GB2000640A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- GB2000640A GB2000640A GB7828267A GB7828267A GB2000640A GB 2000640 A GB2000640 A GB 2000640A GB 7828267 A GB7828267 A GB 7828267A GB 7828267 A GB7828267 A GB 7828267A GB 2000640 A GB2000640 A GB 2000640A
- Authority
- GB
- United Kingdom
- Prior art keywords
- main surface
- conductivity type
- extends along
- type resistor
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 239000013078 crystal Substances 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000000465 moulding Methods 0.000 abstract 1
- 229920003023 plastic Polymers 0.000 abstract 1
- 239000004033 plastic Substances 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 230000008646 thermal stress Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
- H01L29/045—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/8605—Resistors with PN junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Integrated Circuits (AREA)
- Details Of Resistors (AREA)
Abstract
A P-conductivity type resistor layer 12 is formed in the main surface of a silicon substrate 11, and extends along a crystal axis of [001] where the main surface is a crystal face of (110), or else it extends along a [010] or [001] axis in the case of a (100) face main surface. It has been found that the resistance value of a P-conductivity type resistor layer of such orientation is less affected than other orientations in the same plane by the thermal stresses induced in the layer by the shrinkage of a plastics resin envelope 18 during the moulding thereof. <IMAGE>
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7662077A JPS5412575A (en) | 1977-06-29 | 1977-06-29 | Semiconductor device |
JP7646477A JPS5412280A (en) | 1977-06-29 | 1977-06-29 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
GB2000640A true GB2000640A (en) | 1979-01-10 |
Family
ID=26417613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB7828267A Withdrawn GB2000640A (en) | 1977-06-29 | 1978-06-29 | Semiconductor device |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE2828608B2 (en) |
FR (1) | FR2396413A1 (en) |
GB (1) | GB2000640A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0035331A2 (en) * | 1980-02-29 | 1981-09-09 | Kabushiki Kaisha Toshiba | Resin-sealed semiconductor device |
EP0174438A1 (en) * | 1984-05-29 | 1986-03-19 | Kabushiki Kaisha Meidensha | Semiconductor switching device with reduced defect density |
EP0197955A1 (en) * | 1984-10-18 | 1986-10-22 | Motorola Inc | Method for resistor trimming by metal migration. |
-
1978
- 1978-06-29 DE DE19782828608 patent/DE2828608B2/en not_active Withdrawn
- 1978-06-29 GB GB7828267A patent/GB2000640A/en not_active Withdrawn
- 1978-06-29 FR FR7819523A patent/FR2396413A1/en active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0035331A2 (en) * | 1980-02-29 | 1981-09-09 | Kabushiki Kaisha Toshiba | Resin-sealed semiconductor device |
EP0035331A3 (en) * | 1980-02-29 | 1982-09-29 | Kabushiki Kaisha Toshiba | Resin-sealed semiconductor device |
EP0174438A1 (en) * | 1984-05-29 | 1986-03-19 | Kabushiki Kaisha Meidensha | Semiconductor switching device with reduced defect density |
US4667215A (en) * | 1984-05-29 | 1987-05-19 | Kabushiki Kaisha Meidensha | Semiconductor device |
EP0197955A1 (en) * | 1984-10-18 | 1986-10-22 | Motorola Inc | Method for resistor trimming by metal migration. |
EP0197955A4 (en) * | 1984-10-18 | 1987-01-10 | Motorola Inc | Method for resistor trimming by metal migration. |
Also Published As
Publication number | Publication date |
---|---|
FR2396413B1 (en) | 1983-01-14 |
DE2828608A1 (en) | 1979-01-04 |
FR2396413A1 (en) | 1979-01-26 |
DE2828608B2 (en) | 1981-02-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |