JPS58208151A - Glass composition - Google Patents

Glass composition

Info

Publication number
JPS58208151A
JPS58208151A JP8650783A JP8650783A JPS58208151A JP S58208151 A JPS58208151 A JP S58208151A JP 8650783 A JP8650783 A JP 8650783A JP 8650783 A JP8650783 A JP 8650783A JP S58208151 A JPS58208151 A JP S58208151A
Authority
JP
Japan
Prior art keywords
mol
glass
rb2o
microchannel
alkaline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8650783A
Other languages
Japanese (ja)
Inventor
ト−マス・ジヨセフ・ロレツツ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Netoptix Inc
Original Assignee
Corning Netoptix Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Netoptix Inc filed Critical Corning Netoptix Inc
Publication of JPS58208151A publication Critical patent/JPS58208151A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/102Glass compositions containing silica with 40% to 90% silica, by weight containing lead
    • C03C3/105Glass compositions containing silica with 40% to 90% silica, by weight containing lead containing aluminium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/07Glass compositions containing silica with less than 40% silica by weight containing lead
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/102Glass compositions containing silica with 40% to 90% silica, by weight containing lead
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02Main electrodes
    • H01J1/32Secondary-electron-emitting electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J43/00Secondary-emission tubes; Electron-multiplier tubes
    • H01J43/04Electron multipliers
    • H01J43/06Electrode arrangements
    • H01J43/18Electrode arrangements using essentially more than one dynode
    • H01J43/24Dynodes having potential gradient along their surfaces
    • H01J43/246Microchannel plates [MCP]

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 この究明は、マイクロチャンネル・プレートの製造用シ
で適rるツノラスならひにこのカラスを用いたマイクロ
チャンネル・ル−1・に関1−イ、。
DETAILED DESCRIPTION OF THE INVENTION This study relates to a microchannel system using a horned crow, which is suitable for the production of microchannel plates.

アルカリ−鉛−ケイDh tA4ガラスはマイクロチャ
ンネル・プレートの製造にしばしば用いられてきた。マ
イクロチャンネル・プレートでは各々の・V−行マイク
ロチャンネルに入る電子の流れが倍+1.Q =4−る
。ずなj−)ちガラスチャンネルを形成する壁に重子が
1個当る毎に複数の電子が史に放出ずろ(”2次放出”
)。
Alkali-lead-silicon Dh tA4 glass has often been used in the manufacture of microchannel plates. In the microchannel plate, the flow of electrons into each V-row microchannel is doubled +1. Q = 4-ru. Each time a deuteron hits the wall forming the glass channel, multiple electrons are emitted ("secondary emission").
).

63−72モル%のSiO□、20−30モル%のRb
飢 ろ−7モル%のアルカリ酸化物成分および1モル%
未満り) As□O,、Bi□O1,to 、J:びA
g2O,。
63-72 mol% SiO□, 20-30 mol% Rb
Starvation - 7 mol% alkali oxide component and 1 mol%
(less than) As□O,, Bi□O1,to, J: BiA
g2O,.

をイ4する7ノラスから製W gれたマイクロチャンネ
ル・プレートは1す「1沼の2θ、:放出特性を有しか
つ安定性を与えることが判明した。より高い作動温度な
り能にするため1(は好ましくはこのガラスは5102
が65モル%以上で、がっLtfたはNa成分よりも多
いアルカリ成分に、 RbおよびCsを有する。マイク
ロチャンネル・プレートシミ熱変形り(抗を与えるため
に好ましくはこのガラスのガラス転移温度Tgは450
 ’Cより高く、かつマイクロチャンネル・プレートの
、製造しこおける工程別画【2〕柔軟性を考慮するため
垂下温度Ts  (これμ上の温度で利料はそれ自身の
重量で粘性をもって変形する) (−11Tg よりも
80℃μ上高い。
A microchannel plate made from Noras was found to have 2-theta emission characteristics of 1:1 and provide stability.To enable higher operating temperatures. 1 (preferably this glass is 5102
is 65 mol% or more, and has Rb and Cs in the alkaline component which is larger than the Ltf or Na component. The glass transition temperature Tg of this glass is preferably 450 to provide resistance to microchannel plate staining and thermal deformation.
In order to take flexibility into consideration, the temperature Ts (at a temperature above this μ, the material deforms viscously under its own weight) ) (80℃μ higher than -11Tg.

医療用//ンマ線カメラにおけるマイクロチャンネル・
プレートに特11ζ有用であるガラスの好適具体例では
、実H(1的な量の放射性同位体(例えば、19に40
を含む酸化カリ、およびa 7Rb  を含す酸化ルビ
ジウム)を有する低濃度のアルカリ元素が存在する。も
しそうでなければパックグラウンド゛ノイズの原因とな
り画像の解像度やコントラストの低下をもたらす。
Microchannel in medical//luma-ray camera
Preferred embodiments of glasses that are particularly useful in plates include real H (unitary amounts of radioactive isotopes (e.g.,
There are low concentrations of alkaline elements, including potassium oxide, which contains a 7Rb , and rubidium oxide, which contains a 7Rb . If this is not the case, it will cause background noise, resulting in a reduction in image resolution and contrast.

本発明【り好適時体例のtf4 i告、組J戊および製
造1.ζついて1ホベるが、その前に先ず簡単に本発明
によるガラスのマイクロチャンネル・フ“ルート的断面
図しζついて述ベイ、1。
The present invention is a preferred example of TF4 i, set and manufacturing 1. I will explain about ζ first, but before that, I will briefly explain the cross-sectional view of the microchannel flute of the glass according to the present invention.

構潴 マイクロチャンネル・7レート10はl゛,j ’ l
・い二記載される組りyをもつカ゛ラスの1介状のチャ
ンネルを′形1戎する壁14によって形成される多数の
.lk.?rZイクロチャンネル12を有する1。
Structure micro channel 7 rate 10 is l゛,j 'l
・A large number of walls 14 are formed by a wall 14 which cuts out a single channel of the glass having the set y described. lk. ? 1 with rZ microchannel 12.

組成 本発明の好適具体例の,1:目数はU下の表の゛カラス
6”の欄に示される,。
Composition In a preferred embodiment of the present invention, 1: The number of stitches is shown in the column "Crow 6" in the table below U.

製 造 ガラス:aU +戊11夕1はセラミック内張りるつぼ
中で酸素の多い溶融雰囲気において標準の溶融方法によ
って表に載せた化合物の・特定の量を供給する^(1合
で適当な原料から調製される。この処方は表(では酸化
物モル%で与えられているが、ガラス部門の技術者には
認識されるように、炭酸塩、硝酸塩。
Manufacture Glass: aU + 戊11 1 is a method of supplying specific amounts of the compounds listed in the table by standard melting methods in an oxygen-enriched melting atmosphere in ceramic lined crucibles (prepared from suitable raw materials in 1 cup). This formulation is given in the table (in mole percent oxides, but as glass department technicians will recognize, carbonates, nitrates).

硫T′!#塩またはハロゲン化物は許容できる原料てル
)る。
Sulfur T'! #Salts or halides are acceptable raw materials.

ガラス管は当業者には周知の如く、押出しくでよってガ
ラス組成物から製造される。ガラス61′j、高温高圧
でマイクロチャンネル・プレートの製造の間熱変形の大
きな危険なしに工程制御の柔軟性を与えるため450℃
より高いガラス転移温1iTg :t6よび’r 、よ
りも80℃以上高い垂下温1扶TsをC了する。高い作
動温度が8102の割合が大きいことおよび低原子番号
のアルカリ成分すなわちLiおよびNaが無いことによ
って可能となる。
Glass tubes are manufactured from glass compositions by extrusion, as is well known to those skilled in the art. Glass 61'j, at high temperatures and pressures of 450°C to give flexibility in process control without significant risk of thermal distortion during the manufacture of microchannel plates.
Higher glass transition temperature 1iTg: A drooping temperature 1fuTs that is 80°C or more higher than t6 and 'r. High operating temperatures are possible due to the large proportion of 8102 and the absence of low atomic number alkaline components, namely Li and Na.

他の具体例 上記の表にガラス6として標示された好適なガラス組成
物に加5るに、表中にガラス1〜5とし又標示され、か
つ63−72モル%のSj、02゜20−30モル%の
Pと・0.3−7モル%リアルカ1ノ酸化物成分、1−
65モル%のアルカリ土酸(ヒ物成分オ6よび1モル%
未膚のAr=203+ Bl□01.およびAg2O3
を有するカ゛ラスは本発明の−・部と考えられかつ少な
(ともいくつかの従属する′i−#’ Ij’F @^
求〕範囲の組囲内にルd17.好ましくはこの/Jシラ
ス、より高い作動温度な直答するために65モル%以上
の8102を有しかりLlまたけNa成分よりもアルカ
リ成分のに、 RjJおよびGsが多い、。
Other Specific Examples In addition to the preferred glass compositions labeled as Glass 6 in the table above, the preferred glass compositions are also labeled as Glasses 1-5 in the table and have 63-72 mole percent Sj, 02°20- 30 mol% P and 0.3-7 mol% real carbon oxide component, 1-
65 mol% alkaline earth acids (arsenic components 6 and 1 mol%)
Unskinned Ar=203+ Bl□01. and Ag2O3
The cursor having ``i-#'' is considered as part of the present invention and has some dependent `i-#'Ij'F @^
[required] within the range d17. Preferably, this /J shirasu has 65 mol % or more of 8102 and has more Rj and Gs in the alkaline component than the Na component across Ll, in order to obtain a higher operating temperature.

ガラスが医療用ガン7線カメラにおけるマイクロチャン
ネル・プレートに使用される場合、実質的な放射1生同
位体(例えば19K  を含む酸化カリ、および37 
Rb  を含む「り化ルビジウム)を含イー1するアル
カリ元素の濃度が低いことが望ましい1、このこ、とは
ガンマ線カメラは一等j山5ないし10分の露出」4間
があり、マイクロチャンネル・プレート・フイテククー
からのf+14−4’のノイズが映f象の角イ′象度お
よびコントラストの1氏下をもたらすからである。ガラ
ス1は検知しうる醇化カリまたは酸化ルビジウムが無い
超低ノイズガラスの1例である。ガラス2,3および6
は生着の酸化ルビジウムを有しおよび検知しうる酸化カ
リの無い低ノイズガラスである。
When the glass is used in the microchannel plate in a medical cancer 7-ray camera, it contains a substantial amount of emissive isotopes (e.g. potassium oxide containing 19K, and 37K).
It is desirable that the concentration of alkali elements including Rb (rubidium chloride) is low.1 This means that a gamma ray camera has a first-class peak exposure time of 5 to 10 minutes, and a microchannel. - This is because the noise of f+14-4' from the plate fittings results in a 1 degree reduction in the angle and contrast of the image. Glass 1 is an example of an ultra-low noise glass with no detectable potash or rubidium oxide. glass 2, 3 and 6
is a low noise glass with engrafted rubidium oxide and no detectable potassium oxide.

【図面の簡単な説明】[Brief explanation of the drawing]

1ffi aは本発明のガラスのマイクロチャンオル・
プレートの断面図である。 10:マイクロチャンネル・プレート 12:マイクロチャンネル 14:チャンネルを特徴する 特許出願人 ガリレオ・エレクトローオプチツクス・弓
−ボレーション (外4名) −〆10
1ffia is the glass microchannel of the present invention.
It is a sectional view of a plate. 10: Microchannel plate 12: Microchannel 14: Patent applicant featuring channels Galileo Electro-Optics Bow-Boration (4 others) - 〆10

Claims (1)

【特許請求の範囲】 (])663772モルのSiO3゜ 21]−30モル%のPb0 。 3−7 モル%のアルカリ酸化桝成分。 および 1−3.5モル%のアルカリ土酸化物成分からなる、マ
イクロチャンネル・プレートの製造に有用であるガラス
であって、該ガラスが1モル%未満のAs2O3,B1
□03.およびAl2O3を有することを特徴とするガ
ラス。 (2)該ガラスが450°Cより高いガラス転移温度お
よびガラス転移温度よりも80°C以上高い垂下温度を
有する、特許請求の範囲第(1)項に記載のガラス。 (3)実質的な量の放射性同位体を含有するアルカリ元
素の濃度がバックグラウン°ドノイズを低減するに足る
程度に低い、特許請求の範囲第(1)頂に記載のガラス
。 (4)該ガラスは65モル%以上のS z O2を有し
かつアルカリ成分に、Rb、およびCsの合計モル%が
アルカリ成分L1およびNaの合計モル%よりも多い、
特許請求の範囲、第(1)項に記載のガラス。 (5)該ガラスt・165.72モル%の8102.2
.12モル%のRb2Oおよび0,97モル%のC82
0を有する、特許請求の範囲第(3)または(4)項I
(記載のガラス。 (6)S亥ガラスは68.00モル%の5102,1.
60モ/l/%ノLi0. 2.80モ/”%のNa 
20および0.30モル%のOs Oから成り、かつ検
知し5るKまたはRbを有しない、特許請求の範1川第
(3)頃に記載のガラス。 (7)該ガラスt・ま69.90モル%の5102 +
 1.38モル%のRb2Oおよび477モル%のCS
 20から成る、特許請求の範囲第13)°または(4
)項て記・敗のガラス。 (8)該ガラスは6440モル%のSio2,2.20
モル%のRb2O,および2.05モル%のOS 20
から成る、!1名i′F請)l?の範囲・■(3)また
は(4)項に記載のツノラス、。 (9)該ガラスは6900モル%のSiO□、5.24
モル%のKO,1,10モル%のRb2Oおよび018
モル%のG S 20から成る、特許請求の範囲7Ai
l)または(4)項に記載のガラス・・ (10)  i’i亥ガラスは71,2モル%のSiO
□、0.20モル%(’) L102 +  o、 4
.5モル%のNa 20 、 365モル%のに20お
よび1.20モル%のRb2Oがら成る、和許請求の範
囲第(+1または(4)項VC記載のガラス。 (II)  63−72モル%の3102 +20−6
0モル%のPb0゜ 3−7 モル%のアルカリ酸化物成分、および 1−3.5モル%のアルカリ土酸化物成分からなるガラ
スからり(られるマイクロチャンネルプレートであって
、該ガラスが1モル%未満のΔ32Q 3. B 12
03 :kaよびAg2O3を、有することを特徴とす
るマイクロチャンネルプレート。 、1121  へ′d的な駄の放射1圭四〇”f体な含
イ1するアルカリ元素の濃度がパックブラウン1゛ノイ
ズを低減するに足る程度に低い、劇・1f、メト請求の
範囲第411+10((記載のプレート。
Claims: (]) 663,772 mol of SiO3°21] - 30 mol % of Pb0. 3-7 mol% alkaline oxidation chamber component. and 1-3.5 mol% alkaline earth oxide components, wherein the glass is useful in the manufacture of microchannel plates, the glass comprising less than 1 mol% As2O3,B1
□03. and Al2O3. (2) The glass of claim (1), wherein the glass has a glass transition temperature greater than 450°C and a droop temperature greater than 80°C above the glass transition temperature. (3) A glass according to claim 1, wherein the concentration of an alkali element containing a substantial amount of a radioactive isotope is low enough to reduce background noise. (4) the glass has 65 mol% or more of SzO2, and the total mol% of Rb and Cs in the alkaline components is greater than the total mol% of the alkaline components L1 and Na;
Glass according to claim (1). (5) The glass t・165.72 mol% of 8102.2
.. 12 mol% Rb2O and 0.97 mol% C82
Claim no. (3) or (4) I with 0
(Glass as described. (6) S-glass has 68.00 mol% of 5102,1.
60 mo/l/% Li0. 2.80 mo/”% Na
Glass according to claim 1, consisting of 20 and 0.30 mol % OsO and having no detectable K or Rb. (7) 69.90 mol% of the glass t・ma 5102 +
1.38 mol% Rb2O and 477 mol% CS
20)° or (4)
) Note: Glass of Defeat. (8) The glass has 6440 mol% Sio2,2.20
mol% Rb2O, and 2.05 mol% OS20
Consisting of! 1 person i'Frequest)l? The range of ■■Thornoras described in item (3) or (4). (9) The glass contains 6900 mol% SiO□, 5.24
mol% KO, 1,10 mol% Rb2O and 018
Claim 7Ai consisting of mole % G S 20
The glass described in item l) or (4)... (10) The i'i glass is 71.2 mol% SiO
□, 0.20 mol% (') L102 + o, 4
.. Glass according to claim 1 or (4) VC, comprising 5 mol% Na20, 365 mol% Na20 and 1.20 mol% Rb2O. (II) 63-72 mol% 3102 +20-6
A microchannel plate made of glass comprising 0 mol% of Pb0°3-7 mol% of an alkali oxide component and 1-3.5 mol% of an alkaline earth oxide component, Δ32Q less than % 3. B 12
03: A microchannel plate characterized by having ka and Ag2O3. , 1121, the concentration of alkali elements contained in the ``f body'' is low enough to reduce the Pack-Brown 1 noise, and the scope of claim No. 411+10 ((Plate described.
JP8650783A 1982-05-17 1983-05-17 Glass composition Pending JPS58208151A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37862182A 1982-05-17 1982-05-17
US378621 1982-05-17

Publications (1)

Publication Number Publication Date
JPS58208151A true JPS58208151A (en) 1983-12-03

Family

ID=23493863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8650783A Pending JPS58208151A (en) 1982-05-17 1983-05-17 Glass composition

Country Status (4)

Country Link
JP (1) JPS58208151A (en)
DE (1) DE3317778A1 (en)
FR (1) FR2526784A1 (en)
GB (1) GB2120232A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04228449A (en) * 1990-05-16 1992-08-18 Corning Inc Multichannel plate and glass
US8878128B2 (en) 2012-05-18 2014-11-04 Hamamatsu Photonics K.K. Microchannel plate
US9117640B2 (en) 2012-05-18 2015-08-25 Hamamatsu Photonics K.K. Microchannel plate having a main body, image intensifier, ion detector, and inspection device
WO2022183396A1 (en) * 2021-03-03 2022-09-09 中国建筑材料科学研究总院有限公司 Ion-bombardment-resistant glass composition, microchannel plate skin glass, microchannel plate and preparation method

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Publication number Priority date Publication date Assignee Title
US4714861A (en) * 1986-10-01 1987-12-22 Galileo Electro-Optics Corp. Higher frequency microchannel plate
DE3909526A1 (en) * 1988-03-24 1989-10-05 Galileo Electro Optics Corp CHANNEL electron multiplier
US4983551A (en) * 1988-08-13 1991-01-08 Galileo Electro-Optics Corp. Channel electron multipliers
IT1252811B (en) * 1991-10-11 1995-06-28 Proel Tecnologie Spa ION GENERATOR WITH IONIZATION CHAMBER BUILT OR COATED WITH HIGH SECONDARY EMISSION COEFFICIENT MATERIAL
DE19922678C2 (en) * 1999-05-18 2001-06-21 Perkinelmer Optoelectronics Lead silicate glass and its use
JP2001351509A (en) * 2000-06-08 2001-12-21 Hamamatsu Photonics Kk Micro-channel plate
CN114180830B (en) * 2021-11-23 2024-01-16 中国建筑材料科学研究总院有限公司 Coated glass, preparation method thereof, method for preparing microchannel plate by using coated glass and microchannel plate

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GB597023A (en) * 1944-10-11 1948-01-15 Corning Glass Works Glass having low power factor
BE496413A (en) * 1949-09-16 1950-10-16
GB893651A (en) * 1959-08-17 1962-04-11 Pittsburgh Plate Glass Co Method of forming lens blanks
FR2068888A5 (en) * 1969-08-15 1971-09-03 Nippon Telegraph & Telephone
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04228449A (en) * 1990-05-16 1992-08-18 Corning Inc Multichannel plate and glass
US8878128B2 (en) 2012-05-18 2014-11-04 Hamamatsu Photonics K.K. Microchannel plate
US9117640B2 (en) 2012-05-18 2015-08-25 Hamamatsu Photonics K.K. Microchannel plate having a main body, image intensifier, ion detector, and inspection device
WO2022183396A1 (en) * 2021-03-03 2022-09-09 中国建筑材料科学研究总院有限公司 Ion-bombardment-resistant glass composition, microchannel plate skin glass, microchannel plate and preparation method

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DE3317778A1 (en) 1983-11-17
FR2526784A1 (en) 1983-11-18
GB2120232A (en) 1983-11-30
GB8313476D0 (en) 1983-06-22

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