GB2009922A - Gloss measurement - Google Patents

Gloss measurement

Info

Publication number
GB2009922A
GB2009922A GB7847326A GB7847326A GB2009922A GB 2009922 A GB2009922 A GB 2009922A GB 7847326 A GB7847326 A GB 7847326A GB 7847326 A GB7847326 A GB 7847326A GB 2009922 A GB2009922 A GB 2009922A
Authority
GB
United Kingdom
Prior art keywords
light
measuring
detector
head
test surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB7847326A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Allnex Austria GmbH
Original Assignee
Vianova Resins AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vianova Resins AG filed Critical Vianova Resins AG
Publication of GB2009922A publication Critical patent/GB2009922A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N21/57—Measuring gloss

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
GB7847326A 1977-12-09 1978-12-06 Gloss measurement Withdrawn GB2009922A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT879477A AT351295B (de) 1977-12-09 1977-12-09 Anordnung zur messung des glanzvermoegens von oberflaechen, insbesondere organischer ueberzuege

Publications (1)

Publication Number Publication Date
GB2009922A true GB2009922A (en) 1979-06-20

Family

ID=3608589

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7847326A Withdrawn GB2009922A (en) 1977-12-09 1978-12-06 Gloss measurement

Country Status (7)

Country Link
JP (1) JPS5489789A (enrdf_load_stackoverflow)
AT (1) AT351295B (enrdf_load_stackoverflow)
CH (1) CH638047A5 (enrdf_load_stackoverflow)
DD (1) DD140290A5 (enrdf_load_stackoverflow)
DE (1) DE2851455C3 (enrdf_load_stackoverflow)
FR (1) FR2411405A1 (enrdf_load_stackoverflow)
GB (1) GB2009922A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2579884A1 (enrdf_load_stackoverflow) * 1985-04-09 1986-10-10 Sanofi Sa
EP0200918A1 (en) * 1985-03-28 1986-11-12 Kabushiki Kaisha Toshiba Surface inspection method and apparatus therefor
GB2234586A (en) * 1989-07-14 1991-02-06 Ricoh Kk Toner density sensing device for image forming equipment
EP1055903A1 (en) * 1999-05-24 2000-11-29 Luxtron Corporation Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers
WO2000071971A1 (en) * 1999-05-24 2000-11-30 Luxtron Corporation Optical techniques for measuring layer thicknesses
US20120026512A1 (en) * 2010-07-28 2012-02-02 Peter Schwarz Apparatus and method for determining surface characteristics using multiple measurements

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3138879A1 (de) * 1981-09-30 1983-04-14 Boehringer Mannheim Gmbh, 6800 Mannheim Verfahren zur erfassung photometrischer signale und anordnung zur durchfuehrung des verfahrens
DE3212190A1 (de) * 1982-04-01 1983-10-06 Siemens Ag Opto-elektronische unterscheidung von strukturen auf oberflaechen
JPS5942317U (ja) * 1982-09-13 1984-03-19 株式会社東芝 動圧気体軸受装置
US4677298A (en) * 1983-12-13 1987-06-30 Kollmorgen Technologies Corporation Method of monitoring ink-water balance on a lithographic printing press
FI78563C (fi) * 1985-11-27 1989-08-10 Aimo Heinonen Reflektometriskt maetningsfoerfarande och maetningsanordning foer genomfoerande av foerfarandet.
US5182618A (en) * 1985-11-27 1993-01-26 Aimo Heinonen Reflectometric method of measurement and apparatus for realizing the method
FI78355C (fi) * 1986-05-27 1989-07-10 Puumalaisen Tutkimuslaitos Oy Metod foer maetning av glans och apparatur foer tillaempning av metoden.
JPS63174551U (enrdf_load_stackoverflow) * 1987-04-27 1988-11-11
DE8704679U1 (de) * 1987-03-30 1987-05-27 Fa. Carl Zeiss, 7920 Heidenheim Meßgerät für Oberflächen mit bunten Glanzeffekten
JP2996300B2 (ja) * 1988-05-27 1999-12-27 株式会社堀場製作所 携帯用光沢測定装置
JPH0257949A (ja) * 1988-08-24 1990-02-27 Suga Shikenki Kk 携帯形多角光沢計
JPH0248852U (enrdf_load_stackoverflow) * 1988-09-30 1990-04-04
DE4344095C2 (de) * 1993-12-20 1999-10-14 Lange Gmbh Dr Bruno Verfahren und Vorrichtung zur Messung des Glanzgrades
DE19930688A1 (de) * 1999-07-02 2001-01-04 Byk Gardner Gmbh Vorrichtung und Verfahren zur Bestimmung der Qualität von Oberflächen
DE102006048688B4 (de) * 2006-10-14 2022-02-03 Byk Gardner Gmbh Verfahren und Vorrichtung zur Untersuchung von Oberflächen mit Effektpigmenten

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1761827U (de) * 1957-11-04 1958-02-20 Geraete Fuer Licht Und Strahlu Lichtelektrischer glanzmesser.
US3245306A (en) * 1961-10-05 1966-04-12 Aluminum Co Of America Photometer and method
DE1944088U (de) * 1966-06-16 1966-08-11 Bayer Ag Vorrichtung zur beurteilung der glanzeigenschaften von oberflaechen.
AT334657B (de) * 1975-01-24 1976-01-25 Vianova Kunstharz Ag Verbesserung zur messung des glanzvermogens von ebenen oberflachen
US3999864A (en) * 1975-11-17 1976-12-28 International Business Machines Corporation Gloss measuring instrument

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0200918A1 (en) * 1985-03-28 1986-11-12 Kabushiki Kaisha Toshiba Surface inspection method and apparatus therefor
US4902131A (en) * 1985-03-28 1990-02-20 Kabushiki Kaisha Toshiba Surface inspection method and apparatus therefor
FR2579884A1 (enrdf_load_stackoverflow) * 1985-04-09 1986-10-10 Sanofi Sa
EP0198759A3 (en) * 1985-04-09 1987-09-16 Sanofi Apparatus for the measurement of the luminosity of the skin
US4846184A (en) * 1985-04-09 1989-07-11 Sanofi Skin reflectance measuring apparatus
GB2234586B (en) * 1989-07-14 1993-12-01 Ricoh Kk Toner density sensing device for image forming equipment
GB2234586A (en) * 1989-07-14 1991-02-06 Ricoh Kk Toner density sensing device for image forming equipment
EP1055903A1 (en) * 1999-05-24 2000-11-29 Luxtron Corporation Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers
WO2000071971A1 (en) * 1999-05-24 2000-11-30 Luxtron Corporation Optical techniques for measuring layer thicknesses
US6570662B1 (en) 1999-05-24 2003-05-27 Luxtron Corporation Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers
US6654132B1 (en) 1999-05-24 2003-11-25 Luxtron Corporation Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers
US6934040B1 (en) 1999-05-24 2005-08-23 Luxtron Corporation Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers
US7042581B2 (en) 1999-05-24 2006-05-09 Luxtron Corporation Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers
US20120026512A1 (en) * 2010-07-28 2012-02-02 Peter Schwarz Apparatus and method for determining surface characteristics using multiple measurements

Also Published As

Publication number Publication date
FR2411405A1 (fr) 1979-07-06
ATA879477A (de) 1978-12-15
JPS6252255B2 (enrdf_load_stackoverflow) 1987-11-04
DE2851455B2 (de) 1980-07-24
DD140290A5 (de) 1980-02-20
AT351295B (de) 1979-07-10
DE2851455A1 (de) 1979-06-13
DE2851455C3 (de) 1981-08-13
CH638047A5 (de) 1983-08-31
JPS5489789A (en) 1979-07-17

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)