GB201607387D0 - Method for producing polishing liquid composition - Google Patents

Method for producing polishing liquid composition

Info

Publication number
GB201607387D0
GB201607387D0 GBGB1607387.6A GB201607387A GB201607387D0 GB 201607387 D0 GB201607387 D0 GB 201607387D0 GB 201607387 A GB201607387 A GB 201607387A GB 201607387 D0 GB201607387 D0 GB 201607387D0
Authority
GB
United Kingdom
Prior art keywords
liquid composition
polishing liquid
producing polishing
producing
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB1607387.6A
Other versions
GB2535070A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kao Corp
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kao Corp filed Critical Kao Corp
Publication of GB201607387D0 publication Critical patent/GB201607387D0/en
Publication of GB2535070A publication Critical patent/GB2535070A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1454Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463Aqueous liquid suspensions
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09GPOLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00Polishing compositions
    • C09G1/02Polishing compositions containing abrasives or grinding agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1409Abrasive particles per se

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Manufacturing & Machinery (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
GB1607387.6A 2013-10-24 2014-10-23 Method for producing polishing liquid composition Withdrawn GB2535070A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013220961 2013-10-24
PCT/JP2014/078272 WO2015060410A1 (en) 2013-10-24 2014-10-23 Method for producing polishing liquid composition

Publications (2)

Publication Number Publication Date
GB201607387D0 true GB201607387D0 (en) 2016-06-15
GB2535070A GB2535070A (en) 2016-08-10

Family

ID=52992997

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1607387.6A Withdrawn GB2535070A (en) 2013-10-24 2014-10-23 Method for producing polishing liquid composition

Country Status (5)

Country Link
JP (1) JP6425965B2 (en)
GB (1) GB2535070A (en)
MY (1) MY181224A (en)
TW (1) TWI639690B (en)
WO (1) WO2015060410A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7066480B2 (en) * 2018-03-29 2022-05-13 株式会社フジミインコーポレーテッド Abrasive grain dispersion liquid, polishing composition kit, and polishing method for magnetic disk substrates
KR102620964B1 (en) * 2021-07-08 2024-01-03 에스케이엔펄스 주식회사 Polishing composition for semiconductor process and manufacturing method for polished object

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003190780A (en) * 2001-12-25 2003-07-08 Asahi Kasei Corp Filter aid
JP5464834B2 (en) * 2008-10-14 2014-04-09 日揮触媒化成株式会社 Polishing silica sol, polishing composition, and method for producing polishing silica sol
MY160470A (en) * 2010-09-24 2017-03-15 Kao Corp Process for producing polishing liquid composition
JP5698989B2 (en) * 2011-01-07 2015-04-08 花王株式会社 Method for producing polishing composition
JP5833390B2 (en) * 2010-09-24 2015-12-16 花王株式会社 Method for producing polishing composition
JP5844135B2 (en) * 2010-12-24 2016-01-13 花王株式会社 Method for producing polishing composition
JP2012143950A (en) * 2011-01-12 2012-08-02 Seiji Migikawa Stand
JP6033077B2 (en) * 2012-12-27 2016-11-30 花王株式会社 Method for producing polishing composition

Also Published As

Publication number Publication date
WO2015060410A1 (en) 2015-04-30
TW201522597A (en) 2015-06-16
GB2535070A (en) 2016-08-10
MY181224A (en) 2020-12-21
JP6425965B2 (en) 2018-11-21
TWI639690B (en) 2018-11-01
JP2015108135A (en) 2015-06-11

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)