GB201304701D0 - Method and apparatus for control of a plasma for spectrometry - Google Patents

Method and apparatus for control of a plasma for spectrometry

Info

Publication number
GB201304701D0
GB201304701D0 GBGB1304701.4A GB201304701A GB201304701D0 GB 201304701 D0 GB201304701 D0 GB 201304701D0 GB 201304701 A GB201304701 A GB 201304701A GB 201304701 D0 GB201304701 D0 GB 201304701D0
Authority
GB
United Kingdom
Prior art keywords
spectrometry
plasma
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB1304701.4A
Other versions
GB2511840B (en
GB2511840A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thermo Electron Manufacturing Ltd
Original Assignee
Thermo Electron Manufacturing Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thermo Electron Manufacturing Ltd filed Critical Thermo Electron Manufacturing Ltd
Priority to GB1304701.4A priority Critical patent/GB2511840B/en
Publication of GB201304701D0 publication Critical patent/GB201304701D0/en
Priority to US14/074,824 priority patent/US8822948B1/en
Priority to PCT/EP2014/054966 priority patent/WO2014140179A1/en
Priority to CN201480007759.0A priority patent/CN105190830A/en
Priority to DE112014001431.1T priority patent/DE112014001431T5/en
Publication of GB2511840A publication Critical patent/GB2511840A/en
Application granted granted Critical
Publication of GB2511840B publication Critical patent/GB2511840B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/443—Emission spectrometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32972—Spectral analysis
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0012—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry
    • H05H1/0037—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry by spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/443—Emission spectrometry
    • G01J2003/4435—Measuring ratio of two lines, e.g. internal standard
GB1304701.4A 2013-03-15 2013-03-15 Method and apparatus for control of a plasma for spectrometry Active GB2511840B (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
GB1304701.4A GB2511840B (en) 2013-03-15 2013-03-15 Method and apparatus for control of a plasma for spectrometry
US14/074,824 US8822948B1 (en) 2013-03-15 2013-11-08 Method and apparatus for control of a plasma for spectrometry
PCT/EP2014/054966 WO2014140179A1 (en) 2013-03-15 2014-03-13 Method and apparatus for control of a plasma for spectrometry
CN201480007759.0A CN105190830A (en) 2013-03-15 2014-03-13 Method and apparatus for control of a plasma for spectrometry
DE112014001431.1T DE112014001431T5 (en) 2013-03-15 2014-03-13 Method and apparatus for controlling a plasma for spectrometry

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1304701.4A GB2511840B (en) 2013-03-15 2013-03-15 Method and apparatus for control of a plasma for spectrometry

Publications (3)

Publication Number Publication Date
GB201304701D0 true GB201304701D0 (en) 2013-05-01
GB2511840A GB2511840A (en) 2014-09-17
GB2511840B GB2511840B (en) 2017-07-05

Family

ID=48226406

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1304701.4A Active GB2511840B (en) 2013-03-15 2013-03-15 Method and apparatus for control of a plasma for spectrometry

Country Status (5)

Country Link
US (1) US8822948B1 (en)
CN (1) CN105190830A (en)
DE (1) DE112014001431T5 (en)
GB (1) GB2511840B (en)
WO (1) WO2014140179A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5680008B2 (en) * 2012-03-08 2015-03-04 株式会社東芝 Ion source, heavy particle beam irradiation apparatus, ion source driving method, and heavy particle beam irradiation method
US10121708B2 (en) * 2015-11-17 2018-11-06 Lam Research Corporation Systems and methods for detection of plasma instability by optical diagnosis
GB2544484B (en) 2015-11-17 2019-01-30 Thermo Fisher Scient Bremen Gmbh Addition of reactive species to ICP source in a mass spectrometer
US10212798B2 (en) * 2017-01-30 2019-02-19 Sina Alavi Torch for inductively coupled plasma
JP6823555B2 (en) * 2017-07-05 2021-02-03 アークレイ株式会社 Plasma spectroscopic analysis method
CN109207948A (en) * 2018-09-30 2019-01-15 大连理工大学 A method of for reaction magnetocontrol sputtering Detection of Stability and control
KR20210117348A (en) * 2019-02-13 2021-09-28 램 리써치 코포레이션 Detection and Mitigation of ANOMALOUS PLASMA EVENTs in Semiconductor Processing
CN113906828A (en) * 2019-04-01 2022-01-07 珀金埃尔默健康科学加拿大股份有限公司 Apparatus and method for improving background normality of elemental morphology
JP7378991B2 (en) * 2019-07-12 2023-11-14 キヤノン株式会社 Reactive sputtering equipment and film formation method
CN111948193A (en) * 2020-08-06 2020-11-17 成都西奇仪器有限公司 Emission spectrometer for plasma solid sample analysis
GB2605447A (en) * 2021-04-01 2022-10-05 Edwards Ltd Plasma torch device component monitoring
CN114509166B (en) * 2022-01-27 2024-02-23 重庆大学 High-transient high-temperature plasma temperature measurement system

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Publication number Priority date Publication date Assignee Title
US4419582A (en) * 1977-12-19 1983-12-06 Jersey Nuclear-Avco Isotopes, Inc. Use of autoionization transition absorption peaks in isotopically selective photoexcitation
DE4118518C2 (en) * 1991-06-06 1994-03-17 Fraunhofer Ges Forschung Process for carrying out laser emission spectroscopy and device for carrying out the process
JP3274187B2 (en) * 1992-09-25 2002-04-15 日本板硝子株式会社 Emission spectroscopy method
JPH08330278A (en) * 1995-05-30 1996-12-13 Anelva Corp Surface processing method and surface processing device
JPH09186136A (en) * 1995-12-28 1997-07-15 Anelva Corp Plasma processing method
JPH1083893A (en) * 1996-09-05 1998-03-31 Sony Corp Method and apparatus for plasma control and method and apparatus for plasma measurement
US6566667B1 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with improved pulse power system
US6452199B1 (en) * 1997-05-12 2002-09-17 Cymer, Inc. Plasma focus high energy photon source with blast shield
US6064072A (en) * 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
US6254703B1 (en) * 1999-02-19 2001-07-03 Lsp Technologies, Inc. Quality control plasma monitor for laser shock processing
JP3511089B2 (en) * 2000-05-24 2004-03-29 独立行政法人産業技術総合研究所 Control method of solid surface treatment by low temperature plasma
JP2006073866A (en) * 2004-09-03 2006-03-16 Horiba Ltd Stress measuring method of semiconductor material, and apparatus therefor
US8633416B2 (en) * 2005-03-11 2014-01-21 Perkinelmer Health Sciences, Inc. Plasmas and methods of using them
US7608839B2 (en) * 2005-08-05 2009-10-27 Mcgill University Plasma source and applications thereof
WO2007134363A1 (en) * 2006-05-22 2007-11-29 Varian Australia Pty Ltd Power generator for spectrometry
JP2008133518A (en) * 2006-11-29 2008-06-12 Nissan Motor Co Ltd Control method in plasma nitriding, and plasma nitriding system

Also Published As

Publication number Publication date
WO2014140179A1 (en) 2014-09-18
DE112014001431T5 (en) 2015-12-03
GB2511840B (en) 2017-07-05
CN105190830A (en) 2015-12-23
US8822948B1 (en) 2014-09-02
US20140264000A1 (en) 2014-09-18
GB2511840A (en) 2014-09-17

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