GB201916623D0 - Sputter deposition - Google Patents

Sputter deposition

Info

Publication number
GB201916623D0
GB201916623D0 GBGB1916623.0A GB201916623A GB201916623D0 GB 201916623 D0 GB201916623 D0 GB 201916623D0 GB 201916623 A GB201916623 A GB 201916623A GB 201916623 D0 GB201916623 D0 GB 201916623D0
Authority
GB
United Kingdom
Prior art keywords
sputter deposition
sputter
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
GBGB1916623.0A
Other versions
GB2588936A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dyson Technology Ltd
Original Assignee
Dyson Technology Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dyson Technology Ltd filed Critical Dyson Technology Ltd
Priority to GB1916623.0A priority Critical patent/GB2588936A/en
Publication of GB201916623D0 publication Critical patent/GB201916623D0/en
Priority to PCT/GB2020/052846 priority patent/WO2021094729A1/en
Publication of GB2588936A publication Critical patent/GB2588936A/en
Pending legal-status Critical Current

Links

GB1916623.0A 2019-11-15 2019-11-15 Sputter deposition Pending GB2588936A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB1916623.0A GB2588936A (en) 2019-11-15 2019-11-15 Sputter deposition
PCT/GB2020/052846 WO2021094729A1 (en) 2019-11-15 2020-11-10 Sputter deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1916623.0A GB2588936A (en) 2019-11-15 2019-11-15 Sputter deposition

Publications (2)

Publication Number Publication Date
GB201916623D0 true GB201916623D0 (en) 2020-01-01
GB2588936A GB2588936A (en) 2021-05-19

Family

ID=69063189

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1916623.0A Pending GB2588936A (en) 2019-11-15 2019-11-15 Sputter deposition

Country Status (2)

Country Link
GB (1) GB2588936A (en)
WO (1) WO2021094729A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210020484A1 (en) * 2019-07-15 2021-01-21 Applied Materials, Inc. Aperture design for uniformity control in selective physical vapor deposition

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4278528A (en) * 1979-10-09 1981-07-14 Coulter Systems Corporation Rectilinear sputtering apparatus and method
KR100795063B1 (en) * 2006-06-28 2008-01-17 한국전기연구원 Apparatus for deposition composition gradient multi - thin film and fabricating method
US20080011599A1 (en) * 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
JP2011225932A (en) * 2010-04-20 2011-11-10 Fuji Electric Co Ltd Sputtering film deposition system for pattern deposition
KR20120130518A (en) * 2011-05-23 2012-12-03 삼성디스플레이 주식회사 Separated target apparatus for sputtering and sputtering method using the same
JP2017533998A (en) * 2014-11-17 2017-11-16 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Masking apparatus with separation mask for coating and web coating equipment
KR20190132667A (en) * 2017-04-03 2019-11-28 가부시키가이샤 아루박 Film Forming Apparatus and Film Forming Method
JP7045177B2 (en) * 2017-12-12 2022-03-31 株式会社アルバック Spattering equipment

Also Published As

Publication number Publication date
GB2588936A (en) 2021-05-19
WO2021094729A1 (en) 2021-05-20

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