GB2046955B - Interferometrically controlled stage with precisely orthogonal axes of motion - Google Patents

Interferometrically controlled stage with precisely orthogonal axes of motion

Info

Publication number
GB2046955B
GB2046955B GB8005832A GB8005832A GB2046955B GB 2046955 B GB2046955 B GB 2046955B GB 8005832 A GB8005832 A GB 8005832A GB 8005832 A GB8005832 A GB 8005832A GB 2046955 B GB2046955 B GB 2046955B
Authority
GB
United Kingdom
Prior art keywords
motion
orthogonal axes
controlled stage
precisely orthogonal
interferometrically controlled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8005832A
Other languages
English (en)
Other versions
GB2046955A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Optimetrix Corp
Original Assignee
Optimetrix Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/038,667 external-priority patent/US4330752A/en
Application filed by Optimetrix Corp filed Critical Optimetrix Corp
Publication of GB2046955A publication Critical patent/GB2046955A/en
Application granted granted Critical
Publication of GB2046955B publication Critical patent/GB2046955B/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB8005832A 1979-02-27 1980-02-21 Interferometrically controlled stage with precisely orthogonal axes of motion Expired GB2046955B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US1571379A 1979-02-27 1979-02-27
US06/038,667 US4330752A (en) 1979-05-14 1979-05-14 Position control circuit

Publications (2)

Publication Number Publication Date
GB2046955A GB2046955A (en) 1980-11-19
GB2046955B true GB2046955B (en) 1983-03-16

Family

ID=26687714

Family Applications (2)

Application Number Title Priority Date Filing Date
GB8005832A Expired GB2046955B (en) 1979-02-27 1980-02-21 Interferometrically controlled stage with precisely orthogonal axes of motion
GB8122073A Expired GB2081048B (en) 1979-02-27 1980-02-21 Position control circuit

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB8122073A Expired GB2081048B (en) 1979-02-27 1980-02-21 Position control circuit

Country Status (3)

Country Link
DE (1) DE3006395A1 (de)
FR (2) FR2451064B1 (de)
GB (2) GB2046955B (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001308003A (ja) 2000-02-15 2001-11-02 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
CN111363673B (zh) * 2018-12-26 2021-09-28 深圳市真迈生物科技有限公司 定位方法、定位装置和测序系统

Also Published As

Publication number Publication date
FR2451065A1 (fr) 1980-10-03
FR2451064A1 (fr) 1980-10-03
GB2046955A (en) 1980-11-19
FR2451065B1 (fr) 1986-03-07
FR2451064B1 (fr) 1985-08-23
GB2081048A (en) 1982-02-10
GB2081048B (en) 1983-05-11
DE3006395A1 (de) 1980-09-11

Similar Documents

Publication Publication Date Title
GB2094656B (en) Oxide-whisker-covered structural member
GB2047882B (en) Determinationa of physical characteristics of surfaces
GB2058407B (en) Teaching-playback robot
JPS54122700A (en) Super hydrophobic zeolite y
YU41931B (en) Process for the manufacture of microprous hollow fibres
JPS569271A (en) Manufacture of carbonncarbon fiber conposite body
ZA807631B (en) Oligomrtization of oleffins
CS221975B2 (en) Method of preparation of the diesterdiamide
JPS55104469A (en) Selffwatch of solution
JPS5688845A (en) Body consisting of at least two part
JPS5679766A (en) Modifying agent of fiber or fiber structure
JPS55128497A (en) Structure of pen point
PT70994B (en) Process for the preparation of cephalosporinic antibiotics
GB2046955B (en) Interferometrically controlled stage with precisely orthogonal axes of motion
DE3061428D1 (en) Process for the preparation of alkyl chlorides
JPS5610473A (en) Structure of printingghammer
JPS5646707A (en) Manufacture of dyed yeneer
JPS55159038A (en) Highhwall structural body
DE3071396D1 (en) Process for the preparation of gamma-chloroaceto-acetyl chloride
GB2041479B (en) Preventing displacement of actuators
GB2043562B (en) Control surfaces of aircraft
IE800557L (en) Interferometrically controlled stage with precisely¹orthogonal axes of motion
JPS5626840A (en) Manufacture of halogenated benzoylfluoride
JPS569539A (en) Method of controlling movement of structural body
JPS55119851A (en) Structural member

Legal Events

Date Code Title Description
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee