GB1525580A - Photocrosslinkable compositions - Google Patents

Photocrosslinkable compositions

Info

Publication number
GB1525580A
GB1525580A GB49903/75A GB4990375A GB1525580A GB 1525580 A GB1525580 A GB 1525580A GB 49903/75 A GB49903/75 A GB 49903/75A GB 4990375 A GB4990375 A GB 4990375A GB 1525580 A GB1525580 A GB 1525580A
Authority
GB
United Kingdom
Prior art keywords
compositions
dec
photocrosslinkable compositions
photocrosslinkable
photosensitizer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB49903/75A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of GB1525580A publication Critical patent/GB1525580A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3415—Five-membered rings

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Insulating Materials (AREA)
  • Polymerisation Methods In General (AREA)
GB49903/75A 1974-12-06 1975-12-04 Photocrosslinkable compositions Expired GB1525580A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742457882 DE2457882B2 (de) 1974-12-06 1974-12-06 Waermebestaendige, lichtvernetzbare massen

Publications (1)

Publication Number Publication Date
GB1525580A true GB1525580A (en) 1978-09-20

Family

ID=5932777

Family Applications (1)

Application Number Title Priority Date Filing Date
GB49903/75A Expired GB1525580A (en) 1974-12-06 1975-12-04 Photocrosslinkable compositions

Country Status (10)

Country Link
US (1) US4072524A (enExample)
JP (1) JPS51125483A (enExample)
AT (1) AT340771B (enExample)
BE (1) BE836269A (enExample)
CH (1) CH617950A5 (enExample)
DE (1) DE2457882B2 (enExample)
FR (1) FR2293467A1 (enExample)
GB (1) GB1525580A (enExample)
IT (1) IT1049880B (enExample)
NL (1) NL7514160A (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607261B2 (ja) * 1978-10-02 1985-02-23 旭化成株式会社 感光性エラストマ−組成物
US4615968A (en) * 1982-11-04 1986-10-07 Ciba-Geigy Corporation Compositions of matter which crosslink under the action of light in the presence of sensitizers
JPH0739167B2 (ja) * 1984-10-29 1995-05-01 株式会社日立製作所 積層板の製造方法
US5607814A (en) * 1992-08-07 1997-03-04 E. I. Du Pont De Nemours And Company Process and element for making a relief image using an IR sensitive layer
US6756181B2 (en) 1993-06-25 2004-06-29 Polyfibron Technologies, Inc. Laser imaged printing plates
AU3119397A (en) * 1996-05-16 1997-12-05 Napp Systems Inc. Methods to increase the exposure sensitivity of photopolymerizable matrices and apparatus useful therefor
ATE333114T1 (de) * 1998-01-30 2006-08-15 Albemarle Corp Maleimide enthaltende fotopolymerisierbare zusammensetzungen und verfahren zu deren verwendung
DE102017200495A1 (de) * 2017-01-13 2018-04-26 Conti Temic Microelectronic Gmbh Verfahren zum Herstellen von einer Leiterplatte für ein Kraftfahrzeug

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3060022A (en) * 1959-07-13 1962-10-23 Gen Aniline & Film Corp Image transfer process
US3147119A (en) * 1962-05-18 1964-09-01 Gen Aniline & Film Corp Photopolymerization of vinyl monomers with metal oxides as catalysts
US3469983A (en) * 1965-07-06 1969-09-30 Gaf Corp Preparation of photopolymer lithographic offset paper plates
US3376139A (en) * 1966-02-01 1968-04-02 Gilano Michael Nicholas Photosensitive prepolymer composition and method
US3619187A (en) * 1968-02-12 1971-11-09 Gaf Corp Process for preparing colored photoresists
DE2130904C3 (de) * 1971-06-22 1974-06-12 Siemens Ag, 1000 Berlin Und 8000 Muenchen Homogene lichtvernetzbare Schichten liefernde Gemische
US3905820A (en) * 1972-01-27 1975-09-16 Hoechst Ag Light sensitive copolymers, a process for their manufacture and copying compositions containing them
NL177718C (nl) * 1973-02-22 1985-11-01 Siemens Ag Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren.
US3932401A (en) * 1974-01-31 1976-01-13 Minnesota Mining And Manufacturing Company Mixed acrylic acid/methacrylic acid esters of tris (hydroxyalkyl) isocyanurates

Also Published As

Publication number Publication date
US4072524A (en) 1978-02-07
JPS51125483A (en) 1976-11-01
BE836269A (fr) 1976-04-01
ATA834875A (de) 1977-04-15
FR2293467B1 (enExample) 1978-05-12
DE2457882B2 (de) 1977-06-02
FR2293467A1 (fr) 1976-07-02
NL7514160A (nl) 1976-06-09
DE2457882A1 (de) 1976-06-16
AT340771B (de) 1978-01-10
CH617950A5 (enExample) 1980-06-30
IT1049880B (it) 1981-02-10

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee