GB1551403A - Method of manufacturing single crystals of gallium nitride - Google Patents
Method of manufacturing single crystals of gallium nitrideInfo
- Publication number
- GB1551403A GB1551403A GB2407776A GB2407776A GB1551403A GB 1551403 A GB1551403 A GB 1551403A GB 2407776 A GB2407776 A GB 2407776A GB 2407776 A GB2407776 A GB 2407776A GB 1551403 A GB1551403 A GB 1551403A
- Authority
- GB
- United Kingdom
- Prior art keywords
- gallium nitride
- single crystals
- manufacturing single
- manufacturing
- crystals
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
- C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
- C30B11/12—Vaporous components, e.g. vapour-liquid-solid-growth
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7518581A FR2313976A1 (en) | 1975-06-13 | 1975-06-13 | PROCESS FOR MANUFACTURING GALLIUM NITRIDE SINGLE CRYSTALS AND SINGLE CRYSTALS OBTAINED BY IMPLEMENTING THIS PROCESS |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1551403A true GB1551403A (en) | 1979-08-30 |
Family
ID=9156506
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2407776A Expired GB1551403A (en) | 1975-06-13 | 1976-06-10 | Method of manufacturing single crystals of gallium nitride |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS51151299A (en) |
DE (1) | DE2624958C3 (en) |
FR (1) | FR2313976A1 (en) |
GB (1) | GB1551403A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2326160A (en) * | 1997-06-11 | 1998-12-16 | Hitachi Cable | Making group III metal nitride crystals; crystal growth methods |
US6273948B1 (en) | 1997-06-05 | 2001-08-14 | Centrum Badan Wysokocisnieniowych Polskiej Akademii Nauk | Method of fabrication of highly resistive GaN bulk crystals |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
PL173917B1 (en) * | 1993-08-10 | 1998-05-29 | Ct Badan Wysokocisnieniowych P | Method of obtaining a crystalline lamellar structure |
WO1997013891A1 (en) * | 1995-10-13 | 1997-04-17 | Centrum Badan Wysokocisnieniowych | METHOD OF MANUFACTURING EPITAXIAL LAYERS OF GaN OR Ga(A1,In)N ON SINGLE CRYSTAL GaN AND MIXED Ga(A1,In)N SUBSTRATES |
WO1999034037A1 (en) * | 1997-12-25 | 1999-07-08 | Japan Energy Corporation | Process for the preparation of single crystals of compound semiconductors, equipment therefor, and single crystals of compound semiconductors |
JP5348123B2 (en) * | 1999-06-09 | 2013-11-20 | 株式会社リコー | Crystal manufacturing equipment |
JP5082213B2 (en) * | 2004-08-20 | 2012-11-28 | 三菱化学株式会社 | Metal nitride and method for producing metal nitride |
JP2010042976A (en) * | 2008-07-16 | 2010-02-25 | Sumitomo Electric Ind Ltd | METHOD FOR GROWING GaN CRYSTAL |
-
1975
- 1975-06-13 FR FR7518581A patent/FR2313976A1/en not_active Withdrawn
-
1976
- 1976-06-03 DE DE19762624958 patent/DE2624958C3/en not_active Expired
- 1976-06-10 GB GB2407776A patent/GB1551403A/en not_active Expired
- 1976-06-10 JP JP6721176A patent/JPS51151299A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6273948B1 (en) | 1997-06-05 | 2001-08-14 | Centrum Badan Wysokocisnieniowych Polskiej Akademii Nauk | Method of fabrication of highly resistive GaN bulk crystals |
GB2326160A (en) * | 1997-06-11 | 1998-12-16 | Hitachi Cable | Making group III metal nitride crystals; crystal growth methods |
GB2326160B (en) * | 1997-06-11 | 1999-11-03 | Hitachi Cable | Nitride crystal fabricating method |
Also Published As
Publication number | Publication date |
---|---|
FR2313976A1 (en) | 1977-01-07 |
DE2624958B2 (en) | 1980-01-31 |
DE2624958C3 (en) | 1980-09-25 |
JPS51151299A (en) | 1976-12-25 |
DE2624958A1 (en) | 1976-12-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51117199A (en) | Method of making single crystal | |
JPS5331961A (en) | Method of making semiconductor | |
GB1539244A (en) | Manufacture of silicon crystals | |
JPS53123659A (en) | Method of producing compound semiconductor wafer | |
JPS5252185A (en) | Pullluppgrowth of silicone crystals | |
JPS54163672A (en) | Method of growing semiconductor compound monocrystal | |
JPS5319922A (en) | Producing method of crystalline silicon | |
JPS5222484A (en) | Method of producing semiconductor structure | |
JPS529648A (en) | Method of selectively ionnetching silicon | |
IL50922A0 (en) | Crystal growth method | |
GB1551403A (en) | Method of manufacturing single crystals of gallium nitride | |
JPS5285463A (en) | Improvement of semiconductor fabricating method | |
JPS51141806A (en) | Method of amino compound | |
JPS51147251A (en) | Method of liquiddphase epitaxial growth | |
JPS5253816A (en) | Method of manufacturing alphaaaminoo gammaamercaptobutyloonitrile | |
JPS535100A (en) | Method of making single crystal gadlinium gallium | |
JPS5265719A (en) | Producing method of silicon single crystals | |
BG24818A3 (en) | Method of obtaining crystalline modification of cephacetrilsodium salt | |
JPS5248624A (en) | Method of manufacturing dicyanobutene | |
JPS5327362A (en) | Method of forming compound semiconductor crystal | |
JPS53148388A (en) | Method of producing compound semiconductor crystal | |
JPS5311887A (en) | Method of manufacturing monocrystalline bands of semiconductor | |
JPS5314554A (en) | Method of chamfering single crystal wafer | |
JPS5252900A (en) | Method of making single crystal whisker of magnesiaaalumina spinel | |
JPS5212953A (en) | Method of producing concentrated egg |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
CSNS | Application of which complete specification have been accepted and published, but patent is not sealed |