and glasses 2,3 and 6 are low noise versions having small amounts of rubidium oxide and no detectable potassium oxide.

Claims (12)

1. A glass composition comprising 63-72 moi % SiO2, 20-30 mol % PbO, 3-7 mol % alkali oxide components, and 1-3.5 mol % alkaline earth oxide components, wherein said glass composition has less than 1 mol % AS203, By203, and Al203.
2. A glass composition as claimed in claim 1 wherein said glass has a glass transition temperature greater than 450"C and a sag temperature of more than 80"C greater than the glass transition temperature.
3. A glass composition as claimed in claim 1 or 2 wherein there are low concentrations of alkali elements with substantial radioactive isotope content to reduce background noise.
4. A glass composition as claimed in any one of the preceding claims wherein said glass has more than 65 mol percent SiO2, and the sum, in mol %, of the K, Rb, and Cs alkali components is greater than the sum of the Li and Na alkali components.
5. A glass composition as claimed in any one of the preceding claims wherein said glass has 65.72 mol % SiO2, 2.12 mol % Rb2O and 0.97% Cs2O.
6. A glass composition as claimed in any one of claims 1 to 3 wherein said glass comprises 68.00 mol % SiO2, 1.60 mol % Li2O, 2.80 mol % Na2O, and 0.30 mol % Cs2O, and has no detectable K or Rb.
7. A glass composition as claimed in any one of claims 1 to 4 comprises 69.90 mol % SiO2, 1.38 mol % Rb2O, and 4.77 mol % Cs2O.
8. A glass composition as claimed in any one of claims 1 to 3 wherein said glass comprises 64.40 mol % SiO2, 2.20 mol % Rb2O, and 2.05 mol percent Cs2O.
9. A glass composition as claimed in any one of claims 1 to 4 wherein said glass comprises 69.00 mol % SiO2, 5.24 mol % K2O, 1.10 mol % Rb2O, and 0.18 mol % Cs2O.
10. A glass composition as claimed in any one of claims 1 to 4wherein said glass comprises 71.2 mol % SiO2, 0.20 mol % Li2O, 0.45 mol % Na2O, 3.35 mol % K2O, and 1.20 mol % Rb2O.
11. A microchannel plate made from glass comprising 63-72 mol % SiO2, 20-30 mol % PbO, 3-7 mol % alkali oxide components, and 1-3.5 mol % alkaline earth oxide components, wherein said glass has less than 1 mol % As203, By203, and Al203.
12. A plate as claimed in claim 11 wherein there are low concentrations of alkali elements with substantial radioactive isotope content to reduce background noise.
GB08313476A 1982-05-17 1983-05-16 Glass composition Withdrawn GB2120232A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37862182A 1982-05-17 1982-05-17

Publications (2)

Publication Number Publication Date
GB8313476D0 GB8313476D0 (en) 1983-06-22
GB2120232A true GB2120232A (en) 1983-11-30

Family

ID=23493863

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08313476A Withdrawn GB2120232A (en) 1982-05-17 1983-05-16 Glass composition

Country Status (4)

Country Link
JP (1) JPS58208151A (en)
DE (1) DE3317778A1 (en)
FR (1) FR2526784A1 (en)
GB (1) GB2120232A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4983551A (en) * 1988-08-13 1991-01-08 Galileo Electro-Optics Corp. Channel electron multipliers
EP1306880A1 (en) * 2000-06-08 2003-05-02 Hamamatsu Photonics K.K. Micro-channel plate
US8878128B2 (en) 2012-05-18 2014-11-04 Hamamatsu Photonics K.K. Microchannel plate
US9117640B2 (en) 2012-05-18 2015-08-25 Hamamatsu Photonics K.K. Microchannel plate having a main body, image intensifier, ion detector, and inspection device

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4714861A (en) * 1986-10-01 1987-12-22 Galileo Electro-Optics Corp. Higher frequency microchannel plate
DE3909526A1 (en) * 1988-03-24 1989-10-05 Galileo Electro Optics Corp CHANNEL electron multiplier
US5034354A (en) * 1990-05-16 1991-07-23 Corning Incorporated Alkali-free multichannel plate and glass
IT1252811B (en) * 1991-10-11 1995-06-28 Proel Tecnologie Spa ION GENERATOR WITH IONIZATION CHAMBER BUILT OR COATED WITH HIGH SECONDARY EMISSION COEFFICIENT MATERIAL
DE19922678C2 (en) * 1999-05-18 2001-06-21 Perkinelmer Optoelectronics Lead silicate glass and its use
AU2021431376B2 (en) * 2021-03-03 2023-11-30 China Building Materials Academy Ion-bombardment-resistant glass composition, microchannel plate cladding glass, microchannel plate and preparation method
CN114180830B (en) * 2021-11-23 2024-01-16 中国建筑材料科学研究总院有限公司 Coated glass, preparation method thereof, method for preparing microchannel plate by using coated glass and microchannel plate

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB597023A (en) * 1944-10-11 1948-01-15 Corning Glass Works Glass having low power factor
GB669259A (en) * 1949-09-16 1952-04-02 Corning Glass Works Ophthalmic glass
GB893651A (en) * 1959-08-17 1962-04-11 Pittsburgh Plate Glass Co Method of forming lens blanks
GB1318075A (en) * 1969-08-15 1973-05-23 Nippon Telegraph & Telephone Glass medium for ultrasonic delay lines
GB1485898A (en) * 1974-12-18 1977-09-14 Hoya Glass Works Ltd Glass for an ultrasonic delay line
GB1544593A (en) * 1976-09-21 1979-04-19 Asahi Glass Co Ltd Solid ultrasonic delay lines

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB597023A (en) * 1944-10-11 1948-01-15 Corning Glass Works Glass having low power factor
GB669259A (en) * 1949-09-16 1952-04-02 Corning Glass Works Ophthalmic glass
GB893651A (en) * 1959-08-17 1962-04-11 Pittsburgh Plate Glass Co Method of forming lens blanks
GB1318075A (en) * 1969-08-15 1973-05-23 Nippon Telegraph & Telephone Glass medium for ultrasonic delay lines
GB1485898A (en) * 1974-12-18 1977-09-14 Hoya Glass Works Ltd Glass for an ultrasonic delay line
GB1544593A (en) * 1976-09-21 1979-04-19 Asahi Glass Co Ltd Solid ultrasonic delay lines

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4983551A (en) * 1988-08-13 1991-01-08 Galileo Electro-Optics Corp. Channel electron multipliers
EP1306880A1 (en) * 2000-06-08 2003-05-02 Hamamatsu Photonics K.K. Micro-channel plate
EP1306880A4 (en) * 2000-06-08 2005-04-13 Hamamatsu Photonics Kk Micro-channel plate
US8878128B2 (en) 2012-05-18 2014-11-04 Hamamatsu Photonics K.K. Microchannel plate
US9117640B2 (en) 2012-05-18 2015-08-25 Hamamatsu Photonics K.K. Microchannel plate having a main body, image intensifier, ion detector, and inspection device

Also Published As

Publication number Publication date
GB8313476D0 (en) 1983-06-22
DE3317778A1 (en) 1983-11-17
FR2526784A1 (en) 1983-11-18
JPS58208151A (en) 1983-12-03

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WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)