FR2451064B1 - Platine commandee par interferometrie dont les axes de deplacement sont rigoureusement orthogonaux - Google Patents

Platine commandee par interferometrie dont les axes de deplacement sont rigoureusement orthogonaux

Info

Publication number
FR2451064B1
FR2451064B1 FR8004055A FR8004055A FR2451064B1 FR 2451064 B1 FR2451064 B1 FR 2451064B1 FR 8004055 A FR8004055 A FR 8004055A FR 8004055 A FR8004055 A FR 8004055A FR 2451064 B1 FR2451064 B1 FR 2451064B1
Authority
FR
France
Prior art keywords
interferometry
whose movement
movement axes
plate controlled
rigorously
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8004055A
Other languages
English (en)
Other versions
FR2451064A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Optimetrix Corp
Original Assignee
Optimetrix Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/038,667 external-priority patent/US4330752A/en
Application filed by Optimetrix Corp filed Critical Optimetrix Corp
Publication of FR2451064A1 publication Critical patent/FR2451064A1/fr
Application granted granted Critical
Publication of FR2451064B1 publication Critical patent/FR2451064B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
FR8004055A 1979-02-27 1980-02-25 Platine commandee par interferometrie dont les axes de deplacement sont rigoureusement orthogonaux Expired FR2451064B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US1571379A 1979-02-27 1979-02-27
US06/038,667 US4330752A (en) 1979-05-14 1979-05-14 Position control circuit

Publications (2)

Publication Number Publication Date
FR2451064A1 FR2451064A1 (fr) 1980-10-03
FR2451064B1 true FR2451064B1 (fr) 1985-08-23

Family

ID=26687714

Family Applications (2)

Application Number Title Priority Date Filing Date
FR8004055A Expired FR2451064B1 (fr) 1979-02-27 1980-02-25 Platine commandee par interferometrie dont les axes de deplacement sont rigoureusement orthogonaux
FR8013437A Expired FR2451065B1 (fr) 1979-02-27 1980-06-17 Circuit de commande de position, notamment pour platine interferometrique

Family Applications After (1)

Application Number Title Priority Date Filing Date
FR8013437A Expired FR2451065B1 (fr) 1979-02-27 1980-06-17 Circuit de commande de position, notamment pour platine interferometrique

Country Status (3)

Country Link
DE (1) DE3006395A1 (fr)
FR (2) FR2451064B1 (fr)
GB (2) GB2081048B (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001308003A (ja) 2000-02-15 2001-11-02 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
CN111363673B (zh) * 2018-12-26 2021-09-28 深圳市真迈生物科技有限公司 定位方法、定位装置和测序系统

Also Published As

Publication number Publication date
GB2046955B (en) 1983-03-16
DE3006395A1 (de) 1980-09-11
FR2451064A1 (fr) 1980-10-03
FR2451065B1 (fr) 1986-03-07
GB2081048A (en) 1982-02-10
GB2081048B (en) 1983-05-11
FR2451065A1 (fr) 1980-10-03
GB2046955A (en) 1980-11-19

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Legal Events

Date Code Title Description
TP Transmission of property
ST Notification of lapse