GB201213068D0 - Electron beam evaporation apparatus - Google Patents

Electron beam evaporation apparatus

Info

Publication number
GB201213068D0
GB201213068D0 GB201213068A GB201213068A GB201213068D0 GB 201213068 D0 GB201213068 D0 GB 201213068D0 GB 201213068 A GB201213068 A GB 201213068A GB 201213068 A GB201213068 A GB 201213068A GB 201213068 D0 GB201213068 D0 GB 201213068D0
Authority
GB
United Kingdom
Prior art keywords
electron beam
beam evaporation
evaporation apparatus
electron
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB201213068A
Other versions
GB2493274A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOSTECH Ltd
Original Assignee
BOSTECH Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOSTECH Ltd filed Critical BOSTECH Ltd
Publication of GB201213068D0 publication Critical patent/GB201213068D0/en
Publication of GB2493274A publication Critical patent/GB2493274A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30455—Correction during exposure
GB201213068A 2011-07-23 2012-07-23 Electron beam evaporation apparatus Withdrawn GB2493274A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB201112776A GB201112776D0 (en) 2011-07-23 2011-07-23 An electron beam evaporator

Publications (2)

Publication Number Publication Date
GB201213068D0 true GB201213068D0 (en) 2012-09-05
GB2493274A GB2493274A (en) 2013-01-30

Family

ID=44652285

Family Applications (2)

Application Number Title Priority Date Filing Date
GB201112776A Ceased GB201112776D0 (en) 2011-07-23 2011-07-23 An electron beam evaporator
GB201213068A Withdrawn GB2493274A (en) 2011-07-23 2012-07-23 Electron beam evaporation apparatus

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB201112776A Ceased GB201112776D0 (en) 2011-07-23 2011-07-23 An electron beam evaporator

Country Status (2)

Country Link
GB (2) GB201112776D0 (en)
WO (1) WO2013014410A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015033713A1 (en) * 2013-09-05 2015-03-12 株式会社村田製作所 Film-formation device
CN105714252B (en) * 2016-04-28 2018-09-28 中国工程物理研究院激光聚变研究中心 A kind of optical thin film deposition scan control method and system

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2650215A1 (en) * 1976-11-02 1978-05-11 G F Paul Dipl Phys Dr Mueller Vacuum vapour deposition appts. - in which material being evaporated can be rotated and moved axially for uniform evapn. by electron beam
US4368689A (en) * 1980-12-29 1983-01-18 Rockwell International Corporation Beam source for deposition of thin film alloys
US5296274A (en) * 1989-05-10 1994-03-22 Movchan Boris A Method of producing carbon-containing materials by electron beam vacuum evaporation of graphite and subsequent condensation
JPH05186869A (en) * 1992-01-10 1993-07-27 Ulvac Japan Ltd Method and device for forming sendust film
CA2237534A1 (en) * 1997-06-23 1998-12-23 P.A. Joel Smith Rod-fed source pool height monitor
JP2001059163A (en) * 1999-08-24 2001-03-06 Toray Ind Inc Vapor deposition device and production of thin film
US20070160775A1 (en) * 2006-01-10 2007-07-12 General Electric Company Physical vapor deposition process and apparatus therefor

Also Published As

Publication number Publication date
GB2493274A (en) 2013-01-30
WO2013014410A1 (en) 2013-01-31
GB201112776D0 (en) 2011-09-07

Similar Documents

Publication Publication Date Title
HK1256062A1 (en) Beam forming apparatus
PL2633543T3 (en) Device for producing an electron beam
EP2680294A4 (en) Electron gun and electron beam device
EP2743721A4 (en) Radar apparatus
IL235586A0 (en) Non-planar extractor structure for electron source
EP2727129A4 (en) Multiple-column electron beam apparatus and methods
EP2681607A4 (en) Laser beam selectors
EP2769740A4 (en) Shield structure for electron beam sterilization equipment
EP2717290A4 (en) Electron multiplier
GB2493276B (en) RF ion guides
EP2812631A4 (en) Vaporization apparatus
EP2739764A4 (en) Ion source
EP2696363A4 (en) Electron microscope
IL249382A0 (en) Arc evaporation source
EP2625305A4 (en) Ion beam distribution
GB201213068D0 (en) Electron beam evaporation apparatus
PL2404809T3 (en) Draw beam
GB201205440D0 (en) Beam
GB201203561D0 (en) Electron multiplying apparatus
GB201112512D0 (en) Structural beam
GB2487540B (en) Condenser apparatus
GB201011842D0 (en) Beam
GB201019185D0 (en) Electron beam apparatus
EP2894639A4 (en) Electron beam detection apparatus
GB201105812D0 (en) Beam combining

Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)