MY181224A - Method for producing polishing liquid composition - Google Patents

Method for producing polishing liquid composition

Info

Publication number
MY181224A
MY181224A MYPI2016701500A MYPI2016701500A MY181224A MY 181224 A MY181224 A MY 181224A MY PI2016701500 A MYPI2016701500 A MY PI2016701500A MY PI2016701500 A MYPI2016701500 A MY PI2016701500A MY 181224 A MY181224 A MY 181224A
Authority
MY
Malaysia
Prior art keywords
particle diameter
colloidal silica
filter aid
liquid composition
polishing liquid
Prior art date
Application number
MYPI2016701500A
Inventor
Sato Kanji
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kao Corp filed Critical Kao Corp
Publication of MY181224A publication Critical patent/MY181224A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Manufacturing & Machinery (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)

Abstract

A method for producing a polishing composition of the present invention includes a step of filtering a raw silica dispersion containing colloidal silica with a filter containing a filter aid. An average primary particle diameter of the colloidal silica as determined by titration is 1 nm to 50 nm, and the filter aid has a hydroxyl group density of 0.40 x 10-5 mol/m2 or more. A ratio of the average primary particle diameter of the colloidal silica as determined by titration to an average particle diameter of the filter aid as measured by a laser particle size distribution measuring device is preferably in a range from 1.20 x 10-3 to 4.20 x 10-3.
MYPI2016701500A 2013-10-24 2014-10-23 Method for producing polishing liquid composition MY181224A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013220961 2013-10-24

Publications (1)

Publication Number Publication Date
MY181224A true MY181224A (en) 2020-12-21

Family

ID=52992997

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2016701500A MY181224A (en) 2013-10-24 2014-10-23 Method for producing polishing liquid composition

Country Status (5)

Country Link
JP (1) JP6425965B2 (en)
GB (1) GB2535070A (en)
MY (1) MY181224A (en)
TW (1) TWI639690B (en)
WO (1) WO2015060410A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7066480B2 (en) * 2018-03-29 2022-05-13 株式会社フジミインコーポレーテッド Abrasive grain dispersion liquid, polishing composition kit, and polishing method for magnetic disk substrates

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003190780A (en) * 2001-12-25 2003-07-08 Asahi Kasei Corp Filter aid
JP5464834B2 (en) * 2008-10-14 2014-04-09 日揮触媒化成株式会社 Polishing silica sol, polishing composition, and method for producing polishing silica sol
JP5698989B2 (en) * 2011-01-07 2015-04-08 花王株式会社 Method for producing polishing composition
JP5833390B2 (en) * 2010-09-24 2015-12-16 花王株式会社 Method for producing polishing composition
MY160470A (en) * 2010-09-24 2017-03-15 Kao Corp Process for producing polishing liquid composition
JP5844135B2 (en) * 2010-12-24 2016-01-13 花王株式会社 Method for producing polishing composition
JP2012143950A (en) * 2011-01-12 2012-08-02 Seiji Migikawa Stand
JP6033077B2 (en) * 2012-12-27 2016-11-30 花王株式会社 Method for producing polishing composition

Also Published As

Publication number Publication date
TW201522597A (en) 2015-06-16
GB2535070A (en) 2016-08-10
JP2015108135A (en) 2015-06-11
TWI639690B (en) 2018-11-01
JP6425965B2 (en) 2018-11-21
WO2015060410A1 (en) 2015-04-30
GB201607387D0 (en) 2016-06-15

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