SG10201705205WA - Toroidal plasma abatement apparatus and method - Google Patents

Toroidal plasma abatement apparatus and method

Info

Publication number
SG10201705205WA
SG10201705205WA SG10201705205WA SG10201705205WA SG10201705205WA SG 10201705205W A SG10201705205W A SG 10201705205WA SG 10201705205W A SG10201705205W A SG 10201705205WA SG 10201705205W A SG10201705205W A SG 10201705205WA SG 10201705205W A SG10201705205W A SG 10201705205WA
Authority
SG
Singapore
Prior art keywords
abatement apparatus
toroidal plasma
plasma abatement
toroidal
plasma
Prior art date
Application number
SG10201705205WA
Inventor
Xing Chen
Ilya Pokidov
Feng Tian
Ken Tran
David Lam
Kevin W Wenzel
Original Assignee
Mks Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Instr Inc filed Critical Mks Instr Inc
Publication of SG10201705205WA publication Critical patent/SG10201705205WA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/76—Gas phase processes, e.g. by using aerosols
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation
    • H01J37/32339—Discharge generated by other radiation using electromagnetic radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32651—Shields, e.g. dark space shields, Faraday shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H01J37/32844—Treating effluent gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2064—Chlorine
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases
    • H05H2245/15—Ambient air; Ozonisers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Power Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Biomedical Technology (AREA)
  • Plasma Technology (AREA)
  • Treating Waste Gases (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
SG10201705205WA 2013-03-14 2014-03-14 Toroidal plasma abatement apparatus and method SG10201705205WA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201361783360P 2013-03-14 2013-03-14

Publications (1)

Publication Number Publication Date
SG10201705205WA true SG10201705205WA (en) 2017-07-28

Family

ID=50732285

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201705205WA SG10201705205WA (en) 2013-03-14 2014-03-14 Toroidal plasma abatement apparatus and method
SG11201507152RA SG11201507152RA (en) 2013-03-14 2014-03-14 Toroidal plasma abatement apparatus and method

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201507152RA SG11201507152RA (en) 2013-03-14 2014-03-14 Toroidal plasma abatement apparatus and method

Country Status (8)

Country Link
US (3) US9630142B2 (en)
EP (1) EP2969134A1 (en)
JP (2) JP6154953B2 (en)
KR (1) KR102009513B1 (en)
CN (1) CN105209156B (en)
SG (2) SG10201705205WA (en)
TW (1) TWI634938B (en)
WO (1) WO2014152908A1 (en)

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CN105879599A (en) * 2014-12-24 2016-08-24 苏州超等环保科技有限公司 Anti-explosion plasma organic waste gas treatment device
US20160233055A1 (en) * 2015-02-06 2016-08-11 Mks Instruments Inc. Apparatus and Method for Metastable Enhanced Plasma Ignition
CN107810542A (en) * 2015-05-21 2018-03-16 普拉斯玛比利提有限责任公司 Peripheral plasma processing unit with Forming Workpiece fixture
JP2017088916A (en) * 2015-11-04 2017-05-25 株式会社神戸製鋼所 Film deposition apparatus using silicon raw material
US11251019B2 (en) * 2016-12-15 2022-02-15 Toyota Jidosha Kabushiki Kaisha Plasma device
JP7021237B2 (en) * 2017-02-09 2022-02-16 アプライド マテリアルズ インコーポレイテッド Plasma mitigation technology using water vapor and oxygen reactants
JP6863199B2 (en) 2017-09-25 2021-04-21 トヨタ自動車株式会社 Plasma processing equipment
KR101959165B1 (en) * 2018-04-27 2019-03-15 (주)엔노피아 Plasma waste gas processing apparatus and system
US11019715B2 (en) * 2018-07-13 2021-05-25 Mks Instruments, Inc. Plasma source having a dielectric plasma chamber with improved plasma resistance
KR102630346B1 (en) * 2018-10-31 2024-01-30 주식회사 뉴파워 프라즈마 Plasma reactor for multi-controlling temperature
GB2582948B (en) * 2019-04-10 2021-12-08 Thermo Fisher Scient Bremen Gmbh Plasma source chamber for a spectrometer
US10553403B1 (en) * 2019-05-08 2020-02-04 Mks Instruments, Inc. Polygonal toroidal plasma source
US11348784B2 (en) 2019-08-12 2022-05-31 Beijing E-Town Semiconductor Technology Co., Ltd Enhanced ignition in inductively coupled plasmas for workpiece processing
CN110718437A (en) * 2019-09-16 2020-01-21 明远精密科技股份有限公司 Remote plasma generating device
CN111088087B (en) * 2019-12-30 2021-07-20 广东瓦格耐电力科技有限公司 Biogas pretreatment device for biogas generator set
US20240194454A1 (en) * 2022-12-08 2024-06-13 Hamamatsu Photonics K.K. Inductively Coupled Plasma Light Source with Direct Gas Injection

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Also Published As

Publication number Publication date
TWI634938B (en) 2018-09-11
CN105209156A (en) 2015-12-30
US20180233333A1 (en) 2018-08-16
JP6154953B2 (en) 2017-06-28
SG11201507152RA (en) 2015-10-29
US9991098B2 (en) 2018-06-05
US9630142B2 (en) 2017-04-25
US20140262746A1 (en) 2014-09-18
WO2014152908A1 (en) 2014-09-25
CN105209156B (en) 2017-05-10
KR102009513B1 (en) 2019-08-09
KR20150131294A (en) 2015-11-24
JP2016521432A (en) 2016-07-21
EP2969134A1 (en) 2016-01-20
US20170213704A1 (en) 2017-07-27
TW201501775A (en) 2015-01-16
JP2017199685A (en) 2017-11-02
JP6474855B2 (en) 2019-02-27

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