GB1520587A - Doped silica glass - Google Patents

Doped silica glass

Info

Publication number
GB1520587A
GB1520587A GB2319476A GB2319476A GB1520587A GB 1520587 A GB1520587 A GB 1520587A GB 2319476 A GB2319476 A GB 2319476A GB 2319476 A GB2319476 A GB 2319476A GB 1520587 A GB1520587 A GB 1520587A
Authority
GB
United Kingdom
Prior art keywords
powder
alumina
glass
plasma flame
oxidizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2319476A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Quartz SAS
Original Assignee
Quartz and Silice SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Quartz and Silice SA filed Critical Quartz and Silice SA
Publication of GB1520587A publication Critical patent/GB1520587A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C03B37/01426—Plasma deposition burners or torches
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C13/00—Fibre or filament compositions
    • C03C13/04—Fibre optics, e.g. core and clad fibre compositions
    • C03C13/045—Silica-containing oxide glass compositions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/32—Doped silica-based glasses containing metals containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing

Abstract

1520587 Doped silica glass QUARTZ & SILICE 4 June 1976 [6 June 1975] 23194/76 Heading C1M Alumina-doped silica glass is obtained by simultaneous deposition of silica and alumina on a support, the alumina being produced during the deposition by oxidation of aluminium powder or gaseous aluminium produced by vaporizing the Al powder. In a first embodiment, Al powder and a silicon compound (e.g. SiCl 4 ) are introduced into an oxidizing plasma flame. In a second embodiment, the Al powder and silicon compound are introduced through tube 24, with a non-oxidizing gas (e.g. He or Ar), into a non-oxidizing plasma flame to vaporize the Al. The plasma flame is produced by an arc established by electrodes 22, 23 and induction winding 17. The vapour mixture then passes into a further, oxidizing plasma flame (O 2 or air being introduced via jets 20) in which the Al and Si-compound are oxidized. In a third embodiment, only Al powder is supplied to the non-oxidizing plasma flame, the silicon compound being introduced directly into the oxidizing flame (via jets 25). The alumina-doped glass 16 is deposited on a rotating silica support 15. The glass may also be deposited on the lateral surfaces of a rod-like support (Fig. 4, not shown). The alumina content of the glass may be progressively decreased so as to obtain a radial refractive index decrease, and the bar obtained may be drawn to an optical fibre (after removal of the support, if this is not also Al 2 O 3 -doped silica).
GB2319476A 1975-06-06 1976-06-04 Doped silica glass Expired GB1520587A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7517680A FR2313327A1 (en) 1975-06-06 1975-06-06 VERY HIGH PURITY GLASS PREPARATION PROCESS USED IN PARTICULAR FOR THE MANUFACTURE OF OPTICAL FIBERS

Publications (1)

Publication Number Publication Date
GB1520587A true GB1520587A (en) 1978-08-09

Family

ID=9156129

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2319476A Expired GB1520587A (en) 1975-06-06 1976-06-04 Doped silica glass

Country Status (3)

Country Link
DE (1) DE2625064A1 (en)
FR (1) FR2313327A1 (en)
GB (1) GB1520587A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2124205A (en) * 1982-07-26 1984-02-15 Western Electric Co Method of fabricating optical fiber preforms
EP0245716A1 (en) * 1986-05-14 1987-11-19 Polaroid Corporation Method and apparatus for forming doped optical preforms
US6630418B2 (en) 2001-12-21 2003-10-07 Corning Incorporated Fused silica containing aluminum
WO2004005206A1 (en) * 2002-07-09 2004-01-15 Heraeus Tenevo Gmbh Method and device for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method
US6946416B2 (en) 2001-12-21 2005-09-20 Corning Incorporated Fused silica having improved index homogeneity
CN102723265A (en) * 2012-06-18 2012-10-10 苏州阿特斯阳光电力科技有限公司 Aluminum doping method for silicon wafer

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2447890B1 (en) * 1979-02-05 1985-06-28 Lyonnaise Transmiss Optiques METHOD FOR MANUFACTURING INDEX GRADIENT OPTICAL FIBER PREFORMS, AND DEVICE FOR CARRYING OUT SAID METHOD
DE3036915A1 (en) * 1979-10-09 1981-04-23 Nippon Telegraph & Telephone Public Corp., Tokyo METHOD FOR PRODUCING BLANKS FOR LIGHT-GUIDE FIBERS
US4345928A (en) * 1979-10-09 1982-08-24 Nippon Telegraph & Telephone Public Corporation Fabrication method of single-mode optical fiber preforms
US4367085A (en) * 1980-01-07 1983-01-04 Nippon Telegraph & Telephone Public Corporation Method of fabricating multi-mode optical fiber preforms
JPS57100928A (en) * 1980-12-12 1982-06-23 Nippon Telegr & Teleph Corp <Ntt> Burner for preparing base material for optical fiber
DE3217839A1 (en) * 1982-05-12 1983-11-17 Hans Dr.Rer.Nat. 5370 Kall Beerwald PLASMA PROCESS FOR PRODUCING A DIELECTRIC ROD
DE3327484A1 (en) * 1983-07-29 1985-02-14 Siemens AG, 1000 Berlin und 8000 München METHOD FOR PRODUCING GLASS BY DEPOSITION FROM THE GAS PHASE
GB9108891D0 (en) * 1991-04-25 1991-06-12 Tetronics Research & Dev Co Li Silica production
FR2714371B1 (en) * 1993-12-24 1996-02-16 Cabloptic Sa Method for recharging an optical fiber preform, device for implementing this method and optical fiber by this method.

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2124205A (en) * 1982-07-26 1984-02-15 Western Electric Co Method of fabricating optical fiber preforms
EP0245716A1 (en) * 1986-05-14 1987-11-19 Polaroid Corporation Method and apparatus for forming doped optical preforms
US6630418B2 (en) 2001-12-21 2003-10-07 Corning Incorporated Fused silica containing aluminum
US6689706B2 (en) 2001-12-21 2004-02-10 Corning Incorporated Fused silica containing aluminum
US6946416B2 (en) 2001-12-21 2005-09-20 Corning Incorporated Fused silica having improved index homogeneity
WO2004005206A1 (en) * 2002-07-09 2004-01-15 Heraeus Tenevo Gmbh Method and device for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method
US8336337B2 (en) 2002-07-09 2012-12-25 Heraeus Quarzglas Gmbh & Co. Kg Method and device for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method
CN102723265A (en) * 2012-06-18 2012-10-10 苏州阿特斯阳光电力科技有限公司 Aluminum doping method for silicon wafer

Also Published As

Publication number Publication date
FR2313327B1 (en) 1977-12-09
DE2625064A1 (en) 1977-03-10
FR2313327A1 (en) 1976-12-31

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee