GB2045808A - Method of forming a secondary emissive coating on a dynode - Google Patents
Method of forming a secondary emissive coating on a dynode Download PDFInfo
- Publication number
- GB2045808A GB2045808A GB7911400A GB7911400A GB2045808A GB 2045808 A GB2045808 A GB 2045808A GB 7911400 A GB7911400 A GB 7911400A GB 7911400 A GB7911400 A GB 7911400A GB 2045808 A GB2045808 A GB 2045808A
- Authority
- GB
- United Kingdom
- Prior art keywords
- dynode
- aluminium
- dynodes
- magnesium
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
- C23C14/5853—Oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
- H01J9/125—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes of secondary emission electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/32—Secondary emission electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Electron Tubes For Measurement (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB7911400A GB2045808A (en) | 1979-04-02 | 1979-04-02 | Method of forming a secondary emissive coating on a dynode |
GB8008511A GB2048561B (en) | 1979-04-02 | 1980-03-13 | Method of forming a secondary emissive coating on a dynode |
DE19803011381 DE3011381A1 (de) | 1979-04-02 | 1980-03-25 | Verfahren zur bildung eines sekundaer emittierenden ueberzugs auf einer dynode |
IT21048/80A IT1130372B (it) | 1979-04-02 | 1980-03-28 | Metodo di formazione di un rivestimento ad emissione secondaria su un dinodo |
AU56958/80A AU5695880A (en) | 1979-04-02 | 1980-03-28 | Coating dynodes |
BE0/200058A BE882558A (fr) | 1979-04-02 | 1980-03-31 | Procede permettant de former un recouvrement a emission secondaire sur une dynode |
JP4056880A JPS55146854A (en) | 1979-04-02 | 1980-03-31 | Method of coating secondary electron emission of diode |
FR8007194A FR2453494A1 (fr) | 1979-04-02 | 1980-03-31 | Methode permettant de former un recouvrement a emission secondaire sur une dynode |
ES490108A ES490108A0 (es) | 1979-04-02 | 1980-03-31 | Metodo de formar un revestimiento emisor secundario sobre un anodo, junto con un multiplicador electronico correspondiente. |
SE8002445A SE8002445L (sv) | 1979-04-02 | 1980-03-31 | Forfarande for framstellning av ett sekunderemitterande skikt pa en dynod |
CA000349111A CA1163150A (en) | 1979-04-02 | 1980-04-02 | Method of forming a secondary emissive coating on a dynode |
US06/286,906 US4395437A (en) | 1979-04-02 | 1981-07-27 | Method of forming a secondary emissive coating on a dynode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB7911400A GB2045808A (en) | 1979-04-02 | 1979-04-02 | Method of forming a secondary emissive coating on a dynode |
Publications (1)
Publication Number | Publication Date |
---|---|
GB2045808A true GB2045808A (en) | 1980-11-05 |
Family
ID=10504270
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB7911400A Withdrawn GB2045808A (en) | 1979-04-02 | 1979-04-02 | Method of forming a secondary emissive coating on a dynode |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS55146854A (de) |
BE (1) | BE882558A (de) |
GB (1) | GB2045808A (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2167450A (en) * | 1984-10-02 | 1986-05-29 | Hamamatsu Photonics Kk | Secondary electron emission surface |
USD1021149S1 (en) * | 2021-07-14 | 2024-04-02 | Pavestone, LLC | Paver |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2549288B1 (fr) * | 1983-07-11 | 1985-10-25 | Hyperelec | Element multiplicateur d'electrons, dispositif multiplicateur d'electrons comportant cet element multiplicateur et application a un tube photomultiplicateur |
WO2002067287A1 (fr) * | 2001-02-23 | 2002-08-29 | Hamamatsu Photonics K. K. | Photomultiplicateur |
JP4917280B2 (ja) * | 2005-06-28 | 2012-04-18 | 浜松ホトニクス株式会社 | 電子増倍管 |
US7855493B2 (en) * | 2008-02-27 | 2010-12-21 | Arradiance, Inc. | Microchannel plate devices with multiple emissive layers |
-
1979
- 1979-04-02 GB GB7911400A patent/GB2045808A/en not_active Withdrawn
-
1980
- 1980-03-31 JP JP4056880A patent/JPS55146854A/ja active Granted
- 1980-03-31 BE BE0/200058A patent/BE882558A/fr unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2167450A (en) * | 1984-10-02 | 1986-05-29 | Hamamatsu Photonics Kk | Secondary electron emission surface |
USD1021149S1 (en) * | 2021-07-14 | 2024-04-02 | Pavestone, LLC | Paver |
Also Published As
Publication number | Publication date |
---|---|
JPS6241378B2 (de) | 1987-09-02 |
JPS55146854A (en) | 1980-11-15 |
BE882558A (fr) | 1980-09-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |