GB1510007A - Projection of images - Google Patents

Projection of images

Info

Publication number
GB1510007A
GB1510007A GB4598375A GB4598375A GB1510007A GB 1510007 A GB1510007 A GB 1510007A GB 4598375 A GB4598375 A GB 4598375A GB 4598375 A GB4598375 A GB 4598375A GB 1510007 A GB1510007 A GB 1510007A
Authority
GB
United Kingdom
Prior art keywords
plate
support means
master
wafer
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4598375A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1510007A publication Critical patent/GB1510007A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
  • Automatic Focus Adjustment (AREA)

Abstract

1510007 Projection printing INTERNATIONAL BUSINESS MACHINES CORP 6 Nov 1975 [21 Dec 1974] 45983/75 Addition to 1315256 Heading G2A In the apparatus of the Parent Specification, wherein a support means holds in fixed relationship an image-bearing master plate and a photosensitive receiving plate and positioning means selectively moves the support means in X and Y directions with respect to an optical projection system for projecting a section of the master image on to the receiving plate, the support means holds the master plate (e.g. mask) and receiving plate (e.g. wafer) in back-to-back relationship. The support means is supported on a pair of spaced guide surfaces having a spacing many times greater than the distance between the outer surfaces of the master and receiving plates. As shown, a support means in the form of a carrier 80 which is transported with respect to an optical system by raster scanning means, not shown, carries holder plates 85 and 86 for the suction attachment of a mask 40 and wafer 50, respectively, and has air bearings 90 and 92 which are very widely spaced relative to the distance between the mask and wafer. Plate 86 is aligned with respect to plate 85 by three servo-motors, servomotor 82 only being shown. The optical system has a light source 21 and comprises semi-transparent mirrors 28, 35 and 36, an optical path 30 which has a hexagonal or rhombic light aperture 32 and which passes through an aperture in carrier 80, two microscope objectives 42 and 43 having automatic focusing means in the form of focus detectors 60 and 61 and servomotors 64 and 74, and an eyepiece 63.
GB4598375A 1974-12-21 1975-11-06 Projection of images Expired GB1510007A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742460914 DE2460914C2 (en) 1974-12-21 1974-12-21 Photolithographic projection apparatus

Publications (1)

Publication Number Publication Date
GB1510007A true GB1510007A (en) 1978-05-10

Family

ID=5934300

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4598375A Expired GB1510007A (en) 1974-12-21 1975-11-06 Projection of images

Country Status (4)

Country Link
JP (1) JPS548070B2 (en)
DE (1) DE2460914C2 (en)
FR (1) FR2295452A2 (en)
GB (1) GB1510007A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7471374B2 (en) 2003-05-01 2008-12-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2633297A1 (en) * 1976-07-23 1978-01-26 Siemens Ag AUTOMATIC ADJUSTMENT PROCEDURE
DE2635275C2 (en) * 1976-08-05 1984-09-06 Siemens AG, 1000 Berlin und 8000 München Method for adjusting a disk-shaped substrate relative to a photomask in an X-ray exposure apparatus
DE2757386C3 (en) * 1977-12-22 1981-11-26 Agfa-Gevaert Ag, 5090 Leverkusen Exposure arrangement for copiers
FR2450470A1 (en) * 1979-02-27 1980-09-26 Thomson Csf OPTICAL PROJECTION SYSTEM IN PHOTOREPETITION
JP2576814B2 (en) * 1995-06-16 1997-01-29 株式会社日立製作所 Exposure method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2464793A (en) * 1942-08-08 1949-03-22 Lester Cooke Jr H Method and apparatus for photographic scanning
DE1173327B (en) * 1961-04-10 1964-07-02 Logetronics Inc Arrangement for detecting and automatically adjusting the focus in a photographic device
DE2050590C2 (en) * 1970-10-15 1982-06-16 Ibm Deutschland Gmbh, 7000 Stuttgart Projection device
US3819265A (en) * 1972-08-02 1974-06-25 Bell Telephone Labor Inc Scanning projection printer apparatus and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7471374B2 (en) 2003-05-01 2008-12-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method

Also Published As

Publication number Publication date
DE2460914A1 (en) 1976-06-24
JPS548070B2 (en) 1979-04-12
JPS5186975A (en) 1976-07-30
DE2460914C2 (en) 1983-08-18
FR2295452B2 (en) 1977-12-16
FR2295452A2 (en) 1976-07-16

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee