GB1553695A - Cleaning semiconductor dics - Google Patents

Cleaning semiconductor dics

Info

Publication number
GB1553695A
GB1553695A GB24059/76A GB2405976A GB1553695A GB 1553695 A GB1553695 A GB 1553695A GB 24059/76 A GB24059/76 A GB 24059/76A GB 2405976 A GB2405976 A GB 2405976A GB 1553695 A GB1553695 A GB 1553695A
Authority
GB
United Kingdom
Prior art keywords
dics
cleaning semiconductor
cleaning
semiconductor
semiconductor dics
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB24059/76A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siltronic AG
Original Assignee
Wacker Siltronic AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Siltronic AG filed Critical Wacker Siltronic AG
Publication of GB1553695A publication Critical patent/GB1553695A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00Cleaning of wafers, substrates or parts of devices
    • H10P70/10Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/15Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
GB24059/76A 1975-06-11 1976-06-10 Cleaning semiconductor dics Expired GB1553695A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2526052A DE2526052C2 (de) 1975-06-11 1975-06-11 Verfahren zum Reinigen polierter Halbleiterscheiben

Publications (1)

Publication Number Publication Date
GB1553695A true GB1553695A (en) 1979-09-26

Family

ID=5948838

Family Applications (1)

Application Number Title Priority Date Filing Date
GB24059/76A Expired GB1553695A (en) 1975-06-11 1976-06-10 Cleaning semiconductor dics

Country Status (7)

Country Link
JP (1) JPS51150972A (enExample)
BE (1) BE842810A (enExample)
DE (1) DE2526052C2 (enExample)
DK (1) DK144776A (enExample)
GB (1) GB1553695A (enExample)
IT (1) IT1061334B (enExample)
NL (1) NL7603267A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2219002C1 (ru) * 2002-04-08 2003-12-20 Панчеха Юрий Степанович Способ очистки изделий

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4129457A (en) * 1977-05-23 1978-12-12 International Business Machines Corporation Post-polishing cleaning of semiconductor surfaces
JPS6040705B2 (ja) * 1978-06-26 1985-09-12 インタ−ナシヨナル・ビジネス・マシ−ンンズ・コ−ポレ−シヨン 電子回路の保護被覆形成方法
DE3328639A1 (de) * 1983-08-09 1985-02-21 Merck Patent Gmbh, 6100 Darmstadt Reinigungsmittel fuer mechanisch bearbeitete halbleitermaterialien
JPS60126838A (ja) * 1983-12-13 1985-07-06 Mitsubishi Monsanto Chem Co ひ化ガリウム単結晶ウエハの洗滌液および洗滌方法
DE3834396A1 (de) * 1988-10-10 1990-04-12 Telefunken Electronic Gmbh Verfahren zum entfernen von oberflaechenschichten
DE4103084A1 (de) * 1991-02-01 1992-08-13 Wacker Chemitronic Magazin zur halterung von scheibenfoermigen werkstuecken, insbesondere halbleiterscheiben, bei der nasschemischen oberflaechenbehandlung in fluessigkeitsbaedern
US5320706A (en) * 1991-10-15 1994-06-14 Texas Instruments Incorporated Removing slurry residue from semiconductor wafer planarization
US5911889A (en) * 1995-05-11 1999-06-15 Wacker Siltronic Gesellschaft Fur Halbleitermaterialien Aktiengesellschaft Method of removing damaged crystal regions from silicon wafers
US6074935A (en) * 1997-06-25 2000-06-13 Siemens Aktiengesellschaft Method of reducing the formation of watermarks on semiconductor wafers

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3342652A (en) * 1964-04-02 1967-09-19 Ibm Chemical polishing of a semi-conductor substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2219002C1 (ru) * 2002-04-08 2003-12-20 Панчеха Юрий Степанович Способ очистки изделий

Also Published As

Publication number Publication date
JPS51150972A (en) 1976-12-24
IT1061334B (it) 1983-02-28
BE842810A (fr) 1976-12-10
DE2526052C2 (de) 1983-04-21
NL7603267A (nl) 1976-12-14
JPS5338592B2 (enExample) 1978-10-16
DE2526052A1 (de) 1976-12-30
DK144776A (da) 1976-12-12

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee