GB1584224A - Ion implantation apparatus - Google Patents
Ion implantation apparatus Download PDFInfo
- Publication number
- GB1584224A GB1584224A GB13696/78A GB1369678A GB1584224A GB 1584224 A GB1584224 A GB 1584224A GB 13696/78 A GB13696/78 A GB 13696/78A GB 1369678 A GB1369678 A GB 1369678A GB 1584224 A GB1584224 A GB 1584224A
- Authority
- GB
- United Kingdom
- Prior art keywords
- target
- figures
- walls
- ion beam
- side walls
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005468 ion implantation Methods 0.000 title claims description 17
- 238000010884 ion-beam technique Methods 0.000 claims description 46
- 235000012431 wafers Nutrition 0.000 claims description 22
- 150000002500 ions Chemical class 0.000 claims description 15
- 238000001816 cooling Methods 0.000 claims description 12
- 229910052785 arsenic Inorganic materials 0.000 claims description 11
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 11
- 238000002513 implantation Methods 0.000 claims description 11
- 238000004980 dosimetry Methods 0.000 claims description 9
- 238000005259 measurement Methods 0.000 claims description 7
- 239000002826 coolant Substances 0.000 claims description 6
- 230000000694 effects Effects 0.000 claims description 6
- 230000000903 blocking effect Effects 0.000 claims description 5
- 230000001276 controlling effect Effects 0.000 claims description 5
- 239000012777 electrically insulating material Substances 0.000 claims description 5
- 230000005855 radiation Effects 0.000 claims description 5
- 239000012530 fluid Substances 0.000 claims description 4
- 230000002411 adverse Effects 0.000 claims description 3
- 239000002019 doping agent Substances 0.000 claims description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 2
- 230000003334 potential effect Effects 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000006378 damage Effects 0.000 description 3
- 238000010849 ion bombardment Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000006735 deficit Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 235000018734 Sambucus australis Nutrition 0.000 description 1
- 244000180577 Sambucus australis Species 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- -1 arsenic Chemical class 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24405—Faraday cages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/794,275 US4118630A (en) | 1977-05-05 | 1977-05-05 | Ion implantation apparatus with a cooled structure controlling the surface potential of a target surface |
| US05/794,276 US4135097A (en) | 1977-05-05 | 1977-05-05 | Ion implantation apparatus for controlling the surface potential of a target surface |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1584224A true GB1584224A (en) | 1981-02-11 |
Family
ID=27121491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB13696/78A Expired GB1584224A (en) | 1977-05-05 | 1978-04-07 | Ion implantation apparatus |
Country Status (5)
| Country | Link |
|---|---|
| DE (1) | DE2819114C3 (enrdf_load_stackoverflow) |
| FR (1) | FR2389998B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1584224A (enrdf_load_stackoverflow) |
| IT (1) | IT1112625B (enrdf_load_stackoverflow) |
| NL (1) | NL7804691A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2490873A1 (fr) * | 1980-09-24 | 1982-03-26 | Varian Associates | Procede et dispositif destines a produire une neutralisation amelioree d'un faisceau d'ions positifs |
| FR2793951B1 (fr) * | 1999-05-21 | 2001-08-17 | Centre Nat Etd Spatiales | Procede et installation de traitement d'un substrat tel qu'un circuit integre par un faisceau focalise de particules electriquement neutres |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2890342A (en) * | 1954-09-29 | 1959-06-09 | Gen Electric | System for charge neutralization |
| US3313969A (en) * | 1966-03-25 | 1967-04-11 | Boeing Co | Charged particle deflecting apparatus having hemispherical electrodes |
| US3507709A (en) * | 1967-09-15 | 1970-04-21 | Hughes Aircraft Co | Method of irradiating dielectriccoated semiconductor bodies with low energy electrons |
| US3997846A (en) * | 1975-06-30 | 1976-12-14 | International Business Machines Corporation | Method and apparatus for electrostatic deflection of high current ion beams in scanning apparatus |
| US4011449A (en) * | 1975-11-05 | 1977-03-08 | Ibm Corporation | Apparatus for measuring the beam current of charged particle beam |
| US4013891A (en) * | 1975-12-15 | 1977-03-22 | Ibm Corporation | Method for varying the diameter of a beam of charged particles |
-
1978
- 1978-03-23 FR FR7809182A patent/FR2389998B1/fr not_active Expired
- 1978-04-07 GB GB13696/78A patent/GB1584224A/en not_active Expired
- 1978-04-28 IT IT22795/78A patent/IT1112625B/it active
- 1978-04-29 DE DE2819114A patent/DE2819114C3/de not_active Expired
- 1978-05-02 NL NL7804691A patent/NL7804691A/xx not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| NL7804691A (nl) | 1978-11-07 |
| DE2819114A1 (de) | 1978-11-16 |
| DE2819114C3 (de) | 1982-03-04 |
| DE2819114B2 (de) | 1981-07-16 |
| FR2389998A1 (enrdf_load_stackoverflow) | 1978-12-01 |
| IT7822795A0 (it) | 1978-04-28 |
| IT1112625B (it) | 1986-01-20 |
| FR2389998B1 (enrdf_load_stackoverflow) | 1981-11-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4135097A (en) | Ion implantation apparatus for controlling the surface potential of a target surface | |
| US4118630A (en) | Ion implantation apparatus with a cooled structure controlling the surface potential of a target surface | |
| KR0170394B1 (ko) | 이온 주입장치 | |
| US5136171A (en) | Charge neutralization apparatus for ion implantation system | |
| US6020592A (en) | Dose monitor for plasma doping system | |
| US4825087A (en) | System and methods for wafer charge reduction for ion implantation | |
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| JPH09147771A (ja) | イオン発生装置、イオン照射装置、及び半導体装置の製造方法 | |
| US4316090A (en) | Microwave plasma ion source | |
| US6723998B2 (en) | Faraday system for ion implanters | |
| McKenna | High current dosimetry techniques | |
| US6348764B1 (en) | Indirect hot cathode (IHC) ion source | |
| GB1584224A (en) | Ion implantation apparatus | |
| EP0104818A2 (en) | Ion implantation device | |
| Forneris et al. | Ion implantation apparatus | |
| EP0487656B1 (en) | Charge neutralization apparatus for ion implantation system | |
| Horsky et al. | Novel Ion Source for the Production of Extended Sheet Beams | |
| KR0114868Y1 (ko) | 이온주입 장비 | |
| McKenna | Faraday cup designs for ion implantation | |
| JPS6240369A (ja) | イオン注入装置 | |
| JPH0762245B2 (ja) | 薄膜形成装置 | |
| Wu et al. | Low‐Energy Contaminant in B++ Implantation and Its Elimination | |
| KR20070017868A (ko) | 이온주입장치 | |
| Dearnaley | Didcot, England |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19950407 |